Inventor · disambiguated record
Fumio Kataoka
Also filed as: KATAOKA FUMIO
19 granted patents·1 pending application·483 citations·filing 1981–2009
96Inventor score
Top patents by PatentIndex Score
20 records- 0192US4667534ALimited slip differential gear mechanismTOCHIGI FUJI SANGYO KK·Filed 1985·Granted May 26, 1987·53 cites·5 claims
- 0290US4748228AProcess for producing organic silicon-terminated polyimide precursor and polyimideHITACHI LTD·Filed 1986·Granted May 31, 1988·55 cites·12 claims
- 0389US4513132AHeat-resistant silicone block polymerHITACHI LTD·Filed 1983·Granted Apr 23, 1985·43 cites·7 claims
- 0483US5388328AProcess for fabricating an interconnected multilayer boardHITACHI LTD·Filed 1994·Granted Feb 14, 1995·69 cites·64 claims
- 0581US5272247APolyimide precursor, cured product thereof, and processes for producing themHITACHI LTD·Filed 1991·Granted Dec 21, 1993·30 cites·11 claims
- 0680US4451551ARadiation-sensitive poly(amic acid) polymer compositionHITACHI LTD·Filed 1981·Granted May 29, 1984·43 cites·21 claims
- 0774US5300735AInterconnected multilayer boards and fabrication processes thereofHITACHI LTD·Filed 1993·Granted Apr 5, 1994·42 cites·25 claims
- 0874US4727185AProcess for preparation of 3,3',4,4'-biphenyltetracarboxylic acid saltsHITACHI LTD·Filed 1986·Granted Feb 23, 1988·12 cites·4 claims
- 0970US4565767ALight-sensitive polymer composition with poly(amic acid), bisazide, and tertiary amine compoundHITACHI LTD·Filed 1984·Granted Jan 21, 1986·24 cites·11 claims
- 1067US5536584APolyimide precursor, polyimide and metalization structure using said polyimideHITACHI LTD·Filed 1993·Granted Jul 16, 1996·37 cites·43 claims
- 1166US4554237APhotosensitive resin composition and method for forming fine patterns with said compositionHITACHI LTD·Filed 1982·Granted Nov 19, 1985·22 cites·17 claims
- 1255US6025113APhotosensitve polymide precursor and its use for pattern formationHITACHI CHEMICAL CO LTD·Filed 1997·Granted Feb 15, 2000·12 cites·39 claims
- 1352US8182610B2Cleaning equipment and cleaning method of deposition maskTAKAHARA YOICHI·Filed 2009·Granted May 22, 2012·2 cites·2 claims
- 1448US4587197AFlexible photosensitive polymer composition with azide and/or amine compound, poly(amic acid) and highly polar compound with boiling point above 150° C.HITACHI LTD·Filed 1984·Granted May 6, 1986·11 cites·14 claims
- 1543US6200831B1Surface-protecting film and resin-sealed semiconductor device having said filmHITACHI LTD·Filed 2000·Granted Mar 13, 2001·1 cites·4 claims
- 1643US6087006ASurface-protecting film and resin-sealed semiconductor device having said filmHITACHI LTD·Filed 1995·Granted Jul 11, 2000·10 cites·12 claims
- 1742US6319656B1Photosensitive polyimide precursor and its use for pattern formationHITACHI CHEMICAL CO LTD·Filed 1999·Granted Nov 20, 2001·6 cites·7 claims
- 1842US2002048726A1Photosensitive polyimide precursor and its use for pattern formationHITACHI CHEMICAL CO LTD·Filed 2001·Application pending·0 cites
- 1934US5851681AWiring structure with metal wiring layers and polyimide layers, and fabrication process of multilayer wiring boardHITACHI LTD·Filed 1994·Granted Dec 22, 1998·8 cites·14 claims
- 2030US5753372AWiring structures and method of manufacturing the sameHITACHI LTD·Filed 1995·Granted May 19, 1998·3 cites·35 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →