Inventor · disambiguated record
Haruhiko Komoriya
Also filed as: KOMORIYA HARUHIKO
57 granted patents·7 pending applications·500 citations·filing 1988–2014
98Inventor score
Files withCENTRAL GLASS CO LTD38SHINETSU CHEMICAL CO10KOMORIYA HARUHIKO4MAEDA KAZUHIKO3SUMIDA SHINICHI2
Top patents by PatentIndex Score
64 records- 0198US7354693B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 8, 2008·54 cites·8 claims
- 0294US6176891B1Coated granular fertilizer and method for producing sameCENTRAL GLASS CO LTD·Filed 1998·Granted Jan 23, 2001·87 cites·13 claims
- 0393US6322606B1Coated granular fertilizer and method for producing sameCENTRAL GLASS CO LTD·Filed 2000·Granted Nov 27, 2001·47 cites·28 claims
- 0491US7276623B2Polymerizable ester compoundsCENTRAL GLASS CO LTD·Filed 2006·Granted Oct 2, 2007·10 cites·3 claims
- 0591US6858760B2Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning methodCENTRAL GLASS CO LTD·Filed 2004·Granted Feb 22, 2005·26 cites·15 claims
- 0690US7402626B2Top coat compositionCENTRAL GLASS CO LTD·Filed 2004·Granted Jul 22, 2008·31 cites·11 claims
- 0788US7488567B2Polymer, resist composition and patterning processPANASONIC CORP·Filed 2006·Granted Feb 10, 2009·9 cites·20 claims
- 0887US7666967B2Ester compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 23, 2010·5 cites·4 claims
- 0987US7125943B2Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositionsCENTRAL GLASS CO LTD·Filed 2003·Granted Oct 24, 2006·19 cites·10 claims
- 1083US8592508B2Top coat compositionKOMORIYA HARUHIKO·Filed 2009·Granted Nov 26, 2013·7 cites·8 claims
- 1183US6875556B2Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Apr 5, 2005·20 cites·9 claims
- 1282US8822588B2Fluorine-containing polymer and anti-static agent wherein same is usedTERUI YOSHIHARU·Filed 2009·Granted Sep 2, 2014·7 cites·9 claims
- 1380US8716385B2Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formationKOMORIYA HARUHIKO·Filed 2009·Granted May 6, 2014·4 cites·2 claims
- 1480US7417100B2Transparent fluorine-containing copolymerCENTRAL GLASS CO LTD·Filed 2005·Granted Aug 26, 2008·4 cites·6 claims
- 1577US7232917B2Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formationCENTRAL GLASS CO LTD·Filed 2004·Granted Jun 19, 2007·14 cites·15 claims
- 1676US7105618B2Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using sameCENTRAL GLASS CO LTD·Filed 2002·Granted Sep 12, 2006·8 cites·22 claims
- 1775US7947422B2Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositionsCENTRAL GLASS CO LTD·Filed 2006·Granted May 24, 2011·2 cites·7 claims
- 1875US7125641B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·13 cites·17 claims
- 1975US6872514B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 29, 2005·13 cites·16 claims
- 2074US8691491B2Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositionsSUMIDA SHINICHI·Filed 2011·Granted Apr 8, 2014·2 cites·5 claims
- 2174US7125643B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·11 cites·16 claims
- 2272US7060771B2Transparent fluorine-containing copolymerCENTRAL GLASS CO LTD·Filed 2002·Granted Jun 13, 2006·9 cites·5 claims
- 2371US6943271B2Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in sameCENTRAL GLASS CO LTD·Filed 2003·Granted Sep 13, 2005·7 cites·14 claims
- 2470US9318764B2Proton conducting polymer membrane, membrane-electrode assembly using same, and polymer electrolyte fuel cellTANAKA TORU·Filed 2012·Granted Apr 19, 2016·1 cites·11 claims
- 2567US8211612B2Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic patternMAEDA KAZUHIKO·Filed 2006·Granted Jul 3, 2012·3 cites·12 claims
- 2667US7122292B2Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using sameCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 17, 2006·8 cites·8 claims
- 2766US7067231B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Jun 27, 2006·19 cites·7 claims
- 2864US7169869B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2005·Granted Jan 30, 2007·1 cites·8 claims
- 2964US6824955B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Nov 30, 2004·7 cites·11 claims
- 3063US8445551B2Solid electrolyte membrane for fuel cell and process for producing sameOBARA YOSHIHIKO·Filed 2010·Granted May 21, 2013·1 cites·17 claims
- 3163US7125642B2Sulfonates, polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·6 cites·19 claims
- 3262US9678425B2Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formationCENTRAL GLASS CO LTD·Filed 2014·Granted Jun 13, 2017·0 cites·3 claims
- 3362US9678426B2Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formationCENTRAL GLASS CO LTD·Filed 2014·Granted Jun 13, 2017·0 cites·3 claims
- 3462US9310682B2Positive-type resist compositionTERUI YOSHIHARU·Filed 2012·Granted Apr 12, 2016·1 cites·12 claims
- 3562US6916592B2Esters, polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2003·Granted Jul 12, 2005·16 cites·20 claims
- 3657US7399815B2Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymersCENTRAL GLASS CO LTD·Filed 2006·Granted Jul 15, 2008·0 cites·7 claims
- 3755US8115036B2Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming patternKOMORIYA HARUHIKO·Filed 2010·Granted Feb 14, 2012·0 cites·11 claims
- 3855US7569323B2Resist protective coating material and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Aug 4, 2009·4 cites·20 claims
- 3955US2013216960A1Water Repellent Additive for Immersion ResistCENTRAL GLASS CO LTD·Filed 2013·Application pending·0 cites
- 4054US7736835B2Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming patternCENTRAL GLASS CO LTD·Filed 2005·Granted Jun 15, 2010·0 cites·12 claims
- 4154US7241553B2Polymer, resist composition, and patterning processCENTRAL GLASS CO LTD·Filed 2005·Granted Jul 10, 2007·4 cites·16 claims
- 4253US7781602B2Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the sameCENTRAL GLASS CO LTD·Filed 2007·Granted Aug 24, 2010·0 cites·8 claims
- 4352US7378218B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted May 27, 2008·3 cites·7 claims
- 4451US9512070B2Method for producing compound containing BIS (perfluoroalkylsulfonyl) methyl group and salt thereof, and solid electrolyte membrane produced using sameCENTRAL GLASS CO LTD·Filed 2013·Granted Dec 6, 2016·0 cites·11 claims
- 4550US7001707B2Resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Feb 21, 2006·2 cites·8 claims
- 4648US2012064459A1Water Repellent Additive for Immersion ResistMAEDA KAZUHIKO·Filed 2010·Application pending·0 cites
- 4747US9650451B2Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositionsCENTRAL GLASS CO LTD·Filed 2014·Granted May 16, 2017·0 cites·5 claims
- 4847US9204652B2Antibacterial agent, substrate surface treatment method using the same, antibacterial agent composition, and substrate surface treatment method using the sameKOMORIYA HARUHIKO·Filed 2011·Granted Dec 8, 2015·0 cites·30 claims
- 4947US7109383B2Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymersCENTRAL GLASS CO LTD·Filed 2003·Granted Sep 19, 2006·1 cites·2 claims
- 5047US6855477B2Chemically amplified resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Feb 15, 2005·1 cites·5 claims
Showing the top 50 of 64 patent records by PatentIndex Score.
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