Inventor · disambiguated record
Genji Imai
Also filed as: IMAI GENJI
33 granted patents·11 pending applications·453 citations·filing 1994–2010
97Inventor score
Top patents by PatentIndex Score
44 records- 0193US6660457B1Method of forming conductive patternKANSAI PAINT CO LTD·Filed 1999·Granted Dec 9, 2003·98 cites·4 claims
- 0288US7081486B2Method of producing polymerKANSAI PAINT CO LTD·Filed 2003·Granted Jul 25, 2006·28 cites·25 claims
- 0383US7649027B2Polymer and process for producing polymerKANSAI PAINT CO LTD·Filed 2004·Granted Jan 19, 2010·18 cites·11 claims
- 0483US7416707B2Polymerization reaction apparatus, and method of producing polymer using this apparatusKANSAI PAINT CO LTD·Filed 2005·Granted Aug 26, 2008·7 cites·21 claims
- 0579US7544461B2Near infrared ray activation type positive resin compositionKANSAI PAINT CO LTD·Filed 2005·Granted Jun 9, 2009·3 cites·7 claims
- 0676US5496678APhotosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generatorKANSAI PAINT CO LTD·Filed 1994·Granted Mar 5, 1996·26 cites·9 claims
- 0775US6140025ANegative type photosensitive resin composition and method for forming resist patternKANSAI PAINT CO LTD·Filed 1998·Granted Oct 31, 2000·36 cites·7 claims
- 0874US6106999APhotosensitizer, visible light curable resin composition using the same, and use of the compositionMITSUI CHEMICALS·Filed 1998·Granted Aug 22, 2000·37 cites·35 claims
- 0972US6913867B2Negative photosensitive resin composition, negative photosensitive dry film and method of forming patternKANSAI PAINT CO LTD·Filed 2001·Granted Jul 5, 2005·11 cites·9 claims
- 1068US6124077AVisible light-sensitive compositions and pattern formation processKANSAI PAINT CO LTD·Filed 1998·Granted Sep 26, 2000·36 cites·25 claims
- 1166US6864035B2Positive photosensitive resin composition, positive photosensitive dry film and method of forming patternKANSAI PAINT CO LTD·Filed 2001·Granted Mar 8, 2005·8 cites·8 claims
- 1263US6187509B1Positive type electrodeposition photoresist compositions and pattern formation processKANSAI PAINT CO LTD·Filed 1998·Granted Feb 13, 2001·23 cites·28 claims
- 1361US6331376B1Organic-solvent-based photocurable resist composition and resist pattern-forming methodKANSAI PAINT CO LTD·Filed 1999·Granted Dec 18, 2001·20 cites·7 claims
- 1461US6054251APhotopolymerizable compositionKANSAI PAINT CO LTD·Filed 1997·Granted Apr 25, 2000·19 cites·12 claims
- 1558US6670100B1Positive type actinic ray-curable dry film and pattern-forming method by use of the sameKANSAI PAINT CO LTD·Filed 2000·Granted Dec 30, 2003·6 cites·1 claims
- 1658US6555286B1Positive type actinic-ray-curable dry film and pattern-forming method by use of the sameKANSAI PAINT CO LTD·Filed 2000·Granted Apr 29, 2003·5 cites·4 claims
- 1755US5527656APositive type electrodeposition photoresist compositionsKANSAI PAINT CO LTD·Filed 1994·Granted Jun 18, 1996·10 cites·44 claims
- 1853US7466893B2Curable resin composition for light guide formation, curable dry film for light guide formation, cured resin and light guideKANSAI PAINT CO LTD·Filed 2005·Granted Dec 16, 2008·1 cites·14 claims
- 1952US6884570B2Positive type actinic ray-curable dry film and pattern-forming method by use of the sameKANSAI PAINT CO LTD·Filed 2002·Granted Apr 26, 2005·3 cites·1 claims
- 2051US6699646B2Positive type photosensitive resin composition and method for forming resist patternKANSAI PAINT CO LTD·Filed 2001·Granted Mar 2, 2004·2 cites·1 claims
- 2151US6344307B1Photosensitive resin compositionKANSAI PAINT CO LTD·Filed 1999·Granted Feb 5, 2002·13 cites·6 claims
- 2248US7431850B2Process for purification treatment of wastewater containing organic substanceKANSAI PAINT CO LTD·Filed 2004·Granted Oct 7, 2008·3 cites·10 claims
- 2346US2009045552A1Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the sameIMAI GENJI·Filed 2006·Application pending·0 cites
- 2445US6946234B2Positive sensitive resin composition and a process for forming a resist pattern therewithMITSUI CHEMICALS INC·Filed 2003·Granted Sep 20, 2005·0 cites·21 claims
- 2544US2007172181A1Curable resin composition for optical waveguide, curable dry film for optical waveguide, optical waveguide and method for forming core part for optical waveguideKANSAI PAINT CO LTD·Filed 2005·Application pending·0 cites
- 2643US7310467B2Method of fabricating optical waveguideKANSAI PAINT CO LTD·Filed 2005·Granted Dec 18, 2007·0 cites·7 claims
- 2741US6664029B1Method of forming patternKANSAI PAINT CO LTD·Filed 1999·Granted Dec 16, 2003·10 cites·22 claims
- 2841US6093518AVisible laser-curable compositionKANSAI PAINT CO LTD·Filed 1999·Granted Jul 25, 2000·8 cites·10 claims
- 2941US5650259AProcesses for pattern formation using photosensitive compositions and liquid developmentKANSAI PAINT CO LTD·Filed 1995·Granted Jul 22, 1997·6 cites·3 claims
- 3041US2007148600A1Active energy ray-curable resin composition and method for forming resist patternHASEGAWA TAKEYA·Filed 2006·Application pending·0 cites
- 3140US2007185300A1Photocurable resin composition for optical waveguide formation, photocurable dry film for optical waveguide formation, and optical waveguideKANSAI PAINT CO LTD·Filed 2005·Application pending·0 cites
- 3239US6420090B1Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the sameKANSAI PAINT CO LTD·Filed 1999·Granted Jul 16, 2002·6 cites·10 claims
- 3339US2004247267A1Light guide sheet material and method of manufacturing the sheet materialFiled 2002·Application pending·0 cites
- 3438US2009137777A1Polyepoxy compound, method for producing same, thermosetting resin composition containing same, cured product of such composition, and method for removing such cured productKANSAI PAINT CO LTD·Filed 2005·Application pending·0 cites
- 3536US2002158235A1Negative actinic ray-sensitive paste and pattern-forming method by use of the sameFiled 2002·Application pending·0 cites
- 3636US2002094382A1Method of forming conductive patternKANSAI PAINT CO LTD·Filed 2001·Application pending·0 cites
- 3735US5702872AProcess for resist pattern formation using positive electrodeposition photoresist compositionsKANSAI PAINT CO LTD·Filed 1996·Granted Dec 30, 1997·3 cites·44 claims
- 3834US5939148AVisible laser-curable compositionKANSAI PAINT CO LTD·Filed 1997·Granted Aug 17, 1999·2 cites·18 claims
- 3933US2012302697A1Coating composition, coated article, and process for formation of multilayer coating filmINADA YUICHI·Filed 2010·Application pending·0 cites
- 4032US6630285B2Positive sensitive resin composition and a process for forming a resist pattern therewithMITSUI CHEMICALS INC·Filed 1999·Granted Oct 7, 2003·2 cites·20 claims
- 4132US5576148AProcess for production of printed circuit boardKANSAI PAINT CO LTD·Filed 1995·Granted Nov 19, 1996·3 cites·13 claims
- 4232US2005239990A1Curable resin composition for optical waveguide, curable dry film for formal optical waveguide, optical waveguide, and, method for forming optical waveguideHIGUCHI TAKAHIRO·Filed 2004·Application pending·0 cites
- 4330US2001003036A1Positive type photosensitive resin composition and method for forming resist patternFiled 1998·Application pending·0 cites
- 4422US7078158B2Composition for activation energy rays and method of forming patternKANSAI PAINT CO LTD·Filed 2002·Granted Jul 18, 2006·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →