Inventor · disambiguated record
Feng-Yueh Chang
Also filed as: CHANG FENG-YUEH
2 granted patents·111 citations·filing 2002–2002
65Inventor score
Files withTAIWAN SEMICONDUCTOR MFG2
Top patents by PatentIndex Score
2 records- 0192US6569777B1Plasma etching method to form dual damascene with improved via profileTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted May 27, 2003·105 cites·20 claims
- 0248US6943120B1Method to improve via or contact hole profile using an in-situ polymer deposition and strip procedureTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Sep 13, 2005·6 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →