Inventor · disambiguated record
Frank Hoeller
Also filed as: HOELLER FRANK
9 granted patents·1 pending application·22 citations·filing 2004–2017
81Inventor score
Files withSPRUCK BERND3ZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH3ALVAREZ DIEZ CRISTINA2ZEISS CARL AG1ZEISS CARL SMT AG1
Top patents by PatentIndex Score
10 records- 0175US8836955B2Device and method for measuring a surfaceALVAREZ DIEZ CRISTINA·Filed 2009·Granted Sep 16, 2014·12 cites·19 claims
- 0273US10401145B2Method for calibrating an optical arrangementZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2017·Granted Sep 3, 2019·2 cites·19 claims
- 0368US8681344B2Devices and methods for position determination and surface measurementSPRUCK BERND·Filed 2010·Granted Mar 25, 2014·3 cites·36 claims
- 0463US8780331B2Evaluation device, measuring arrangement and method for path length measurement and measuring system and method for a coordinate measuring device and coordinate measuring deviceSPRUCK BERND·Filed 2010·Granted Jul 15, 2014·3 cites·25 claims
- 0557US8692981B2Evaluation device, measuring arrangement and method for path length measurementSPRUCK BERND·Filed 2010·Granted Apr 8, 2014·2 cites·20 claims
- 0651US9879982B2Method and arrangement for measuring internal threads of a workpiece with an optical sensorZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2016·Granted Jan 30, 2018·0 cites·12 claims
- 0747US11221206B2Device for measuring objectsZEISS CARL AG·Filed 2017·Granted Jan 11, 2022·0 cites·18 claims
- 0837US9175947B2Method and device for determining a position of an objectALVAREZ DIEZ CRISTINA·Filed 2009·Granted Nov 3, 2015·0 cites·20 claims
- 0937US2006018045A1Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized deviceZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 1035US10254106B2Method and optical sensor for determining at least one coordinate of at least one measurement objectZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2017·Granted Apr 9, 2019·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →