Inventor · disambiguated record
Gouji Wakamatsu
Also filed as: WAKAMATSU GOUJI
18 granted patents·2 pending applications·23 citations·filing 2007–2021
90Inventor score
Top patents by PatentIndex Score
20 records- 0189US9400429B2Composition for forming a resist underlayer film, and pattern-forming methodJSR CORP·Filed 2015·Granted Jul 26, 2016·7 cites·16 claims
- 0284US8697343B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionNAKAGAWA HIROKI·Filed 2007·Granted Apr 15, 2014·7 cites·8 claims
- 0378US11036133B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2019·Granted Jun 15, 2021·0 cites·18 claims
- 0476US11681222B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2021·Granted Jun 20, 2023·0 cites·20 claims
- 0575US8697344B2Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist patternJSR CORP·Filed 2013·Granted Apr 15, 2014·2 cites·6 claims
- 0668US8808974B2Method for forming patternJSR CORP·Filed 2013·Granted Aug 19, 2014·2 cites·4 claims
- 0767US11003079B2Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compoundJSR CORP·Filed 2018·Granted May 11, 2021·1 cites·19 claims
- 0867US10620534B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2018·Granted Apr 14, 2020·0 cites·14 claims
- 0963US8877429B2Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the sameWAKAMATSU GOUJI·Filed 2011·Granted Nov 4, 2014·2 cites·5 claims
- 1061US10082733B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2016·Granted Sep 25, 2018·0 cites·14 claims
- 1161US9213236B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2014·Granted Dec 15, 2015·0 cites·11 claims
- 1259US9500950B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2015·Granted Nov 22, 2016·0 cites·13 claims
- 1357US8501385B2Positive-type radiation-sensitive composition, and resist pattern formation methodANNO YUSUKE·Filed 2011·Granted Aug 6, 2013·1 cites·12 claims
- 1457US8431332B2Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist patternKOUNO DAITA·Filed 2008·Granted Apr 30, 2013·1 cites·6 claims
- 1553US9029067B2Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the sameJSR CORP·Filed 2014·Granted May 12, 2015·0 cites·12 claims
- 1647US9696626B2Composition for forming a resist underlayer film, and pattern-forming methodJSR CORP·Filed 2016·Granted Jul 4, 2017·0 cites·19 claims
- 1747US2010068650A1Positive-working radiation-sensitive composition and method for resist pattern formation using the compositionNISHIMURA YUKIO·Filed 2008·Application pending·0 cites
- 1846US2021286267A1Composition, resist underlayer film, and resist pattern-forming methodJSR CORP·Filed 2021·Application pending·0 cites
- 1935US8206894B2Resist pattern-forming method and resist pattern miniaturizing resin compositionABE TAKAYOSHI·Filed 2010·Granted Jun 26, 2012·0 cites·11 claims
- 2031US10146131B2Composition, method for producing patterned substrate, film and forming method thereof, and compoundJSR CORP·Filed 2015·Granted Dec 4, 2018·0 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →