Inventor · disambiguated record
Han-Wen Liao
Also filed as: Liao han-wen
20 granted patents·1 pending application·15 citations·filing 2013–2024
90Inventor score
Top patents by PatentIndex Score
21 records- 0191US10504737B2Methods of enhancing surface topography on a substrate for inspectionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 10, 2019·5 cites·20 claims
- 0290US10446662B2Reducing metal gate overhang by forming a top-wide bottom-narrow dummy gate electrodeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 15, 2019·6 cites·20 claims
- 0386US12489001B2Wet etch apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Dec 2, 2025·0 cites·20 claims
- 0478US10784114B2Methods of enhancing surface topography on a substrate for inspectionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 22, 2020·1 cites·20 claims
- 0578US9064741B1Uniformity in wafer patterning using feedback controlTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 23, 2015·3 cites·20 claims
- 0673US12249520B2Wet etch apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 11, 2025·0 cites·20 claims
- 0771US11222788B2Methods of enhancing surface topography on a substrate for inspectionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 11, 2022·0 cites·20 claims
- 0869US12142664B2Reducing metal gate overhang by forming a top-wide bottom-narrow dummy gate electrodeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 12, 2024·0 cites·20 claims
- 0963US11107707B2Wet etch apparatus and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 31, 2021·0 cites·20 claims
- 1054US11011426B2Semiconductor device and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 18, 2021·0 cites·20 claims
- 1154US2018350948A1Reducing metal gate overhang by forming a top-wide bottom-narrow dummy gate electrodeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Application pending·0 cites
- 1253US10879052B2Plasma processing apparatus and manufacturing method using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 29, 2020·0 cites·20 claims
- 1353US10872788B2Wet etch apparatus and method for using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 22, 2020·0 cites·20 claims
- 1451US9362185B2Uniformity in wafer patterning using feedback controlTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jun 7, 2016·0 cites·20 claims
- 1548US10026638B2Plasma distribution controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jul 17, 2018·0 cites·20 claims
- 1648US9324578B2Hard mask reshapingTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Apr 26, 2016·0 cites·20 claims
- 1746US9412606B2Target dimension uniformity for semiconductor wafersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 9, 2016·0 cites·20 claims
- 1846US9087793B2Method for etching target layer of semiconductor device in etching apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jul 21, 2015·0 cites·20 claims
- 1945US10872760B2Cluster tool and manufacuturing method of semiconductor structure using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 22, 2020·0 cites·20 claims
- 2044US11367591B2Composite plasma modulator for plasma chamberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 21, 2022·0 cites·20 claims
- 2136US11626315B2Semiconductor structure and planarization method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 11, 2023·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →