Inventor · disambiguated record
Haruo Iwasaki
Also filed as: IWASAKI HARUO
12 granted patents·4 pending applications·181 citations·filing 1995–2018
90Inventor score
Top patents by PatentIndex Score
16 records- 0184US5907772AMethod of producing cylindrical storage node of stacked capacitor in memory cellNEC CORP·Filed 1997·Granted May 25, 1999·56 cites·11 claims
- 0283US5646603ARemote control apparatus for recording/playback equipmentSONY CORP·Filed 1995·Granted Jul 8, 1997·90 cites·9 claims
- 0363US6566041B2Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow processNEC ELECTRONICS CORP·Filed 2001·Granted May 20, 2003·8 cites·9 claims
- 0455US6524945B2Method of making an anti-reflection structure for a conductive layer in a semiconductor deviceNEC CORP·Filed 2002·Granted Feb 25, 2003·4 cites·6 claims
- 0551US6864021B2Photomask and pattern forming method used in a thermal flow process and semiconductor integrated circuit fabricated using the thermal flow processNEC ELECTRONICS CORP·Filed 2003·Granted Mar 8, 2005·3 cites·8 claims
- 0649US6841318B2Levenson phase shift mask and method for forming fine pattern by using the sameNEC ELECTRONICS CORP·Filed 2002·Granted Jan 11, 2005·2 cites·13 claims
- 0746US6525353B1Anti-reflection structure for a conductive layer in a semiconductor deviceNEC CORP·Filed 2000·Granted Feb 25, 2003·1 cites·3 claims
- 0844US6274427B1Method of manufacturing a DRAM capacitorNEC CORP·Filed 2000·Granted Aug 14, 2001·2 cites·12 claims
- 0942US6200845B1Method of forming a storage capacitorNEC CORP·Filed 2000·Granted Mar 13, 2001·2 cites·8 claims
- 1040US6090523AMulti-resin material for an antireflection film to be formed on a workpiece disposed on a semiconductor substrateNEC CORP·Filed 1998·Granted Jul 18, 2000·7 cites·6 claims
- 1138US11468184B2Data protection system, data protection method, and recording mediumKYUSHU ELECTRIC POWER·Filed 2018·Granted Oct 11, 2022·0 cites·7 claims
- 1236US2002058188A1Method for rescuing levenson phase shift mask from abnormal difference in transmittance and phase difference between phase shifter and non-phase shifterNEC CORP·Filed 2001·Application pending·0 cites
- 1336US2002177049A1Phase-shifting mask and method of fabricating the sameNEC CORP·Filed 2002·Application pending·0 cites
- 1436US2003091909A1Phase shift mask and fabrication method thereforFiled 2002·Application pending·0 cites
- 1535US6200853B1Method of manufacturing semiconductor device having capacitor contact holesNEC CORP·Filed 1999·Granted Mar 13, 2001·6 cites·22 claims
- 1634US2002197544A1Halftone phase shift mask and its manufacturing methodFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →