Inventor · disambiguated record
Hironori Ikezawa
Also filed as: IKEZAWA HIRONORI
13 granted patents·1 pending application·185 citations·filing 2002–2013
92Inventor score
Files withNIKON CORP14
Top patents by PatentIndex Score
14 records- 0195US7580197B2Projection optical system and method for photolithography and exposure apparatus and method using sameNIKON CORP·Filed 2007·Granted Aug 25, 2009·34 cites·29 claims
- 0295US7362508B2Projection optical system and method for photolithography and exposure apparatus and method using sameNIKON CORP·Filed 2003·Granted Apr 22, 2008·46 cites·77 claims
- 0394US7688517B2Projection optical system and method for photolithography and exposure apparatus and method using sameNIKON CORP·Filed 2007·Granted Mar 30, 2010·12 cites·35 claims
- 0491US7551362B2Projection optical system and method for photolithography and exposure apparatus and method using sameNIKON CORP·Filed 2007·Granted Jun 23, 2009·8 cites·12 claims
- 0591US6788389B2Production method of projection optical systemNIKON CORP·Filed 2002·Granted Sep 7, 2004·47 cites·49 claims
- 0687US7619827B2Projection optical system and method for photolithography and exposure apparatus and method using sameNIKON CORP·Filed 2007·Granted Nov 17, 2009·10 cites·5 claims
- 0787US7609455B2Projection optical system and method for photolithography and exposure apparatus and method using sameNIKON CORP·Filed 2007·Granted Oct 27, 2009·10 cites·16 claims
- 0884US7701640B2Projection optical system and method for photolithography and exposure apparatus and method using sameNIKON CORP·Filed 2007·Granted Apr 20, 2010·8 cites·17 claims
- 0979US7710653B2Projection optical system, exposure system, and exposure methodNIKON CORP·Filed 2006·Granted May 4, 2010·4 cites·20 claims
- 1067US7557997B2Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical elementNIKON CORP·Filed 2007·Granted Jul 7, 2009·4 cites·26 claims
- 1159US7688422B2Projection optical system, exposure system, and exposure methodNIKON CORP·Filed 2005·Granted Mar 30, 2010·2 cites·44 claims
- 1251US7978310B2Projection optical system, exposure system, and exposure methodNIKON CORP·Filed 2010·Granted Jul 12, 2011·0 cites·14 claims
- 1343US7471374B2Projection optical system, exposure apparatus, and exposure methodNIKON CORP·Filed 2005·Granted Dec 30, 2008·0 cites·36 claims
- 1443US2013278910A1Projection optical assembly, projection optical assembly adjustment method, exposure device, exposure method, and device manufacturing methodNIKON CORP·Filed 2013·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Hironori Ikezawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →