Inventor · disambiguated record
Fumikatsu Uesawa
Also filed as: UESAWA FUMIKATSU
5 granted patents·35 citations·filing 1993–2005
76Inventor score
Files withSONY CORP5
Top patents by PatentIndex Score
5 records- 0168US6953746B2Method of manufacturing a semiconductor apparatus with a tapered aperture pattern to form a predetermined line widthSONY CORP·Filed 2003·Granted Oct 11, 2005·13 cites·22 claims
- 0263US5397663APhase shift mask and method of manufacturing the sameSONY CORP·Filed 1993·Granted Mar 14, 1995·20 cites·8 claims
- 0344US7517638B2Method of manufacturing a semiconductor apparatus with a tapered aperture pattern to form a predetermined line widthSONY CORP·Filed 2005·Granted Apr 14, 2009·0 cites·19 claims
- 0441US6716747B2Method of manufacturing a semiconductor apparatus with a tapered aperture pattern to form a predetermined line widthSONY CORP·Filed 2002·Granted Apr 6, 2004·1 cites·2 claims
- 0525US6177233B1Method of forming resist patternSONY CORP·Filed 1999·Granted Jan 23, 2001·1 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →