Inventor · disambiguated record
George G. Barclay
Also filed as: BARCLAY GEORGE · BARCLAY GEORGE G
56 granted patents·16 pending applications·1,096 citations·filing 1990–2019
99Inventor score
Files withSHIPLEY CO LLC38ROHM & HAAS ELECT MAT14WANG DEYAN11CORNELL RES FOUNDATION INC2CAPORALE STEFAN J1
Top patents by PatentIndex Score
72 records- 0197US6306554B1Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2000·Granted Oct 23, 2001·89 cites·45 claims
- 0295US6042997ACopolymers and photoresist compositions comprising copolymer resin binder componentIBM·Filed 1998·Granted Mar 28, 2000·115 cites·20 claims
- 0394US6316165B1Planarizing antireflective coating compositionsSHIPLEY CO LLC·Filed 1999·Granted Nov 13, 2001·105 cites·18 claims
- 0493US6680159B2Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2001·Granted Jan 20, 2004·41 cites·28 claims
- 0592US7662981B2Leveler compoundsROHM & HAAS ELECT MAT·Filed 2009·Granted Feb 16, 2010·19 cites·4 claims
- 0691US8257902B2Compositons and processes for immersion lithographyWANG DEYAN·Filed 2008·Granted Sep 4, 2012·10 cites·10 claims
- 0791US7510639B2Leveler compoundsROHM & HAAS ELECT MAT·Filed 2005·Granted Mar 31, 2009·20 cites·5 claims
- 0891US6803171B2Photoimageable compositionSHIPLEY CO LLC·Filed 2002·Granted Oct 12, 2004·52 cites·20 claims
- 0990US8262891B2Leveler compoundsWANG DEYAN·Filed 2006·Granted Sep 11, 2012·7 cites·7 claims
- 1090US5861231ACopolymers and photoresist compositions comprising copolymer resin binder componentSHIPLEY CO LLC·Filed 1996·Granted Jan 19, 1999·69 cites·5 claims
- 1189US8871428B2Compositions and processes for immersion lithographyWANG DEYAN·Filed 2012·Granted Oct 28, 2014·4 cites·6 claims
- 1289US8506788B2Leveler compoundsWANG DEYAN·Filed 2012·Granted Aug 13, 2013·3 cites·7 claims
- 1388US6855466B2Planarizing antireflective coating compositionsSHIPLEY CO LLC·Filed 2001·Granted Feb 15, 2005·27 cites·18 claims
- 1488US6692888B1Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 1999·Granted Feb 17, 2004·56 cites·24 claims
- 1588US5344742ABenzyl-substituted photoactive compounds and photoresist compositions comprising sameSHIPLEY CO·Filed 1993·Granted Sep 6, 1994·78 cites·28 claims
- 1687US7582412B2Multilayer photoresist systemsROHM & HAAS ELECT MAT·Filed 2003·Granted Sep 1, 2009·28 cites·3 claims
- 1786US9012128B2Photoresist and coated substrate comprising sameRohm and Hass Electronic Materials LLC·Filed 2013·Granted Apr 21, 2015·5 cites·7 claims
- 1885US8722825B2Surface active additive and photoresist composition comprising sameWANG DEYAN·Filed 2012·Granted May 13, 2014·4 cites·6 claims
- 1985US6492086B1Phenolic/alicyclic copolymers and photoresistsSHIPLEY CO LLC·Filed 1999·Granted Dec 10, 2002·46 cites·2 claims
- 2085US5248734AProcess for preparing a polyphenylene polymerCORNELL RES FOUNDATION INC·Filed 1992·Granted Sep 28, 1993·41 cites·28 claims
- 2183US7297616B2Methods, photoresists and substrates for ion-implant lithographyROHM & HAAS ELECT MAT·Filed 2004·Granted Nov 20, 2007·18 cites·6 claims
- 2283US6406828B1Polymer and photoresist compositionsSHIPLEY CO LLC·Filed 2000·Granted Jun 18, 2002·39 cites·24 claims
- 2381US6599677B2Polymer and photoresist compositionsSHIPLEY CO LLC·Filed 2002·Granted Jul 29, 2003·15 cites·18 claims
- 2481US6136501APolymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 1998·Granted Oct 24, 2000·60 cites·30 claims
- 2578US9209028B2Ion implantation methodsROHM & HAAS ELECT MAT·Filed 2013·Granted Dec 8, 2015·4 cites·13 claims
- 2676US6379861B1Polymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2000·Granted Apr 30, 2002·14 cites·23 claims
- 2775US6849381B2Copolymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2003·Granted Feb 1, 2005·12 cites·20 claims
- 2870US7700256B2Phenolic/alicyclic copolymers and photoresistsROHM & HAAS ELECT MAT·Filed 2002·Granted Apr 20, 2010·8 cites·15 claims
- 2970US6107425ANarrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresistsSHIPLEY CO LLC·Filed 1998·Granted Aug 22, 2000·24 cites·28 claims
- 3069US6841331B2Polymers, processes for polymer synthesis and photoresist compositionsSHIPLEY CO LLC·Filed 2002·Granted Jan 11, 2005·10 cites·50 claims
- 3166US7244542B2Resins and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2003·Granted Jul 17, 2007·16 cites·17 claims
- 3265US9005880B2Compositions comprising sulfonamide material and processes for photolithographyWANG DEYAN·Filed 2009·Granted Apr 14, 2015·1 cites·12 claims
- 3365US8975006B2Compositions comprising carboxy component and processes for photolithographyWANG DEYAN·Filed 2009·Granted Mar 10, 2015·1 cites·6 claims
- 3462US9244355B2Compositions and processes for immersion lithographyCAPORALE STEFAN J·Filed 2007·Granted Jan 26, 2016·2 cites·15 claims
- 3562US6777157B1Copolymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2000·Granted Aug 17, 2004·6 cites·15 claims
- 3661US2019346763A1Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithographyWANG DEYAN·Filed 2019·Application pending·0 cites
- 3760US10222699B2Compositions and processes for immersion lithographyROHM & HAAS ELECT MAT·Filed 2014·Granted Mar 5, 2019·0 cites·2 claims
- 3860US6849376B2Polymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2002·Granted Feb 1, 2005·4 cites·18 claims
- 3959US10359698B2Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithographyWANG DEYAN·Filed 2009·Granted Jul 23, 2019·0 cites·8 claims
- 4056US9255079B2Photoacid generators and photoresists comprising sameLI MINGQI·Filed 2010·Granted Feb 9, 2016·0 cites·5 claims
- 4156US7390608B2Photoresists containing Si-polymersROHM & HAAS ELECT MAT·Filed 2003·Granted Jun 24, 2008·3 cites·17 claims
- 4254US10558122B2Compositions comprising sulfonamide material and processes for photolithographyROHM & HAAS ELECT MAT·Filed 2015·Granted Feb 11, 2020·0 cites·12 claims
- 4354US7189490B2Photoresists containing sulfonamide componentSHIPLEY CO LLC·Filed 2003·Granted Mar 13, 2007·9 cites·5 claims
- 4454US7008750B2Processes for producing polysiloxanes and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2003·Granted Mar 7, 2006·2 cites·19 claims
- 4554US5136011ATriazine networks with homogeneous and oriented structures and method for making sameCORNELL RES FOUNDATION INC·Filed 1990·Granted Aug 4, 1992·8 cites·15 claims
- 4654US2008220597A1Photoresists and methods for use thereofROHM & HAAS ELECT MAT·Filed 2007·Application pending·0 cites
- 4751US9507260B2Compositions and processes for photolithographyWANG DEYAN·Filed 2009·Granted Nov 29, 2016·0 cites·2 claims
- 4851US2016124304A1Photoacid generators and photoresists comprising sameROHM & HAAS ELECT MAT·Filed 2016·Application pending·0 cites
- 4950US7306892B2Multilayer photoresist systemSHIPLEY CO LLC·Filed 2003·Granted Dec 11, 2007·2 cites·20 claims
- 5050US2015378255A1Compositions comprising carboxy component and processes for photolithographyROHM & HAAS ELECT MAT·Filed 2015·Application pending·0 cites
Showing the top 50 of 72 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →