Inventor · disambiguated record
Gautam Bhandari
Also filed as: BHANDARI GAUTAM
20 granted patents·1,431 citations·filing 1997–2003
97Inventor score
Files withADVANCED TECH MATERIALS19
Top patents by PatentIndex Score
20 records- 0197US6379748B1Tantalum amide precursors for deposition of tantalum nitride on a substrateADVANCED TECH MATERIALS·Filed 2000·Granted Apr 30, 2002·211 cites·16 claims
- 0297US6015917ATantalum amide precursors for deposition of tantalum nitride on a substrateADVANCED TECH MATERIALS·Filed 1998·Granted Jan 18, 2000·317 cites·4 claims
- 0395US5919522AGrowth of BaSrTiO3 using polyamine-based precursorsADVANCED TECH MATERIALS·Filed 1997·Granted Jul 6, 1999·149 cites·22 claims
- 0494US6006582AHydrogen sensor utilizing rare earth metal thin film detection elementADVANCED TECH MATERIALS·Filed 1998·Granted Dec 28, 1999·137 cites·49 claims
- 0592US6265222B1Micro-machined thin film hydrogen gas sensor, and method of making and using the sameFiled 1999·Granted Jul 24, 2001·116 cites·46 claims
- 0687US6005127AAntimony/Lewis base adducts for Sb-ion implantation and formation of antimonide filmsADVANCED TECH MATERIALS·Filed 1997·Granted Dec 21, 1999·42 cites·18 claims
- 0786US6178925B1Burst pulse cleaning method and apparatus for liquid delivery systemADVANCED TECH MATERIALS·Filed 1999·Granted Jan 30, 2001·60 cites·22 claims
- 0883US6319565B1Stable hydride source compositions for manufacture of semiconductor devices and structuresADVANCED TECH MATERIALS·Filed 2000·Granted Nov 20, 2001·25 cites·12 claims
- 0982US5916359AAlkane and polyamine solvent compositions for liquid delivery chemical vapor depositionADVANCED TECH MATERIALS·Filed 1997·Granted Jun 29, 1999·68 cites·23 claims
- 1081US5859274AAnhydrous mononuclear tris(β-diketonate) bismuth compositions for deposition of bismuth-containing films, and method of making the sameADVANCED TECH MATERIALS·Filed 1997·Granted Jan 12, 1999·31 cites·13 claims
- 1176US6102993ACopper precursor composition and process for manufacture of microelectronic device structuresADVANCED TECH MATERIALS·Filed 1999·Granted Aug 15, 2000·44 cites·59 claims
- 1275US6146608AStable hydride source compositions for manufacture of semiconductor devices and structuresADVANCED TECH MATERIALS·Filed 1997·Granted Nov 14, 2000·39 cites·15 claims
- 1371US6822107B1Chemical vapor deposition precursors for deposition of copperADVANCED TECH MATERIALS·Filed 2003·Granted Nov 23, 2004·10 cites·18 claims
- 1471US5902639AMethod of forming bismuth-containing films by using bismuth amide compoundsADVANCED TECH MATERIALS·Filed 1997·Granted May 11, 1999·33 cites·28 claims
- 1570US6245151B1Liquid delivery system comprising upstream pressure control meansADVANCED TECH MATERIALS·Filed 1998·Granted Jun 12, 2001·34 cites·30 claims
- 1669US6001172AApparatus and method for the in-situ generation of dopantsADVANCED TECH MATERIALS·Filed 1997·Granted Dec 14, 1999·35 cites·37 claims
- 1764US6284652B1Adhesion promotion method for electro-chemical copper metallization in IC applicationsADVANCED TECH MATERIALS·Filed 1998·Granted Sep 4, 2001·35 cites·26 claims
- 1864US6099653ALiquid reagent delivery system with constant thermal loading of vaporizerADVANCED TECH MATERIALS·Filed 1997·Granted Aug 8, 2000·25 cites·26 claims
- 1958US6645860B2Adhesion promotion method for CVD copper metallization in IC applicationsADVANCED TECH MATERIALS·Filed 2001·Granted Nov 11, 2003·7 cites·13 claims
- 2050US6355562B1Adhesion promotion method for CVD copper metallization in IC applicationsADVANCED TECH MATERIALS·Filed 1998·Granted Mar 12, 2002·13 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →