Inventor · disambiguated record
Henning Haffner
Also filed as: HAFFNER HENNING
40 granted patents·8 pending applications·793 citations·filing 1999–2021
98Inventor score
Files withINFINEON TECHNOLOGIES AG23HAFFNER HENNING8IBM5GUTMANN ALOIS2ADVANCED MASK TECHNOLOGY CT GMBH1
Top patents by PatentIndex Score
48 records- 0198US6421820B1Semiconductor device fabrication using a photomask with assist featuresINFINEON TECHNOLOGIES AG·Filed 1999·Granted Jul 16, 2002·293 cites·44 claims
- 0297US6426269B1Dummy feature reduction using optical proximity effect correctionIBM·Filed 1999·Granted Jul 30, 2002·210 cites·10 claims
- 0396US8365108B2Generating cut mask for double-patterning processIBM·Filed 2011·Granted Jan 29, 2013·20 cites·24 claims
- 0496US7785946B2Integrated circuits and methods of design and manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2007·Granted Aug 31, 2010·30 cites·17 claims
- 0587US8078998B2Integrated circuits and methods of design and manufacture thereofHAFFNER HENNING·Filed 2010·Granted Dec 13, 2011·5 cites·29 claims
- 0687US6631511B2Generating mask layout data for simulation of lithographic processesINFINEON TECHNOLOGIES AG·Filed 2001·Granted Oct 7, 2003·48 cites·41 claims
- 0785US7947431B2Lithography masks and methods of manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2010·Granted May 24, 2011·7 cites·19 claims
- 0884US9767244B2Integrated circuits and methods of design and manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2016·Granted Sep 19, 2017·2 cites·31 claims
- 0984US6571383B1Semiconductor device fabrication using a photomask designed using modeling and empirical testingINFINEON TECHNOLOGIES AG·Filed 2000·Granted May 27, 2003·27 cites·51 claims
- 1082US8809958B2Integrated circuits and methods of design and manufacture thereofHAFFNER HENNING·Filed 2011·Granted Aug 19, 2014·3 cites·25 claims
- 1180US8161421B2Calibration and verification structures for use in optical proximity correctionVISWANATHAN RAMYA·Filed 2008·Granted Apr 17, 2012·10 cites·9 claims
- 1280US8071261B2Lithography masks and methods of manufacture thereofGUTMANN ALOIS·Filed 2007·Granted Dec 6, 2011·6 cites·37 claims
- 1379US7945869B2Mask and method for patterning a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2007·Granted May 17, 2011·5 cites·26 claims
- 1478US8099684B2Methodology of placing printing assist feature for random mask layoutMEIRING JASON E·Filed 2009·Granted Jan 17, 2012·6 cites·25 claims
- 1578US7354684B2Test pattern and method of evaluating the transfer properties of a test patternADVANCED MASK TECHNOLOGY CT GMBH·Filed 2007·Granted Apr 8, 2008·6 cites·17 claims
- 1675US7669173B2Semiconductor mask and method of making sameINFINEON TECHNOLOGIES AG·Filed 2006·Granted Feb 23, 2010·3 cites·30 claims
- 1775US7221788B2Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection systemINFINEON TECHNOLOGIES AG·Filed 2003·Granted May 22, 2007·21 cites·10 claims
- 1873US8715909B2Lithography systems and methods of manufacturing using thereofGUTMANN ALOIS·Filed 2007·Granted May 6, 2014·4 cites·23 claims
- 1971US8298953B2Method for defining a separating structure within a semiconductor deviceHAFFNER HENNING·Filed 2010·Granted Oct 30, 2012·2 cites·8 claims
- 2070US9437593B2Silicided semiconductor structure and method of forming the sameINFINEON TECHNOLOGIES AG·Filed 2014·Granted Sep 6, 2016·2 cites·19 claims
- 2170US7799486B2Lithography masks and methods of manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2006·Granted Sep 21, 2010·2 cites·30 claims
- 2270US6232154B1Optimized decoupling capacitor using lithographic dummy fillerINFINEON TECHNOLOGIES CORP·Filed 1999·Granted May 15, 2001·25 cites·12 claims
- 2369US8039203B2Integrated circuits and methods of design and manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2008·Granted Oct 18, 2011·3 cites·26 claims
- 2469US7669176B2System and method for semiconductor device fabrication using modelingINFINEON TECHNOLOGIES AG·Filed 2007·Granted Feb 23, 2010·2 cites·19 claims
- 2567US7094674B2Method for production of contacts on a waferINFINEON TECHNOLOGIES AG·Filed 2003·Granted Aug 22, 2006·13 cites·12 claims
- 2667US6353248B1Optimized decoupling capacitor using lithographic dummy fillerINFINEON TECHNOLOGIES AG·Filed 2000·Granted Mar 5, 2002·11 cites·10 claims
- 2763US10089430B2Integrated circuits and methods of design and manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2017·Granted Oct 2, 2018·0 cites·13 claims
- 2862US8092958B2Mask and method for patterning a semiconductor waferHAFFNER HENNING·Filed 2006·Granted Jan 10, 2012·1 cites·31 claims
- 2961US9324707B2Integrated circuits and methods of design and manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2014·Granted Apr 26, 2016·0 cites·13 claims
- 3060US6756164B2Exposure mask with repaired dummy structure and method of repairing an exposure maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jun 29, 2004·6 cites·12 claims
- 3158US7975246B2MEEF reduction by elongation of square shapesIBM·Filed 2008·Granted Jul 5, 2011·1 cites·20 claims
- 3256US6436585B1Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downsIBM·Filed 2000·Granted Aug 20, 2002·8 cites·26 claims
- 3351US9202710B2Method for defining a separating structure within a semiconductor deviceHAFFNER HENNING·Filed 2012·Granted Dec 1, 2015·0 cites·9 claims
- 3451US8865592B2Silicided semiconductor structure and method of forming the sameYAN JIANG·Filed 2009·Granted Oct 21, 2014·0 cites·4 claims
- 3549US8426114B2L-shaped feature, method of making an L-shaped feature and method of making an L-shaped structureHAFFNER HENNING·Filed 2011·Granted Apr 23, 2013·0 cites·22 claims
- 3648US7124379B2Method for communicating a measuring position of a structural element that is to be formed on a maskINFINEON TECHNOLOGIES AG·Filed 2003·Granted Oct 17, 2006·4 cites·19 claims
- 3747US7056628B2Mask for projecting a structure pattern onto a semiconductor substrateINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jun 6, 2006·1 cites·15 claims
- 3847US2022415780A1Dummy gate patterning lines and integrated circuit structures resulting therefromINTEL CORP·Filed 2021·Application pending·0 cites
- 3946US2009091729A1Lithography Systems and Methods of Manufacturing Using ThereofMAROKKEY SAJAN·Filed 2007·Application pending·0 cites
- 4045US2009191468A1Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist FeaturesIBM·Filed 2008·Application pending·0 cites
- 4144US7304721B2Method for dynamically monitoring a reticleINFINEON TECHNOLOGIES AG·Filed 2004·Granted Dec 4, 2007·4 cites·12 claims
- 4244US2006276019A1Method for production of contacts on a waferGRAF WERNER·Filed 2006·Application pending·0 cites
- 4342US2007226674A1System and method for semiconductor device fabrication using modelingHAFFNER HENNING·Filed 2006·Application pending·0 cites
- 4441US6586308B2Method for producing circuit structures on a semiconductor substrate and semiconductor configuration with functional circuit structures and dummy circuit structuresINFINEON TECHNOLOGIES AG·Filed 2001·Granted Jul 1, 2003·2 cites·6 claims
- 4536US2002138810A1Optical proximity correction (OPC) using automated shape and edge pre-sortingFiled 2001·Application pending·0 cites
- 4634US8875063B2Mask layout formationBAUM ZACHARY·Filed 2010·Granted Oct 28, 2014·0 cites·16 claims
- 4734US2005090925A1Method and device for control of the data flow on application of reticles in a semiconductor component productionINFINEON TECHNOLOGIES AG·Filed 2002·Application pending·0 cites
- 4831US2005214658A1Method for alleviating tolerance restrictions for feature sizes during fabrication of photomasksHAFFNER HENNING·Filed 2005·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Henning Haffner files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →