Inventor · disambiguated record
Franz Koppl
Also filed as: GRIESSHAMMER RUDOLF · KOEPPL FRANZ · KOPPL FRANZ · STEUDTEN FRIEDRICH
19 granted patents·900 citations·filing 1976–2000
96Inventor score
Top patents by PatentIndex Score
19 records- 0198US4179530AProcess for the deposition of pure semiconductor materialWACKER CHEMITRONIC·Filed 1979·Granted Dec 18, 1979·409 cites·4 claims
- 0292US4536642ADevice for treating gases at high temperaturesWACKER CHEMITRONIC·Filed 1983·Granted Aug 20, 1985·67 cites·3 claims
- 0392US4311545AMethod for the deposition of pure semiconductor materialWACKER CHEMITRONIC·Filed 1980·Granted Jan 19, 1982·57 cites·4 claims
- 0491US4173944ASilverplated vapor deposition chamberWACKER CHEMITRONIC·Filed 1978·Granted Nov 13, 1979·51 cites·2 claims
- 0590US4131659AProcess for producing large-size, self-supporting plates of siliconWACKER CHEMITRONIC·Filed 1976·Granted Dec 26, 1978·46 cites·10 claims
- 0689US6375011B1Vibrating conveyor and method for conveying silicon fragmentsWACKER CHEMIE GMBH·Filed 2000·Granted Apr 23, 2002·45 cites·3 claims
- 0783US4454104AProcess for working up the residual gases obtained in the deposition of silicon and in the conversion of silicon tetrachlorideWACKER CHEMITRONIC·Filed 1982·Granted Jun 12, 1984·28 cites·10 claims
- 0868US5660335AMethod and device for the comminution of semiconductor materialWACKER CHEMITRONIC·Filed 1994·Granted Aug 26, 1997·22 cites·9 claims
- 0967US4062714AProcess for making hollow silicon bodies and bodies utilizing board-shaped members to form the basic geometric shape so madeWACKER CHEMITRONIC·Filed 1976·Granted Dec 13, 1977·20 cites·1 claims
- 1066US4515762AProcess for processing waste gases resulting during the production of siliconWACKER CHEMITRONIC·Filed 1982·Granted May 7, 1985·15 cites·4 claims
- 1165US6040544AOptoelectronic separation apparatusWACKER CHEMIE GMBH·Filed 1998·Granted Mar 21, 2000·26 cites·7 claims
- 1260US4113532AProcess for producing large-size substrate-based semiconductor material utilizing vapor-phase deposition and subsequent resolidificationWACKER CHEMITRONIC·Filed 1976·Granted Sep 12, 1978·18 cites·10 claims
- 1359US4211040AProcess for machining silicon rods and tubes by abrasionWACKER CHEMITRONIC·Filed 1978·Granted Jul 8, 1980·14 cites·2 claims
- 1457US4213830AMethod for the transfer of heatKOPPL FRANZ·Filed 1977·Granted Jul 22, 1980·17 cites·14 claims
- 1555US5820688AMethod for the treatment of semiconductor materialWACKER CHEMIE GMBH·Filed 1997·Granted Oct 13, 1998·21 cites·6 claims
- 1654US4252780AProcess for working up hydrolyzable and/or water-soluble compoundsWACKER CHEMITRONIC·Filed 1979·Granted Feb 24, 1981·14 cites·6 claims
- 1753US6024306ADevice and method for fragmenting semiconductor materialWACKER CHEMIE GMBH·Filed 1998·Granted Feb 15, 2000·13 cites·19 claims
- 1844US4160797AProcess for the deposition of polycrystalline silicon from the gas phase on heated carriersWACKER CHEMITRONIC·Filed 1976·Granted Jul 10, 1979·9 cites·7 claims
- 1944US4065533AProcess for the continuous production of silicon rods or tubes by gaseous deposition into a flexible wound bandWACKER CHEMITRONIC·Filed 1977·Granted Dec 27, 1977·8 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →