Inventor · disambiguated record
Erika Kato
Also filed as: KATO ERIKA
8 granted patents·1 pending application·8 citations·filing 2010–2023
78Inventor score
Files withSEMICONDUCTOR ENERGY LAB3TANAKA TETSUHIRO3MIYAIRI HIDEKAZU1NATIONAL UNIV CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM1TAJIMA RYOTA1
Top patents by PatentIndex Score
9 records- 0168US8828859B2Method for forming semiconductor film and method for manufacturing semiconductor deviceTANAKA TETSUHIRO·Filed 2012·Granted Sep 9, 2014·2 cites·7 claims
- 0267US9048327B2Microcrystalline semiconductor film, method for manufacturing the same, and method for manufacturing semiconductor deviceTANAKA TETSUHIRO·Filed 2012·Granted Jun 2, 2015·2 cites·21 claims
- 0366US8344378B2Thin film transistor and method for manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2010·Granted Jan 1, 2013·2 cites·7 claims
- 0464US2025152718A1Nucleic acid delivery materialNATIONAL UNIV CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM·Filed 2023·Application pending·0 cites
- 0561US8956934B2Thin film transistor and method for manufacturing the sameSEMICONDUCTOR ENERGY LAB·Filed 2012·Granted Feb 17, 2015·1 cites·10 claims
- 0659US9018109B2Thin film transistor including silicon nitride layer and manufacturing method thereofMIYAIRI HIDEKAZU·Filed 2010·Granted Apr 28, 2015·1 cites·17 claims
- 0748US9450139B2Manufacturing method of semiconductor film, manufacturing method of semiconductor device, and manufacturing method of photoelectric conversion deviceSEMICONDUCTOR ENERGY LAB·Filed 2015·Granted Sep 20, 2016·0 cites·4 claims
- 0846US9443989B2Manufacturing method of semiconductor film, manufacturing method of semiconductor device, and manufacturing method of photoelectric conversion deviceTANAKA TETSUHIRO·Filed 2011·Granted Sep 13, 2016·0 cites·6 claims
- 0939US8916425B2Method for forming microcrystalline semiconductor film and method for manufacturing semiconductor deviceTAJIMA RYOTA·Filed 2011·Granted Dec 23, 2014·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →