Inventor · disambiguated record
Franz Laermer
Also filed as: BENZ GERHARD DR · LAERMER FRANZ
114 granted patents·28 pending applications·2,899 citations·filing 1993–2024
99Inventor score
Top patents by PatentIndex Score
142 records- 0199US5501893AMethod of anisotropically etching siliconBOSCH GMBH ROBERT·Filed 1993·Granted Mar 26, 1996·1.1k cites·26 claims
- 0294US5756901ASensor and method for manufacturing a sensorBOSCH GMBH ROBERT·Filed 1996·Granted May 26, 1998·94 cites·8 claims
- 0393US9194388B2Micro-dosing pump having a rotatable valve disk driven by a magnetized actuator diskBOSCH GMBH ROBERT·Filed 2013·Granted Nov 24, 2015·15 cites·12 claims
- 0493US5996409AAcceleration sensing deviceBOSCH GMBH ROBERT·Filed 1998·Granted Dec 7, 1999·104 cites·18 claims
- 0591US6214243B1Process for producing a speed of rotation coriolis sensorBOSCH GMBH ROBERT·Filed 1996·Granted Apr 10, 2001·78 cites·14 claims
- 0690US9515159B2Electronic sensor apparatus for detecting chemical or biological species, microfluidic apparatus comprising such a sensor apparatus, and method for producing the sensor apparatus and method for producing the microfluidic apparatusBOSCH GMBH ROBERT·Filed 2013·Granted Dec 6, 2016·11 cites·15 claims
- 0790US6284148B1Method for anisotropic etching of siliconBOSCH GMBH ROBERT·Filed 1998·Granted Sep 4, 2001·103 cites·9 claims
- 0889US8332092B2Method for detecting the state of a tireLAERMER FRANZ·Filed 2007·Granted Dec 11, 2012·12 cites·12 claims
- 0989US5498312AMethod for anisotropic plasma etching of substratesBOSCH GMBH ROBERT·Filed 1994·Granted Mar 12, 1996·123 cites·10 claims
- 1088US6303512B1Anisotropic, fluorine-based plasma etching method for siliconBOSCH GMBH ROBERT·Filed 1998·Granted Oct 16, 2001·95 cites·25 claims
- 1187US6720268B1Method for anisotropic plasma etching of semiconductorsBOSCH GMBH ROBERT·Filed 2000·Granted Apr 13, 2004·38 cites·20 claims
- 1287US6592664B1Method and device for epitaxial deposition of atoms or molecules from a reactive gas on a deposition surface of a substrateBOSCH GMBH ROBERT·Filed 2000·Granted Jul 15, 2003·27 cites·25 claims
- 1386US8629011B2Epitaxial silicon CMOS-MEMS microphones and method for manufacturingDIAMOND BRETT M·Filed 2011·Granted Jan 14, 2014·14 cites·24 claims
- 1485US6726815B1Electrochemical etching cellBOSCH GMBH ROBERT·Filed 2000·Granted Apr 27, 2004·21 cites·28 claims
- 1585US5616523AMethod of manufacturing sensorBOSCH GMBH ROBERT·Filed 1996·Granted Apr 1, 1997·59 cites·4 claims
- 1684US8861765B2Microphone component and method for operating sameBUCK THOMAS·Filed 2010·Granted Oct 14, 2014·8 cites·23 claims
- 1784US8637945B2Component having a micromechanical microphone structure, and method for its productionREICHENBACH FRANK·Filed 2010·Granted Jan 28, 2014·10 cites·11 claims
- 1884US8506530B2Microneedles to be placed in the skin for the transdermal application of pharmaceuticalsLAERMER FRANZ·Filed 2007·Granted Aug 13, 2013·42 cites·16 claims
- 1984US7834409B2Micromechanical component and corresponding method for its manufactureBOSCH GMBH ROBERT·Filed 2006·Granted Nov 16, 2010·14 cites·10 claims
- 2084US6008138AProcess for making micromechanical structuresBOSCH GMBH ROBERT·Filed 1997·Granted Dec 28, 1999·50 cites·12 claims
- 2183US7811941B1Device and method for etching a substrate using an inductively coupled plasmaBOSCH GMBH ROBERT·Filed 2000·Granted Oct 12, 2010·31 cites·30 claims
- 2281US10072258B2Method and device for preparing a sample of biological material containing target cells and accompanying cells for extracting nucleic acids of the target cellsBOSCH GMBH ROBERT·Filed 2014·Granted Sep 11, 2018·3 cites·7 claims
- 2381US8354033B2Method for producing porous microneedles and their useBOSCH GMBH ROBERT·Filed 2007·Granted Jan 15, 2013·10 cites·12 claims
- 2481US6214161B1Method and apparatus for anisotropic etching of substratesBOSCH GMBH ROBERT·Filed 1998·Granted Apr 10, 2001·58 cites·17 claims
- 2580US11131646B2Electrochemical sequencing of DNA using an edge electrodeBOSCH GMBH ROBERT·Filed 2018·Granted Sep 28, 2021·1 cites·21 claims
- 2680US7898046B2Microelectromechanical systems encapsulation processBOSCH GMBH ROBERT·Filed 2009·Granted Mar 1, 2011·5 cites·6 claims
- 2780US7582514B2Microelectromechanical systems encapsulation process with anti-stiction coatingBOSCH GMBH ROBERT·Filed 2007·Granted Sep 1, 2009·9 cites·27 claims
- 2880US7361287B2Method for etching structures in an etching body by means of a plasmaBOSCH GMBH ROBERT·Filed 2002·Granted Apr 22, 2008·23 cites·17 claims
- 2980US6127273AProcess for anisotropic plasma etching of different substratesBOSCH GMBH ROBERT·Filed 1997·Granted Oct 3, 2000·59 cites·26 claims
- 3080US6117701AMethod for manufacturing a rate-of-rotation sensorBOSCH GMBH ROBERT·Filed 1997·Granted Sep 12, 2000·47 cites·14 claims
- 3179US8986256B2Manufacturing method for a porous microneedle array and corresponding porous microneedle array and corresponding substrate compositeSCHOLTEN DICK·Filed 2010·Granted Mar 24, 2015·7 cites·10 claims
- 3279US7563633B2Microelectromechanical systems encapsulation processBOSCH GMBH ROBERT·Filed 2006·Granted Jul 21, 2009·5 cites·21 claims
- 3379US6531068B2Method of anisotropic etching of siliconBOSCH GMBH ROBERT·Filed 1999·Granted Mar 11, 2003·55 cites·18 claims
- 3478US5542558AMethod for manufacturing micro-mechanical components using selective anodization of siliconBOSCH GMBH ROBERT·Filed 1994·Granted Aug 6, 1996·36 cites·5 claims
- 3576US7166536B1Methods for plasma etching of siliconBOSCH GMBH ROBERT·Filed 2000·Granted Jan 23, 2007·19 cites·4 claims
- 3675US8329555B2Method for producing a capping wafer for a sensorREICHENBACH FRANK·Filed 2008·Granted Dec 11, 2012·6 cites·6 claims
- 3773US6200822B1Method for detecting the transition between different materials in semiconductor structuresBOSCH GMBH ROBERT·Filed 1998·Granted Mar 13, 2001·44 cites·6 claims
- 3872US7648611B2Plasma etching equipmentBOSCH GMBH ROBERT·Filed 2001·Granted Jan 19, 2010·15 cites·15 claims
- 3972US6926844B1Plasma etching method having pulsed substrate electrode powerBOSCH GMBH ROBERT·Filed 2000·Granted Aug 9, 2005·14 cites·38 claims
- 4071US8607450B2Method for manufacturing a micropump and micropumpCASSEMEYER JULIA·Filed 2008·Granted Dec 17, 2013·4 cites·42 claims
- 4171US8040023B2Bending transducer for generating electrical energy from mechanical deformationsBOSCH GMBH ROBERT·Filed 2009·Granted Oct 18, 2011·5 cites·15 claims
- 4270US6062082AMicromechanical acceleration or coriolis rotation-rate sensorBOSCH GMBH ROBERT·Filed 1996·Granted May 16, 2000·52 cites·20 claims
- 4369US8182707B2Method for etching a layer on a substrateLAERMER FRANZ·Filed 2005·Granted May 22, 2012·3 cites·24 claims
- 4469US7285228B2Device and method for anisotropic plasma etching of a substrate, a silicon body in particularBOSCH GMBH ROBERT·Filed 2003·Granted Oct 23, 2007·14 cites·17 claims
- 4569US6030850AMethod for manufacturing a sensorBOSCH GMBH ROBERT·Filed 1998·Granted Feb 29, 2000·24 cites·4 claims
- 4668US6677249B2Method for manufacturing breakaway layers for detaching deposited layer systemsBOSCH GMBH ROBERT·Filed 1999·Granted Jan 13, 2004·34 cites·12 claims
- 4768US6462566B1Sensor elementBOSCH GMBH ROBERT·Filed 1998·Granted Oct 8, 2002·31 cites·19 claims
- 4867US7149070B2Holding device, in particular for fixing a semiconductor wafer in a plasma etching device, and method for supplying heat to or dissipating heat from a substrateBOSCH GMBH ROBERT·Filed 2002·Granted Dec 12, 2006·11 cites·21 claims
- 4967US6899817B1Device and method for etching a substrate using an inductively coupled plasmaBOSCH GMBH ROBERT·Filed 2000·Granted May 31, 2005·11 cites·17 claims
- 5067US6720273B1Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma out put or adjusting the same upwardsBOSCH GMBH ROBERT·Filed 2000·Granted Apr 13, 2004·11 cites·16 claims
Showing the top 50 of 142 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →