Inventor · disambiguated record
George G. Totir
Also filed as: TOTIR GEORGE G · TOTIR GEORGE GABRIEL
20 granted patents·3 pending applications·150 citations·filing 2008–2020
94Inventor score
Top patents by PatentIndex Score
23 records- 0197US8178382B2Suspended germanium photodetector for silicon waveguideASSEFA SOLOMON·Filed 2011·Granted May 15, 2012·37 cites·7 claims
- 0295US7902620B2Suspended germanium photodetector for silicon waveguideIBM·Filed 2008·Granted Mar 8, 2011·24 cites·13 claims
- 0393US11857997B2Metal surface protectionIBM·Filed 2020·Granted Jan 2, 2024·2 cites·8 claims
- 0491US8026200B2Low pH mixtures for the removal of high density implanted resistADVANCED TECH MATERIALS·Filed 2009·Granted Sep 27, 2011·19 cites·26 claims
- 0590US8618036B2Aqueous cerium-containing solution having an extended bath lifetime for removing mask materialAFZALI-ARDAKANI ALI·Filed 2011·Granted Dec 31, 2013·11 cites·23 claims
- 0690US8367556B1Use of an organic planarizing mask for cutting a plurality of gate linesIBM·Filed 2011·Granted Feb 5, 2013·10 cites·23 claims
- 0790US8367555B2Removal of masking materialIBM·Filed 2009·Granted Feb 5, 2013·15 cites·38 claims
- 0886US8455366B1Use of an organic planarizing mask for cutting a plurality of gate linesFULLER NICHOLAS C M·Filed 2012·Granted Jun 4, 2013·7 cites·17 claims
- 0985US9416338B2Composition for and method of suppressing titanium nitride corrosionCOOPER EMANUEL I·Filed 2011·Granted Aug 16, 2016·10 cites·17 claims
- 1082US10276384B2Plasma shallow doping and wet removal of depth control capIBM·Filed 2017·Granted Apr 30, 2019·2 cites·14 claims
- 1177US8865017B2Silicon surface texturing method for reducing surface reflectanceIBM·Filed 2013·Granted Oct 21, 2014·2 cites·9 claims
- 1276US7501345B1Selective silicide formation by electrodeposit displacement reactionIBM·Filed 2008·Granted Mar 10, 2009·5 cites·4 claims
- 1375US8563408B2Spin-on formulation and method for stripping an ion implanted photoresistAFZALI-ARDAKANI ALI·Filed 2012·Granted Oct 22, 2013·2 cites·20 claims
- 1475US8440494B2Single-crystalline silicon alkaline texturing with glycerol or ethylene glycol additivesFISHER KATHRYN C·Filed 2011·Granted May 14, 2013·1 cites·23 claims
- 1575US8252673B2Spin-on formulation and method for stripping an ion implanted photoresistAFZALI-ARDAKANI ALI·Filed 2009·Granted Aug 28, 2012·3 cites·17 claims
- 1658US11024512B1Selective etch formulation for silicon oxideIBM·Filed 2020·Granted Jun 1, 2021·0 cites·16 claims
- 1758US9536731B2Wet clean process for removing CxHyFz etch residueIBM·Filed 2014·Granted Jan 3, 2017·0 cites·15 claims
- 1856US8455420B2Spin-on formulation and method for stripping an ion implanted photoresistAFZALI-ARDAKANI ALI·Filed 2012·Granted Jun 4, 2013·0 cites·17 claims
- 1956US2018218909A1Plasma shallow doping and wet removal of depth control capIBM·Filed 2018·Application pending·0 cites
- 2056US2018218908A1Plasma shallow doping and wet removal of depth control capIBM·Filed 2018·Application pending·0 cites
- 2155US10167443B2Wet clean process for removing CxHyFz etch residueIBM·Filed 2016·Granted Jan 1, 2019·0 cites·5 claims
- 2249US8637405B2Silicon surface texturing method for reducing surface reflectanceKRISHNAN MAHADEVAIYER·Filed 2011·Granted Jan 28, 2014·0 cites·18 claims
- 2343US2014187460A1Removal of masking materialADVANCED TECH MATERIALS·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →