Inventor · disambiguated record
George C. Jacob
Also filed as: JACOB GEORGE · JACOB GEORGE C
33 granted patents·10 pending applications·79 citations·filing 2007–2023
95Inventor score
Files withROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC31TURAKHIA RAJESH3DOW GLOBAL TECHNOLOGIES LLC2DOW GLOBAL TECHNOLOGIES INC1HUNTER GARY A1
Top patents by PatentIndex Score
43 records- 0195US10391606B2Chemical mechanical polishing pads for improved removal rate and planarizationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Aug 27, 2019·10 cites·10 claims
- 0294US9484212B1Chemical mechanical polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Nov 1, 2016·12 cites·10 claims
- 0392US9475168B2Polishing pad windowROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Oct 25, 2016·5 cites·10 claims
- 0491US10569384B1Chemical mechanical polishing pad and polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted Feb 25, 2020·3 cites·10 claims
- 0591US9925637B2Tapered poromeric polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Mar 27, 2018·6 cites·10 claims
- 0688US10464188B1Chemical mechanical polishing pad and polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted Nov 5, 2019·2 cites·10 claims
- 0788US10259099B2Tapering method for poromeric polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Apr 16, 2019·4 cites·10 claims
- 0888US10106662B2Thermoplastic poromeric polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 23, 2018·3 cites·10 claims
- 0986US9586304B2Controlled-expansion CMP PAD casting methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2014·Granted Mar 7, 2017·7 cites·10 claims
- 1081US10293456B2Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Granted May 21, 2019·3 cites·10 claims
- 1180US10464187B2High removal rate chemical mechanical polishing pads from amine initiated polyol containing curativesROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 5, 2019·1 cites·10 claims
- 1280US8742018B2High Tg epoxy systems for composite applicationsREYNOLDS JEFFERY L·Filed 2009·Granted Jun 3, 2014·7 cites·7 claims
- 1375US8829101B2Windmill propeller blade and method of making sameJACOB GEORGE·Filed 2009·Granted Sep 9, 2014·6 cites·14 claims
- 1472US9630293B2Chemical mechanical polishing pad composite polishing layer formulationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Apr 25, 2017·2 cites·11 claims
- 1572US9452507B2Controlled-viscosity CMP casting methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2014·Granted Sep 27, 2016·1 cites·8 claims
- 1670US10086494B2High planarization efficiency chemical mechanical polishing pads and methods of makingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 2, 2018·1 cites·10 claims
- 1769US11285577B2Thin film fluoropolymer composite CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Mar 29, 2022·1 cites·10 claims
- 1869US2023294240A1Chemical mechanical polishing pads for improved removal rate and planarizationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2023·Application pending·0 cites
- 1967US9206349B2Powder coated proppant and method of making the sameTURAKHIA RAJESH·Filed 2009·Granted Dec 8, 2015·5 cites·3 claims
- 2063US9315664B2High Tg epoxy systems for composite applicationsDOW GLOBAL TECHNOLOGIES LLC·Filed 2014·Granted Apr 19, 2016·0 cites·8 claims
- 2158US2016289444A1Amphiphilic block copolymers and inorganic nanofillers to enhance performance of thermosetting polymersDOW GLOBAL TECHNOLOGIES LLC·Filed 2016·Application pending·0 cites
- 2255US9388311B2Amphiphilic block copolymers and inorganic nanofillers to enhance performance of thermosetting polymersVERGHESE KANDATHIL EAPEN·Filed 2008·Granted Jul 12, 2016·0 cites·10 claims
- 2351US2018345449A1Chemical mechanical polishing pads for improved removal rate and planarizationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2018·Application pending·0 cites
- 2450US2011104498A1Structural composites with improved toughnessTURAKHIA RAJESH·Filed 2009·Application pending·0 cites
- 2550US2020384601A1Thin film fluoropolymer composite cmp polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Application pending·0 cites
- 2648US11638978B2Low-debris fluopolymer composite CMP polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted May 2, 2023·0 cites·10 claims
- 2745US11524390B2Methods of making chemical mechanical polishing layers having improved uniformityROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 13, 2022·0 cites·6 claims
- 2845US9481070B2High-stability polyurethane polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2014·Granted Nov 1, 2016·0 cites·1 claims
- 2945US2011098380A1Polyphenolic compounds and epoxy resins comprising cycloaliphatic moieties and process for the production thereofDOW GLOBAL TECHNOLOGIES INC·Filed 2009·Application pending·0 cites
- 3044US10144115B2Method of making polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Dec 4, 2018·0 cites·9 claims
- 3144US10005172B2Controlled-porosity method for forming polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Jun 26, 2018·0 cites·8 claims
- 3243US11491605B2Fluopolymer composite CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Nov 8, 2022·0 cites·10 claims
- 3343US10722999B2High removal rate chemical mechanical polishing pads and methods of makingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Jul 28, 2020·0 cites·3 claims
- 3442US10105825B2Method of making polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Oct 23, 2018·0 cites·9 claims
- 3542US10092998B2Method of making composite polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 9, 2018·0 cites·10 claims
- 3642US2013096232A1Curable epoxy resin compositions and composites made therefromTHEOPHANOUS THEOPHANIS·Filed 2011·Application pending·0 cites
- 3741US10207388B2Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Feb 19, 2019·0 cites·12 claims
- 3841US2014316068A1Bimodal toughening agents for thermosettable epoxy resin compositionsJACOB GEORGE C·Filed 2012·Application pending·0 cites
- 3940US10011002B2Method of making composite polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Jul 3, 2018·0 cites·10 claims
- 4039US9776300B2Chemical mechanical polishing pad and method of making sameROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 3, 2017·0 cites·10 claims
- 4139US2010179077A1Coating composition for proppant and the method of making the sameTURAKHIA RAJESH·Filed 2007·Application pending·0 cites
- 4238US2012010329A1Curable epoxy resin compositions and cured products therefromHUNTER GARY A·Filed 2010·Application pending·0 cites
- 4337US9586305B2Chemical mechanical polishing pad and method of making sameROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Mar 7, 2017·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →