Inventor · disambiguated record
Futoshi Utsuno
Also filed as: UTSUNO FUTOSHI
27 granted patents·18 pending applications·255 citations·filing 2007–2024
95Inventor score
Top patents by PatentIndex Score
45 records- 0197US8642402B2Thin film transistor manufacturing method, thin film transistor, thin film transistor substrate and image display apparatus, image display apparatus and semiconductor deviceYANO KOKI·Filed 2008·Granted Feb 4, 2014·69 cites·32 claims
- 0296US8748879B2Semiconductor device, thin film transistor and a method for producing the sameYANO KOKI·Filed 2008·Granted Jun 10, 2014·74 cites·70 claims
- 0394US10483587B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2019·Granted Nov 19, 2019·4 cites·20 claims
- 0494US8784700B2Sputtering target and oxide semiconductor filmINOUE KAZUYOSHI·Filed 2007·Granted Jul 22, 2014·22 cites·10 claims
- 0594US8445903B2Thin film transistor having a crystalline semiconductor film including indium oxide which contains a hydrogen element and method for manufacturing sameINOUE KAZUYOSHI·Filed 2009·Granted May 21, 2013·30 cites·8 claims
- 0694US2025087745A1Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2024·Application pending·0 cites
- 0793US10374253B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2019·Granted Aug 6, 2019·3 cites·20 claims
- 0892US11626616B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2022·Granted Apr 11, 2023·1 cites·12 claims
- 0992US11264642B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2017·Granted Mar 1, 2022·5 cites·22 claims
- 1092US10879561B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2019·Granted Dec 29, 2020·2 cites·18 claims
- 1189US11276881B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2018·Granted Mar 15, 2022·2 cites·16 claims
- 1289US8623511B2Sputtering target for oxide thin film and process for producing the sputtering targetKAWASHIMA HIROKAZU·Filed 2009·Granted Jan 7, 2014·17 cites·25 claims
- 1387US12183879B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2023·Granted Dec 31, 2024·0 cites·7 claims
- 1487US11271246B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2020·Granted Mar 8, 2022·1 cites·11 claims
- 1587US9249032B2Semiconductor thin film, semiconductor thin film manufacturing method and semiconductor elementINOUE KAZUYOSHI·Filed 2008·Granted Feb 2, 2016·15 cites·6 claims
- 1682US11444317B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2017·Granted Sep 13, 2022·1 cites·22 claims
- 1781US10818966B2Sulfide solid electrolyte with argyrodite type crystal structureIDEMITSU KOSAN CO·Filed 2017·Granted Oct 27, 2020·1 cites·20 claims
- 1879US8647537B2Oxide sintered body and sputtering targetUTSUNO FUTOSHI·Filed 2009·Granted Feb 11, 2014·7 cites·11 claims
- 1976US11652236B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2022·Granted May 16, 2023·0 cites·14 claims
- 2066US11916191B2Method for producing sulfide solid electrolyte having argyrodite-type crystal structureIDEMITSU KOSAN CO·Filed 2019·Granted Feb 27, 2024·0 cites·18 claims
- 2166US9209257B2Oxide sintered body and sputtering targetIDEMITSU KOSAN CO·Filed 2013·Granted Dec 8, 2015·1 cites·13 claims
- 2265US11637312B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2018·Granted Apr 25, 2023·0 cites·21 claims
- 2364US2024332603A1Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2022·Application pending·0 cites
- 2463US11387486B2Sulfide solid electrolyteIDEMITSU KOSAN CO·Filed 2018·Granted Jul 12, 2022·0 cites·21 claims
- 2561US2024222633A1Compound and battery containing sameIDEMITSU KOSAN CO·Filed 2022·Application pending·0 cites
- 2660US2023178794A1Electrode mixture and method for producing sameIDEMITSU KOSAN CO·Filed 2021·Application pending·0 cites
- 2760US2024051838A1Method for producing lithium hydroxideIDEMITSU KOSAN CO·Filed 2022·Application pending·0 cites
- 2859US2024010813A1Resin composition, binder for battery, electrode mixture layer for battery, electrolyte layer, sheet for battery, battery, and resin composition production methodIDEMITSU KOSAN CO·Filed 2021·Application pending·0 cites
- 2959US2021355033A1Oxide sintered body, sputtering target and oxide semiconductor filmIDEMITSU KOSAN CO·Filed 2021·Application pending·0 cites
- 3059US2023406718A1Method for producing lithium hydroxideIDEMITSU KOSAN CO·Filed 2021·Application pending·0 cites
- 3159US2023183876A1Li ION RECOVERY MEMBER AND Li RECOVERY DEVICE USING SAMEIDEMITSU KOSAN CO·Filed 2021·Application pending·0 cites
- 3258US11355780B2Sulfide solid electrolyte particlesIDEMITSU KOSAN CO·Filed 2018·Granted Jun 7, 2022·0 cites·15 claims
- 3358US2024182316A1Method for producing lithium compound and apparatus for producing lithium compoundIDEMITSU KOSAN CO·Filed 2022·Application pending·0 cites
- 3457US2022255062A1Electrode composite material and method for manufacturing sameIDEMITSU KOSAN CO·Filed 2020·Application pending·0 cites
- 3556US2014339073A1Sputtering Target and Oxide Semiconductor FilmIDEMITSU KOSAN CO·Filed 2014·Application pending·0 cites
- 3655US2022376291A1Compound and battery comprising the sameIDEMITSU KOSAN CO·Filed 2020·Application pending·0 cites
- 3754US2014001040A1Sputtering target and oxide semiconductor filmIDEMITSU KOSAN CO·Filed 2013·Application pending·0 cites
- 3852US11078120B2Oxide sintered body, sputtering target and oxide semiconductor filmIDEMITSU KOSAN CO·Filed 2017·Granted Aug 3, 2021·0 cites·15 claims
- 3952US2013285053A1Sputtering Target for Oxide Thin Film and Process for Producing the Sputtering TargetIDEMITSU KOSAN CO·Filed 2013·Application pending·0 cites
- 4051US9269573B2Thin film transistor having crystalline indium oxide semiconductor filmINOUE KAZUYOSHI·Filed 2008·Granted Feb 23, 2016·0 cites·15 claims
- 4150US8664136B2Indium oxide sintered compact and sputtering targetINOUE KAZUYOSHI·Filed 2009·Granted Mar 4, 2014·0 cites·25 claims
- 4250US2023155244A1Ion selective permeable membrane and ion recovery deviceIDEMITSU KOSAN CO·Filed 2021·Application pending·0 cites
- 4348US10636914B2Crystalline oxide semiconductor thin film, method for producing crystalline oxide semiconductor thin film, and thin film transistorIDEMITSU KOSAN CO·Filed 2016·Granted Apr 28, 2020·0 cites·19 claims
- 4448US2011006297A1Patterned crystalline semiconductor thin film, method for producing thin film transistor and field effect transistorIDEMITSU KOSAN CO·Filed 2008·Application pending·0 cites
- 4545US2016343554A1Oxide sintered body, method for producing same and sputtering targetIDEMITSU KOSAN CO·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →