Inventor · disambiguated record
Freerk Syassen
Also filed as: SYASSEN FREERK
7 granted patents·3 pending applications·43 citations·filing 2007–2021
81Inventor score
Files withSYASSEN FREERK4AIRBUS OPERATIONS GMBH3AIRBUS DEFENCE & SPACE GMBH1AIRBUS GMBH1CENGIZ METIN1
Top patents by PatentIndex Score
10 records- 0186US9511848B2Profile plate portion for use as an outer wall of a flow body, method for manufacturing a profile plate portion and flow body component comprising a suction-extraction device for fluidAIRBUS OPERATIONS GMBH·Filed 2012·Granted Dec 6, 2016·13 cites·16 claims
- 0285US8864082B2Device for reducing the aerodynamic drag of a leading surface of an aircraftSYASSEN FREERK·Filed 2010·Granted Oct 21, 2014·16 cites·9 claims
- 0380US9056426B2Method for the thermal joining of two components, and a thermal joining stripSYASSEN FREERK·Filed 2011·Granted Jun 16, 2015·5 cites·8 claims
- 0470US7856895B2Method and device for acquiring contour deviations of a flexible component, taking into account the component's own weightAIRBUS GMBH·Filed 2007·Granted Dec 28, 2010·8 cites·10 claims
- 0559US9694441B2Planar structure for joining at least two componentsSYASSEN FREERK·Filed 2009·Granted Jul 4, 2017·1 cites·6 claims
- 0655US12151300B2Method for producing a load-bearing element for transportation, and a load-bearing element produced accordinglyAIRBUS OPERATIONS GMBH·Filed 2021·Granted Nov 26, 2024·0 cites·18 claims
- 0747US2014140882A1Additive layer manufacturing method and apparatusAIRBUS OPERATIONS GMBH·Filed 2013·Application pending·0 cites
- 0846US9182299B2Method for the detection of a possible joint defect in a friction stir weld seamSYASSEN FREERK·Filed 2012·Granted Nov 10, 2015·0 cites·13 claims
- 0935US2016376724A1Electrolyte and process for the electrolytic polishing of a metallic substrateAIRBUS DEFENCE & SPACE GMBH·Filed 2016·Application pending·0 cites
- 1032US2013062469A1Surface entity for the reduction of the air resistance of an aviation vehicleCENGIZ METIN·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →