Inventor · disambiguated record
Gi-Chung Kwon
Also filed as: KWON GI-CHUNG
15 granted patents·11 pending applications·423 citations·filing 2001–2024
91Inventor score
Files withJUSUNG ENG CO LTD10UNIV KWANGWOON IND ACAD COLLAB4SK SPECIALTY CO LTD2HONG JIN1JUNSUNG ENGINEERING CO LTD1
Top patents by PatentIndex Score
26 records- 0192US6683274B1Wafer susceptorJUNSUNG ENGINEERING CO LTD·Filed 2002·Granted Jan 27, 2004·341 cites·8 claims
- 0282US8035056B2Plasma generation apparatusJUSUNG ENG CO LTD·Filed 2008·Granted Oct 11, 2011·6 cites·18 claims
- 0381US7442273B2Apparatus using hybrid coupled plasmaJUSUNG ENG CO LTD·Filed 2004·Granted Oct 28, 2008·18 cites·14 claims
- 0475US7411148B2Plasma generation apparatusJUSUNG ENG CO LTD·Filed 2006·Granted Aug 12, 2008·8 cites·18 claims
- 0571US6847516B2Electrostatic chuck for preventing an arcJUSUNG ENG CO LTD·Filed 2002·Granted Jan 25, 2005·16 cites·13 claims
- 0669US6770836B2Impedance matching circuit for inductively coupled plasma sourceJUSUNG ENG CO LTD·Filed 2002·Granted Aug 3, 2004·25 cites·16 claims
- 0765US8674209B2Thin film type solar cell and method for manufacturing the sameHONG JIN·Filed 2008·Granted Mar 18, 2014·3 cites·21 claims
- 0864US10964515B2Plasma diagnostic system and methodUNIV KWANGWOON IND ACAD COLLAB·Filed 2017·Granted Mar 30, 2021·1 cites·20 claims
- 0954US2024304487A1Substrate processing device using multi-zone heat transfer structure and temperature control methodUNIV KWANGWOON IND ACAD COLLAB·Filed 2022·Application pending·0 cites
- 1053US2025140564A1Method of etching silicon-containing film and method of manufacturing semiconductor device including the sameSK SPECIALTY CO LTD·Filed 2024·Application pending·0 cites
- 1151US2025006538A1Cryogenic electrostatic chuck system and method for controlling sameUNIV KWANGWOON IND ACAD COLLAB·Filed 2021·Application pending·0 cites
- 1246US9162179B2Apparatus for decomposing perfluorocarbon and harmful gas using high-density confined plasma sourceTERATECH CO LTD·Filed 2014·Granted Oct 20, 2015·0 cites·19 claims
- 1346US2023420261A1Method for etching silicon-containing film and semiconductor device manufacturing method comprising sameSK SPECIALTY CO LTD·Filed 2021·Application pending·0 cites
- 1444US6653988B2Parallel resonance whirl antennaJUSUNG ENG CO LTD·Filed 2002·Granted Nov 25, 2003·5 cites·8 claims
- 1543US2004177992A1Grounding cable and semiconductor manufacturing apparatus using the sameFiled 2004·Application pending·0 cites
- 1642US7465672B2Method of forming etching maskJUSUNG ENG CO LTD·Filed 2006·Granted Dec 16, 2008·0 cites·7 claims
- 1742US2003183906A1Grounding cable and semiconductor manufacturing apparatus using the sameFiled 2003·Application pending·0 cites
- 1840US8460469B2Apparatus for etching substrate and method of etching substrate using the sameKWON GI-CHUNG·Filed 2009·Granted Jun 11, 2013·0 cites·16 claims
- 1939US12315710B2Plasma diagnosis system and plasma diagnosis methodUNIV KWANGWOON IND ACAD COLLAB·Filed 2020·Granted May 27, 2025·0 cites·13 claims
- 2037US6768269B2Plasma process chamber monitoring method and system used thereforJUSUNG ENG CO LTD·Filed 2002·Granted Jul 27, 2004·0 cites·6 claims
- 2137US2002007794A1Plasma processing apparatusFiled 2001·Application pending·0 cites
- 2236US2003051814A1Manufacturing apparatus of a semiconductor device having a sensing systemFiled 2002·Application pending·0 cites
- 2334US2002189763A1Plasma processing apparatus having parallel resonance antenna for very high frequencyJUSUNG ENG CO LTD·Filed 2002·Application pending·0 cites
- 2433US6685800B2Apparatus for generating inductively coupled plasmaJUSUNG ENG CO LTD·Filed 2001·Granted Feb 3, 2004·0 cites·11 claims
- 2533US2003095072A1Antenna electrode for inductively coupled plasma generation apparatusFiled 2002·Application pending·0 cites
- 2630US2003052087A1Plasma generating apparatus and SiO2 thin film etching method using the sameJUSUNG ENGINEERING CO·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →