Inventor · disambiguated record
Gab Hwan Cho
Also filed as: CHO GAB HWAN
6 granted patents·6 pending applications·10 citations·filing 2006–2014
72Inventor score
Top patents by PatentIndex Score
12 records- 0178US7771901B2Layout method for maskDONGBU HITEK CO LTD·Filed 2007·Granted Aug 10, 2010·6 cites·14 claims
- 0273US7763398B2Layout method for maskDONGBU HITEK CO LTD·Filed 2007·Granted Jul 27, 2010·4 cites·11 claims
- 0349US7951652B2Mask layout method, and semiconductor device and method for fabricating the sameDONGBU HITEK CO LTD·Filed 2008·Granted May 31, 2011·0 cites·8 claims
- 0447US8074188B2Method for designing mask including forming a mesh dummy patternLEE SANG HEE·Filed 2008·Granted Dec 6, 2011·0 cites·9 claims
- 0545US2008278829A1Semiconductor device and method for manufacturing the sameDONGBU HITEK CO LTD·Filed 2008·Application pending·0 cites
- 0644US2008277750A1Layout Method for Mask, Semiconductor Device and Method for Manufacturing the SameLEE SANG HEE·Filed 2008·Application pending·0 cites
- 0743US9543348B2Backlight image sensor chip having improved chip driving performanceSILICONFILE TECH INC·Filed 2014·Granted Jan 10, 2017·0 cites·12 claims
- 0843US2008277798A1Semiconductor device and method for manufacturing the sameLEE SANG-HEE·Filed 2008·Application pending·0 cites
- 0943US2008265425A1Semiconductor Device and Method for Manufacturing the SameLEE SANG HEE·Filed 2007·Application pending·0 cites
- 1043US2008277792A1Semiconductor Device and Method for Manufacturing the SameLEE SANG HEE·Filed 2008·Application pending·0 cites
- 1142US2016268373A1Semiconductor apparatus having heat dissipating function and electronic equipment comprising sameSILICONFILE TECH INC·Filed 2014·Application pending·0 cites
- 1236US7544447B2Method of forming a mask pattern for a semiconductor deviceDONGBU HITEK CO LTD·Filed 2006·Granted Jun 9, 2009·0 cites·10 claims
Join the waitlist — get patent alerts
Get an alert when Gab Hwan Cho files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →