Inventor · disambiguated record
Hatsuyuki Tanaka
Also filed as: TANAKA HATSUYUKI
39 granted patents·1,048 citations·filing 1986–2002
98Inventor score
Files withTOKYO OHKA KOGYO CO LTD19CLARIANT FINANCE BVI LTD11AZ ELECTRONIC MATERIALS USA3CLARIANT INT LTD2CLARIANT INTERNAITONAL LTD1
Top patents by PatentIndex Score
39 records- 0197US6555607B1Water-soluble resin compositionCLARIANT FINANCE BVI LTD·Filed 2000·Granted Apr 29, 2003·130 cites·9 claims
- 0293US4833067ADeveloping solution for positive-working photoresist comprising tmah and non-ionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted May 23, 1989·75 cites·1 claims
- 0389US4824762AMethod for rinse treatment of a substrateTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Apr 25, 1989·55 cites·6 claims
- 0488US6737492B2Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coatingCLARIANT FINANCE BVI LTD·Filed 2002·Granted May 18, 2004·28 cites·15 claims
- 0587US6803168B1Composition for anti-reflective coating or radiation absorbing coating and compounds used in the compositionCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 12, 2004·55 cites·27 claims
- 0687US4731319APositive-working naphthoquinone diazide photoresist composition with two cresol novolac resinsTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Mar 15, 1988·48 cites·2 claims
- 0786US5496402AMethod and liquid coating composition for the formation of silica-based coating film on substrate surfaceTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Mar 5, 1996·43 cites·12 claims
- 0884US6277750B1Composition for bottom reflection preventive film and novel polymeric dye for use in the sameCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 21, 2001·48 cites·18 claims
- 0984US5520952AMethod for forming a protective coating film on electronic parts and devicesTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted May 28, 1996·37 cites·7 claims
- 1083US4784937ADeveloping solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Nov 15, 1988·35 cites·2 claims
- 1181US6309789B1Composition for reflection reducing coatingCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 30, 2001·45 cites·5 claims
- 1281US4873177AMethod for forming a resist pattern on a substrate surface and a scum-remover thereforTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Oct 10, 1989·31 cites·3 claims
- 1379US6329117B1Antireflection or light-absorbing coating composition and polymer thereforCLARIANT INT LTD·Filed 1998·Granted Dec 11, 2001·60 cites·26 claims
- 1479US5368783ANegative-working radiation-sensitive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Nov 29, 1994·32 cites·9 claims
- 1576US6692892B1Composition for antireflection coatingCLARIANT FINANCE BVI LTD·Filed 2000·Granted Feb 17, 2004·13 cites·6 claims
- 1674US7141177B2Etching method and composition for forming etching protective layerAZ ELECTRONIC MATERIALS USA·Filed 2002·Granted Nov 28, 2006·17 cites·17 claims
- 1772US4944893ARemover solution for resistTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jul 31, 1990·32 cites·7 claims
- 1868US4882260APositive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dyeTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Nov 21, 1989·19 cites·5 claims
- 1967US5543268ADeveloper solution for actinic ray-sensitive resistTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Aug 6, 1996·17 cites·9 claims
- 2067US4906549APositive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atomsTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Mar 6, 1990·15 cites·5 claims
- 2166US4804612AHighly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturationTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Feb 14, 1989·17 cites·9 claims
- 2265US6939661B2Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefromCLARIANT FINANCE BVI LTD·Filed 2002·Granted Sep 6, 2005·7 cites·2 claims
- 2365US6255405B1Light-absorbing polymers and application thereof to anti-reflection filmCLARIANT INT LTD·Filed 1999·Granted Jul 3, 2001·26 cites·8 claims
- 2462US6465148B1Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefromCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 15, 2002·24 cites·4 claims
- 2562US6465161B1Method for forming resist patternCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 15, 2002·21 cites·3 claims
- 2662US5985525ADeveloper solution for photoresist compositionTOKYO OHTA KOGYO CO LTD·Filed 1993·Granted Nov 16, 1999·18 cites·9 claims
- 2758US7195863B2Development defect preventing process and materialAZ ELECTRONIC MATERIALS USA·Filed 2001·Granted Mar 27, 2007·8 cites·7 claims
- 2858US6329126B1Developer solution for acitinic ray sensitive resistTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Dec 11, 2001·12 cites·1 claims
- 2956US6468718B1Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coatingCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 22, 2002·14 cites·10 claims
- 3053US4997748ADeveloper solution for positive-working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Mar 5, 1991·10 cites·4 claims
- 3148US5853471AComposition for anti-reflection coatingHOECHST JAPAN·Filed 1997·Granted Dec 29, 1998·10 cites·20 claims
- 3247US7018785B2Method for forming pattern and treating agent for use thereinAZ ELECTRONIC MATERIALS USA·Filed 2001·Granted Mar 28, 2006·3 cites·8 claims
- 3347US5614251AMethod and liquid coating composition for the formation of silica-based coating film on substrate surfaceTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Mar 25, 1997·10 cites·3 claims
- 3441US5662961AMethod for forming a protective coating film on electronic parts and devicesTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Sep 2, 1997·9 cites·4 claims
- 3541US5457153ALiquid coating compositionTOKYO OHKA KOGYO CO LTD·Filed 1994·Granted Oct 10, 1995·4 cites·4 claims
- 3638US5281508APositive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresolTOKYO OHKA KOGYO CO LTD·Filed 1992·Granted Jan 25, 1994·4 cites·3 claims
- 3736US6080522ARadiation-sensitive resist composition with high heat resistanceCLARIANT INTERNAITONAL LTD·Filed 1998·Granted Jun 27, 2000·7 cites·6 claims
- 3835US5100758APositive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solventTOKYO OHKA KOBYO CO LTD·Filed 1990·Granted Mar 31, 1992·5 cites·6 claims
- 3927US6184305B1Radiation absorbing polymer and synthesis thereofCLARIANT FINANCE BVI LTD·Filed 1998·Granted Feb 6, 2001·4 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →