Inventor · disambiguated record
Ernest Bassous
Also filed as: BASSOUS ERNEST
14 granted patents·1,012 citations·filing 1975–1998
95Inventor score
Files withIBM14
Top patents by PatentIndex Score
14 records- 0198US4007464AInk jet nozzleIBM·Filed 1975·Granted Feb 8, 1977·157 cites·20 claims
- 0298US3949410AJet nozzle structure for electrohydrodynamic droplet formation and ink jet printing system therewithIBM·Filed 1975·Granted Apr 6, 1976·134 cites·50 claims
- 0395US4592628AMirror array light valveIBM·Filed 1981·Granted Jun 3, 1986·147 cites·2 claims
- 0495US4047184ACharge electrode array and combination for ink jet printing and method of manufactureIBM·Filed 1976·Granted Sep 6, 1977·61 cites·30 claims
- 0593US5525828AHigh speed silicon-based lateral junction photodetectors having recessed electrodes and thick oxide to reduce fringing fieldsIBM·Filed 1994·Granted Jun 11, 1996·138 cites·16 claims
- 0690US4113551APolycrystalline silicon etching with tetramethylammonium hydroxideIBM·Filed 1977·Granted Sep 12, 1978·59 cites·18 claims
- 0789US6156484AGray scale etching for thin flexible interposerIBM·Filed 1998·Granted Dec 5, 2000·78 cites·12 claims
- 0889US4173818AMethod for fabricating transistor structures having very short effective channelsIBM·Filed 1978·Granted Nov 13, 1979·58 cites·10 claims
- 0984US4978421AMonolithic silicon membrane device fabrication processIBM·Filed 1989·Granted Dec 18, 1990·45 cites·7 claims
- 1072US5340753AMethod for fabricating self-aligned epitaxial base transistorIBM·Filed 1993·Granted Aug 23, 1994·55 cites·17 claims
- 1169US5501787AImmersion scanning system for fabricating porous silicon filmsIBM·Filed 1995·Granted Mar 26, 1996·33 cites·14 claims
- 1251US5458756AApparatus for producing porous silicon on a substrateIBM·Filed 1994·Granted Oct 17, 1995·19 cites·11 claims
- 1350US5357899AEpitaxial silicon membranesIBM·Filed 1993·Granted Oct 25, 1994·17 cites·5 claims
- 1441US5273829AEpitaxial silicon membranesIBM·Filed 1991·Granted Dec 28, 1993·11 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →