Inventor · disambiguated record
Fengji Yeh
Also filed as: YEH FENGJI
13 granted patents·6 pending applications·90 citations·filing 2012–2023
88Inventor score
Files withROHM & HAAS ELECT MAT8ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC6DUPONT ELECTRONIC MAT HOLDING INC3DOW GLOBAL TECHNOLOGIES LLC2
Top patents by PatentIndex Score
19 records- 0195US9259820B2Chemical mechanical polishing pad with polishing layer and windowROHM & HAAS ELECT MAT·Filed 2014·Granted Feb 16, 2016·36 cites·10 claims
- 0293US8980749B1Method for chemical mechanical polishing silicon wafersROHM & HAAS ELECT MAT·Filed 2013·Granted Mar 17, 2015·24 cites·10 claims
- 0391US9064806B1Soft and conditionable chemical mechanical polishing pad with windowROHM & HAAS ELECT MAT·Filed 2014·Granted Jun 23, 2015·13 cites·11 claims
- 0486US9144880B2Soft and conditionable chemical mechanical polishing padROHM & HAAS ELECT MAT·Filed 2012·Granted Sep 29, 2015·4 cites·14 claims
- 0586US9102034B2Method of chemical mechanical polishing a substrateROHM & HAAS ELECT MAT·Filed 2013·Granted Aug 11, 2015·8 cites·11 claims
- 0670US9238296B2Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layerROHM & HAAS ELECT MAT·Filed 2013·Granted Jan 19, 2016·2 cites·15 claims
- 0769US9238295B2Soft and conditionable chemical mechanical window polishing padROHM & HAAS ELECT MAT·Filed 2013·Granted Jan 19, 2016·2 cites·18 claims
- 0869US2025100100A1Method of polishing using chemical mechanical polishing padDUPONT ELECTRONIC MAT HOLDING INC·Filed 2023·Application pending·0 cites
- 0968US2025100099A1Chemical mechanical polishing padDUPONT ELECTRONIC MAT HOLDING INC·Filed 2023·Application pending·0 cites
- 1067US2025033161A1Polishing pad formed from dual curativeDUPONT ELECTRONIC MAT HOLDING INC·Filed 2023·Application pending·0 cites
- 1164US9233451B2Soft and conditionable chemical mechanical polishing pad stackROHM & HAAS ELECT MAT·Filed 2013·Granted Jan 12, 2016·1 cites·18 claims
- 1249US10875144B2Chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted Dec 29, 2020·0 cites·8 claims
- 1347US2015059254A1Polyurethane polishing padDOW GLOBAL TECHNOLOGIES LLC·Filed 2013·Application pending·0 cites
- 1446US2015065013A1Chemical mechanical polishing padDOW GLOBAL TECHNOLOGIES LLC·Filed 2013·Application pending·0 cites
- 1544US10144115B2Method of making polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Dec 4, 2018·0 cites·9 claims
- 1643US2018281149A1Chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Application pending·0 cites
- 1742US10105825B2Method of making polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Oct 23, 2018·0 cites·9 claims
- 1839US9776300B2Chemical mechanical polishing pad and method of making sameROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 3, 2017·0 cites·10 claims
- 1937US9586305B2Chemical mechanical polishing pad and method of making sameROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Mar 7, 2017·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →