Inventor · disambiguated record
Haruo Iwasawa
Also filed as: IWASAWA HARUO
13 granted patents·5 pending applications·582 citations·filing 1997–2009
94Inventor score
Top patents by PatentIndex Score
18 records- 0195US6908722B2Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Jun 21, 2005·200 cites·21 claims
- 0295US6531260B2Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Mar 11, 2003·54 cites·12 claims
- 0393US7288359B2Radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Oct 30, 2007·33 cites·13 claims
- 0491US6403280B1Radiation sensitive resin compositionJSR CORP·Filed 2000·Granted Jun 11, 2002·46 cites·23 claims
- 0589US6187504B1Radiation sensitive resin compositionJSR CORP·Filed 1997·Granted Feb 13, 2001·69 cites·11 claims
- 0689US6180316B1Radiation sensitive resin compositionJSR CORP·Filed 1999·Granted Jan 30, 2001·68 cites·21 claims
- 0781US7108955B2Polysiloxane, process for production thereof and radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Sep 19, 2006·20 cites·17 claims
- 0879US7473443B2Composition for forming silicon film and method for forming silicon filmJSR CORP·Filed 2003·Granted Jan 6, 2009·22 cites·12 claims
- 0978US7223802B2High order silane composition, and method of forming silicon film using the compositionJSR CORP·Filed 2003·Granted May 29, 2007·21 cites·8 claims
- 1077US6322949B2Radiation sensitive resin compositionJSR CORP·Filed 2000·Granted Nov 27, 2001·13 cites·4 claims
- 1176US7244549B2Pattern forming method and bilayer filmJSR CORP·Filed 2002·Granted Jul 17, 2007·30 cites·21 claims
- 1258US6846895B2Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Jan 25, 2005·3 cites·20 claims
- 1352US2007248911A1Pattern forming method and bilayer filmIWASAWA HARUO·Filed 2007·Application pending·0 cites
- 1452US2007190265A1High order silane composition, and method of forming silicon film using the compositionAOKI TAKASHI·Filed 2007·Application pending·0 cites
- 1551US2009215920A1Silane polymer and method for forming silicon filmJSR CORP·Filed 2009·Application pending·0 cites
- 1645US2010029057A1Silicone resin composition and method of forming a trench isolationJSR CORP·Filed 2007·Application pending·0 cites
- 1744US7718228B2Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming sameJSR CORP·Filed 2004·Granted May 18, 2010·3 cites·20 claims
- 1843US2006159859A1Silane polymer and method for forming silicon filmJSR CORP·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →