Inventor · disambiguated record
Hideaki Fukuyo
Also filed as: FUKUYO HIDEAKI
9 granted patents·3 pending applications·473 citations·filing 1993–2021
90Inventor score
Files withJAPAN ENERGY CORP4JX NIPPON MINING & METALS CORP4JX ADVANCED METALS CORP1NIKKO MATERIALS CO LTD1NIPPON MINING CO1
Top patents by PatentIndex Score
12 records- 0194US5693203ASputtering target assembly having solid-phase bonded interfaceJAPAN ENERGY CORP·Filed 1994·Granted Dec 2, 1997·219 cites·3 claims
- 0293US6755948B1Titanium target for sputteringNIKKO MATERIALS CO LTD·Filed 2000·Granted Jun 29, 2004·34 cites·4 claims
- 0389US5456815ASputtering targets of high-purity aluminum or alloy thereofJAPAN ENERGY CORP·Filed 1994·Granted Oct 10, 1995·80 cites·2 claims
- 0487US5415829ASputtering targetNIPPON MINING CO·Filed 1993·Granted May 16, 1995·41 cites·19 claims
- 0585US5466355AMosaic targetJAPAN ENERGY CORP·Filed 1995·Granted Nov 14, 1995·55 cites·4 claims
- 0681US9068258B2Titanium target for sputteringTSUKAMOTO SHIRO·Filed 2011·Granted Jun 30, 2015·2 cites·13 claims
- 0778US5772860AHigh purity titanium sputtering targetsJAPAN ENERGY CORP·Filed 1994·Granted Jun 30, 1998·42 cites·18 claims
- 0871US2018085828A1Sintered compact target and method of producing sintered compactJX NIPPON MINING & METALS CORP·Filed 2017·Application pending·0 cites
- 0964US12132289B2Copper electrode materialJX ADVANCED METALS CORP·Filed 2020·Granted Oct 29, 2024·0 cites·5 claims
- 1062US2011017590A1Sintered Compact Target and Method of Producing Sintered CompactJX NIPPON MINING & METALS CORP·Filed 2008·Application pending·0 cites
- 1160US2021237153A1Sintered compact target and method of producing sintered compactJX NIPPON MINING & METALS CORP·Filed 2021·Application pending·0 cites
- 1250US10781024B2Method for vacuum packing high-purity tin and vacuum-packed high purity tinJX NIPPON MINING & METALS CORP·Filed 2017·Granted Sep 22, 2020·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →