Inventor · disambiguated record
Hirotaka Ichikawa
Also filed as: ICHIKAWA HIROTAKA
8 granted patents·2 pending applications·109 citations·filing 2004–2019
84Inventor score
Top patents by PatentIndex Score
10 records- 0191US7194704B2Design layout preparing methodTOSHIBA KK·Filed 2004·Granted Mar 20, 2007·61 cites·16 claims
- 0280US7266801B2Design pattern correction method and mask pattern producing methodTOSHIBA KK·Filed 2004·Granted Sep 4, 2007·31 cites·20 claims
- 0378US9953126B2Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2014·Granted Apr 24, 2018·4 cites·27 claims
- 0474US7996794B2Mask data processing method for optimizing hierarchical structureTOSHIBA KK·Filed 2007·Granted Aug 9, 2011·8 cites·5 claims
- 0572US7998642B2Mask pattern data creation method and maskTOSHIBA KK·Filed 2009·Granted Aug 16, 2011·3 cites·15 claims
- 0670US9977855B2Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2014·Granted May 22, 2018·2 cites·21 claims
- 0748US10852648B2Mask pattern correction system, and semiconductor device manufacturing method utilizing said correction systemTOSHIBA MEMORY CORP·Filed 2019·Granted Dec 1, 2020·0 cites·18 claims
- 0844US7614026B2Pattern forming method, computer program thereof, and semiconductor device manufacturing method using the computer programTOSHIBA KK·Filed 2006·Granted Nov 3, 2009·0 cites·20 claims
- 0944US2011265047A1Mask data processing method for optimizing hierarchical structureTOSHIBA KK·Filed 2011·Application pending·0 cites
- 1043US2014183702A1Design method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2013·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Hirotaka Ichikawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →