Inventor · disambiguated record
Fuyuma Ito
Also filed as: ITO FUYUMA
10 granted patents·5 pending applications·4 citations·filing 2017–2024
79Inventor score
Top patents by PatentIndex Score
15 records- 0187US11616120B2Semiconductor substrate, method of manufacturing semiconductor device, and method of manufacturing semiconductor substrateKIOXIA CORP·Filed 2021·Granted Mar 28, 2023·2 cites·7 claims
- 0273US11342182B2Substrate treatment device, substrate treatment method, and semiconductor device manufacturing methodKIOXIA CORP·Filed 2019·Granted May 24, 2022·1 cites·11 claims
- 0372US12512335B2Substrate processing apparatus, substrate processing method, and method of manufacturing semiconductor deviceKIOXIA CORP·Filed 2023·Granted Dec 30, 2025·0 cites·5 claims
- 0465US9991159B2Semiconductor device manufacture methodTOSHIBA MEMORY CORP·Filed 2017·Granted Jun 5, 2018·1 cites·8 claims
- 0564US11784064B2Substrate treatment apparatus and manufacturing method of semiconductor deviceKIOXIA CORP·Filed 2020·Granted Oct 10, 2023·0 cites·11 claims
- 0659US2025285890A1Semiconductor manufacturing device and method of manufacturing semiconductor deviceKIOXIA CORP·Filed 2024·Application pending·0 cites
- 0756US12131966B2Semiconductor wafer and method of manufacturing semiconductor apparatusTOSHIBA KK·Filed 2021·Granted Oct 29, 2024·0 cites·11 claims
- 0854US10879087B2Substrate treatment apparatus and manufacturing method of semiconductor deviceTOSHIBA MEMORY CORP·Filed 2018·Granted Dec 29, 2020·0 cites·23 claims
- 0950US10720321B2Substrate treating method and semiconductor device manufacturing methodTOSHIBA MEMORY CORP·Filed 2019·Granted Jul 21, 2020·0 cites·20 claims
- 1049US2022013367A1Plasma treatment apparatus, semiconductor manufacturing apparatus, and manufacturing method of semiconductor deviceTOSHIBA MEMORY CORP·Filed 2021·Application pending·0 cites
- 1148US11171022B2Substrate treatment apparatus and method of manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2019·Granted Nov 9, 2021·0 cites·17 claims
- 1247US10804221B2Substrate treatment apparatus, method of manufacturing semiconductor device and workpiece substrateTOSHIBA MEMORY CORP·Filed 2019·Granted Oct 13, 2020·0 cites·20 claims
- 1347US2023072887A1Semiconductor manufacturing apparatus and method of manufacturing semiconductor deviceKIOXIA CORP·Filed 2022·Application pending·0 cites
- 1442US2018265989A1Substrate treatment apparatus and substrate treatment methodTOSHIBA MEMORY CORP·Filed 2017·Application pending·0 cites
- 1539US2019035636A1Plasma treatment apparatus, semiconductor manufacturing apparatus, and manufacturing method of semiconductor deviceTOSHIBA MEMORY CORP·Filed 2018·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Fuyuma Ito files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →