Inventor · disambiguated record
Fumio Murai
Also filed as: MURAI FUMIO
37 granted patents·1 pending application·1,249 citations·filing 1980–2005
98Inventor score
Top patents by PatentIndex Score
38 records- 0197US6518548B2Substrate temperature control system and method for controlling temperature of substrateHITACHI LTD·Filed 2002·Granted Feb 11, 2003·269 cites·5 claims
- 0297US6394797B1Substrate temperature control system and method for controlling temperature of substrateHITACHI LTD·Filed 2000·Granted May 28, 2002·182 cites·25 claims
- 0395US6709880B2Semiconductor device and a manufacturing method of the sameHITACHI LTD·Filed 2002·Granted Mar 23, 2004·130 cites·30 claims
- 0492US6964832B2Semiconductor device and manufacturing method thereofHITACHI LTD·Filed 2003·Granted Nov 15, 2005·61 cites·11 claims
- 0587US5429896APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1993·Granted Jul 4, 1995·58 cites·20 claims
- 0686US6845497B2Method for fabrication of patterns and semiconductor devicesHITACHI LTD·Filed 2002·Granted Jan 18, 2005·36 cites·17 claims
- 0786US6497992B1Process for manufacturing semiconductor integrated circuit deviceHITACHI LTD·Filed 2000·Granted Dec 24, 2002·32 cites·7 claims
- 0879US6057081AProcess for manufacturing semiconductor integrated circuit deviceHITACHI LTD·Filed 1997·Granted May 2, 2000·50 cites·60 claims
- 0978US6586341B2Method of manufacturing semiconductor deviceHITACHI LTD·Filed 2002·Granted Jul 1, 2003·16 cites·24 claims
- 1077US4315984AMethod of producing a semiconductor deviceHITACHI LTD·Filed 1980·Granted Feb 16, 1982·43 cites·5 claims
- 1176US5278421APattern fabrication method using a charged particle beam and apparatus for realizing sameHITACHI LTD·Filed 1992·Granted Jan 11, 1994·24 cites·24 claims
- 1274US5061599ARadiation sensitive materialsHITACHI LTD·Filed 1990·Granted Oct 29, 1991·26 cites·6 claims
- 1372US5256454AMethod for suppression of electrificationHITACHI LTD·Filed 1991·Granted Oct 26, 1993·24 cites·19 claims
- 1472US4403151AMethod of forming patternsHITACHI LTD·Filed 1981·Granted Sep 6, 1983·26 cites·12 claims
- 1571US5250812AElectron beam lithography using an aperture having an array of repeated unit patternsHITACHI LTD·Filed 1992·Granted Oct 5, 1993·25 cites·19 claims
- 1669US5437893AMethod for suppression of electrificationHITACHI LTD·Filed 1993·Granted Aug 1, 1995·17 cites·10 claims
- 1768US5441849AMethod of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layerHITACHI LTD·Filed 1993·Granted Aug 15, 1995·30 cites·22 claims
- 1868US5318868APhotomask and method for manufacturing semiconductor device using photomaskHITACHI LTD·Filed 1992·Granted Jun 7, 1994·21 cites·22 claims
- 1967US5324550APattern forming methodHITACHI LTD·Filed 1992·Granted Jun 28, 1994·21 cites·13 claims
- 2063US5757409AExposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatusHITACHI LTD·Filed 1996·Granted May 26, 1998·25 cites·43 claims
- 2160US5350485AHigh-resolution lithography and semiconductor device manufacturing methodHITACHI LTD·Filed 1993·Granted Sep 27, 1994·30 cites·37 claims
- 2260US4983864AElectronic beam drawing apparatusHITACHI LTD·Filed 1989·Granted Jan 8, 1991·10 cites·5 claims
- 2359US5149975APattern fabrication method using a charged particle beam and apparatus for realizing sameHITACHI LTD·Filed 1991·Granted Sep 22, 1992·11 cites·22 claims
- 2455US5589270AProcessed substrate obtained by a process for effecting suppression of electrificationHITACHI LTD·Filed 1995·Granted Dec 31, 1996·12 cites·14 claims
- 2555US5578421APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1995·Granted Nov 26, 1996·10 cites·29 claims
- 2654US2008057408A9Photomask and pattern forming method employing the sameRENESAS TECH CORP·Filed 2005·Application pending·0 cites
- 2753US5557314AExposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatusHITACHI LTD·Filed 1993·Granted Sep 17, 1996·20 cites·17 claims
- 2851US6258513B1Photomask and pattern forming method employing the sameHITACHI LTD·Filed 2000·Granted Jul 10, 2001·1 cites·19 claims
- 2949US5656400APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1996·Granted Aug 12, 1997·7 cites·8 claims
- 3048US5334845ACharged beam exposure method and apparatus as well as aperture stop and production method thereofHITACHI LTD·Filed 1990·Granted Aug 2, 1994·8 cites·12 claims
- 3148US4983532AProcess for fabricating heterojunction bipolar transistorsHITACHI LTD·Filed 1988·Granted Jan 8, 1991·11 cites·14 claims
- 3246US7115344B2Photomask and pattern forming method employing the sameRENESAS TECH CORP·Filed 2004·Granted Oct 3, 2006·0 cites·19 claims
- 3346US5851703APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1997·Granted Dec 22, 1998·6 cites·20 claims
- 3444US6733953B2Photomask and pattern forming method employing the sameRENESAS TECH CORP·Filed 2002·Granted May 11, 2004·0 cites·8 claims
- 3543US6383718B2Photomask and pattern forming method employing the sameHITACHI LTD·Filed 2001·Granted May 7, 2002·0 cites·19 claims
- 3636US6087074APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1999·Granted Jul 11, 2000·2 cites·37 claims
- 3736US6013398APhotomask and pattern forming method employing the sameHITACHI LTD·Filed 1998·Granted Jan 11, 2000·2 cites·37 claims
- 3833US5317168ASuperconducting field effect transistorHITACHI LTD·Filed 1992·Granted May 31, 1994·3 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →