Inventor · disambiguated record
Eungnak Han
Also filed as: HAN EUNGNAK
42 granted patents·19 pending applications·35 citations·filing 2008–2025
96Inventor score
Files withINTEL CORP54WISCONSIN ALUMNI RES FOUND4GOPALAN PADMA1NYHUS PAUL A1WISCONSIN ALUMNI RES FOND1
Top patents by PatentIndex Score
61 records- 0188US9530733B2Forming layers of materials over small regions by selective chemical reaction including limiting enchroachment of the layers over adjacent regionsINTEL CORP·Filed 2013·Granted Dec 27, 2016·8 cites·20 claims
- 0286US8362179B2Photopatternable imaging layers for controlling block copolymer microdomain orientationWISCONSIN ALUMNI RES FOUND·Filed 2008·Granted Jan 29, 2013·6 cites·28 claims
- 0385US9388268B2Patternable polymer block brush layersGOPALAN PADMA·Filed 2011·Granted Jul 12, 2016·5 cites·23 claims
- 0482US10256141B2Maskless air gap to prevent via punch throughINTEL CORP·Filed 2015·Granted Apr 9, 2019·3 cites·20 claims
- 0581US12506032B2Self-assembled guided hole and via patterning over gratingINTEL CORP·Filed 2024·Granted Dec 23, 2025·0 cites·20 claims
- 0679US10109583B2Method for creating alternate hardmask cap interconnect structure with increased overlay marginINTEL CORP·Filed 2014·Granted Oct 23, 2018·4 cites·25 claims
- 0778US11137681B2Lined photobucket structure for back end of line (BEOL) interconnect formationINTEL CORP·Filed 2016·Granted Oct 5, 2021·2 cites·19 claims
- 0878US9097979B2Block copolymer-based mask structures for the growth of nanopatterned polymer brushesWISCONSIN ALUMNI RES FOND·Filed 2013·Granted Aug 4, 2015·3 cites·16 claims
- 0977US9418888B2Non-lithographically patterned directed self assembly alignment promotion layersINTEL CORP·Filed 2013·Granted Aug 16, 2016·2 cites·25 claims
- 1077US2024360264A1Chemical compositions & methods of patterning microelectronic device structuresINTEL CORP·Filed 2024·Application pending·0 cites
- 1173US8663784B2Photopatternable imaging layers for controlling block copolymer microdomain orientationWISCONSIN ALUMNI RES FOUND·Filed 2012·Granted Mar 4, 2014·1 cites·23 claims
- 1273US2024249946A1Gate spacing in integrated circuit structuresINTEL CORP·Filed 2024·Application pending·0 cites
- 1372US12087836B2Contact over active gate structures with metal oxide-caped contacts to inhibit shortingINTEL CORP·Filed 2023·Granted Sep 10, 2024·0 cites·20 claims
- 1472US10459338B2Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and pluggingINTEL CORP·Filed 2017·Granted Oct 29, 2019·1 cites·3 claims
- 1571US12230536B1Self-assembled guided hole and via patterning over gratingINTEL CORP·Filed 2021·Granted Feb 18, 2025·0 cites·20 claims
- 1671US12037434B2Chemical compositions and methods of patterning microelectronic device structuresINTEL CORP·Filed 2021·Granted Jul 16, 2024·0 cites·6 claims
- 1771US11953826B2Lined photobucket structure for back end of line (BEOL) interconnect formationINTEL CORP·Filed 2021·Granted Apr 9, 2024·0 cites·20 claims
- 1869US2023307298A1Aligned pitch-quartered patterning for lithography edge placement error advanced rectificationINTEL CORP·Filed 2023·Application pending·0 cites
- 1967US12012473B2Directed self-assembly structures and techniquesINTEL CORP·Filed 2020·Granted Jun 18, 2024·0 cites·20 claims
- 2066US12266527B1Directed self-assembly enabled patterning over metal layers using assisting featuresINTEL CORP·Filed 2021·Granted Apr 1, 2025·0 cites·20 claims
- 2166US12131991B2Self aligned gratings for tight pitch interconnects and methods of fabricationINTEL CORP·Filed 2022·Granted Oct 29, 2024·0 cites·20 claims
- 2266US12002678B2Gate spacing in integrated circuit structuresINTEL CORP·Filed 2020·Granted Jun 4, 2024·0 cites·20 claims
- 2364US12400913B2Contact over active gate structures with conductive trench contact taps for advanced integrated circuit structure fabricationINTEL CORP·Filed 2021·Granted Aug 26, 2025·0 cites·20 claims
- 2464US2025174458A1Directed self-assembly enabled patterning over metal layers using assisting featuresINTEL CORP·Filed 2025·Application pending·0 cites
- 2563US9207536B2Photopatternable imaging layers for controlling block copolymer microdomain orientationWISCONSIN ALUMNI RES FOUND·Filed 2014·Granted Dec 8, 2015·0 cites·24 claims
- 2661US12087594B2Colored gratings in microelectronic structuresINTEL CORP·Filed 2020·Granted Sep 10, 2024·0 cites·20 claims
- 2761US2025110408A1Switchable underlayers for euv lithographyINTEL CORP·Filed 2023·Application pending·0 cites
- 2858US11846883B2Chain scission photoresists and methods for forming chain scission photoresistsINTEL CORP·Filed 2018·Granted Dec 19, 2023·0 cites·10 claims
- 2958US10971394B2Maskless air gap to prevent via punch throughINTEL CORP·Filed 2019·Granted Apr 6, 2021·0 cites·15 claims
- 3058US9570349B2Non-lithographically patterned directed self assembly alignment promotion layersINTEL CORP·Filed 2016·Granted Feb 14, 2017·0 cites·13 claims
- 3156US11262654B2Chain scission resist compositions for EUV lithography applicationsINTEL CORP·Filed 2019·Granted Mar 1, 2022·0 cites·17 claims
- 3256US2024194483A1Integrated circuit (ic) device with multi-pitch pattern fabricated through cross-linkable block copolymerINTEL CORP·Filed 2022·Application pending·0 cites
- 3356US2024222119A1Patterning based on in-situ formation of block copoylmer through deprotectionINTEL CORP·Filed 2022·Application pending·0 cites
- 3456US2024204083A1Dsa (directed self-assembly) based spacer and liner for shorting margin of viaINTEL CORP·Filed 2022·Application pending·0 cites
- 3555US12293913B1Directed self-assembly enabled subtractive metal patterningINTEL CORP·Filed 2021·Granted May 6, 2025·0 cites·20 claims
- 3655US11837644B2Contact over active gate structures with metal oxide-caped contacts to inhibit shortingINTEL CORP·Filed 2019·Granted Dec 5, 2023·0 cites·19 claims
- 3754US2024203868A1Serial directed self-assembly (dsa) processes for forming metal layer with cutINTEL CORP·Filed 2022·Application pending·0 cites
- 3854US2024186264A1Polymer layers for adhesive promotion and stress management in glass layers in integrated circuit devicesINTEL CORP·Filed 2022·Application pending·0 cites
- 3954US2024194672A1Multi-pitch patterning through one-step flowINTEL CORP·Filed 2022·Application pending·0 cites
- 4054US2024114693A1Self-aligned patterning of plate lines in three-dimensional ferroelectric capacitorsINTEL CORP·Filed 2022·Application pending·0 cites
- 4154US2025220968A1Integrated circuit structures having direct-assembled links for uniform grid metal gate and trench contact cutINTEL CORP·Filed 2023·Application pending·0 cites
- 4253US12237223B2Contact over active gate structures using directed self-assembly for advanced integrated circuit structure fabricationINTEL CORP·Filed 2020·Granted Feb 25, 2025·0 cites·20 claims
- 4353US11664305B2Staggered lines for interconnect performance improvement and processes for forming suchINTEL CORP·Filed 2019·Granted May 30, 2023·0 cites·20 claims
- 4453US11251117B2Self aligned gratings for tight pitch interconnects and methods of fabricationINTEL CORP·Filed 2019·Granted Feb 15, 2022·0 cites·6 claims
- 4553US9115255B2Crosslinked random copolymer films for block copolymer domain orientationWISCONSIN ALUMNI RES FOUND·Filed 2013·Granted Aug 25, 2015·0 cites·21 claims
- 4652US11605623B2Materials and layout design options for DSA on transition regions over active dieINTEL CORP·Filed 2019·Granted Mar 14, 2023·0 cites·13 claims
- 4752US9625815B2Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and pluggingNYHUS PAUL A·Filed 2013·Granted Apr 18, 2017·0 cites·3 claims
- 4851US10269622B2Materials and deposition schemes using photoactive materials for interface chemical control and patterning of predefined structuresINTEL CORP·Filed 2014·Granted Apr 23, 2019·0 cites·15 claims
- 4949US2019013246A1Aligned pitch-quartered patterning for lithography edge placement error advanced rectificationINTEL CORP·Filed 2016·Application pending·0 cites
- 5048US11404482B2Self-aligned repeatedly stackable 3D vertical RRAMINTEL CORP·Filed 2018·Granted Aug 2, 2022·0 cites·9 claims
Showing the top 50 of 61 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →