Inventor · disambiguated record
Hartmut Steppan
Also filed as: LOHAUS GERHARD · STEPPAN HARTMUT
15 granted patents·241 citations·filing 1974–1991
94Inventor score
Top patents by PatentIndex Score
15 records- 0193US4966828ACarbonylmethylene-heterocyclic compounds containing trihalogenomethyl groups, process for their preparation, and light-sensitive mixture containing the compoundsHOECHST AG·Filed 1984·Granted Oct 30, 1990·31 cites·13 claims
- 0283US4506003APositive-working radiation-sensitive mixtureHOECHST AG·Filed 1983·Granted Mar 19, 1985·42 cites·13 claims
- 0382US5200299AQuinoline and acridine compounds effective as photoinitiators and containing polymerizable (meth)acryloyl substituentsHOECHST AG·Filed 1989·Granted Apr 6, 1993·18 cites·13 claims
- 0478US3985566APhotosensitive crosslinkable 1-carbonyloxy-1H-naphthalene-2-one polymers and process for their preparationHOECHST AG·Filed 1975·Granted Oct 12, 1976·19 cites·10 claims
- 0574US4776892AProcess for stripping light-hardened photoresist layersHOECHST AG·Filed 1986·Granted Oct 11, 1988·22 cites·10 claims
- 0673US3969323APhoto-crosslinkable 2-pyrone polymers and processes for the manufacture thereofHOECHST AG·Filed 1974·Granted Jul 13, 1976·17 cites·16 claims
- 0768US4659645APhotosensitive mixture and photosensitive recording material with diazonium salt polycondensation product and free radical radiation polymerizable compositionHOECHST AG·Filed 1985·Granted Apr 21, 1987·20 cites·5 claims
- 0863US4956264ARadiation-polymerizable mixtureHOECHST AG·Filed 1986·Granted Sep 11, 1990·16 cites·18 claims
- 0960US4401520AProcess for the preparation of screen printing stencils by an electroplating methodHOECHST AG·Filed 1981·Granted Aug 30, 1983·16 cites·7 claims
- 1058US5162190A1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compoundsHOECHST AG·Filed 1989·Granted Nov 10, 1992·5 cites·21 claims
- 1157US4021243ADiazo light-sensitive copying composition and process of using in the manufacture of screen printing stencilsHOECHST AG·Filed 1976·Granted May 3, 1977·10 cites·27 claims
- 1252US5217845APhotopolymerizable mixture and photopolymerizable copying material containing sameHOECHST AG·Filed 1991·Granted Jun 8, 1993·11 cites·15 claims
- 1339US4661432ALight-sensitive, diazonium group-containing polycondensation product, process for its production, and light-sensitive recording material containing this polycondensation productHOECHST AG·Filed 1986·Granted Apr 28, 1987·4 cites·10 claims
- 1439US4159202APhotopolymer having 2-pyridone side groupHOECHST AG·Filed 1977·Granted Jun 26, 1979·5 cites·10 claims
- 1538US4492748ALight-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewithLUTZ WALTER·Filed 1982·Granted Jan 8, 1985·5 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →