Inventor · disambiguated record
Hiroyuki Inomata
Also filed as: INOMATA HIROYUKI
14 granted patents·1 pending application·296 citations·filing 1993–2007
93Inventor score
Top patents by PatentIndex Score
15 records- 0191US6576344B1Photocatalyst article, anti-fogging, anti-soiling articles, and production method of anti-fogging, anti-soiling articlesNIPPON SHEET GLASS CO LTD·Filed 2000·Granted Jun 10, 2003·56 cites·26 claims
- 0290US6833089B1Article having photocatalytic activityNIPPON SHEET GLASS CO LTD·Filed 2000·Granted Dec 21, 2004·46 cites·9 claims
- 0388US6436542B1Multilayer structure and process for producing the sameNIPPON SHEET GLASS CO LTD·Filed 2000·Granted Aug 20, 2002·38 cites·7 claims
- 0487US6399212B1Silicon dioxide-coated polyolefin resin and process for its productionNIPPON SHEET GLASS CO LTD·Filed 2000·Granted Jun 4, 2002·27 cites·5 claims
- 0584US5330053ACase for photomaskDAINIPPON PRINTING CO LTD·Filed 1993·Granted Jul 19, 1994·47 cites·6 claims
- 0674US5397665APhotomask with pellicle and method of treating and storing the sameDAINIPPON PRINTING CO LTD·Filed 1993·Granted Mar 14, 1995·27 cites·2 claims
- 0771US6913702B2Amorphous material processing method and glass substrateNIPPON SHEET GLASS CO LTD·Filed 2001·Granted Jul 5, 2005·9 cites·26 claims
- 0870US7289173B2Polarizing device, and method for manufacturing the sameNIPPON SHEET GLASS CO LTD·Filed 2001·Granted Oct 30, 2007·11 cites·12 claims
- 0968US5556724APhase shift photomask and method of producing sameDAINIPPON PRINTING CO LTD·Filed 1993·Granted Sep 17, 1996·26 cites·14 claims
- 1059US6801295B2Post exposure modification of critical dimensions in mask fabricationINTEL CORP·Filed 2002·Granted Oct 5, 2004·5 cites·17 claims
- 1150US7045260B2Post exposure modification of critical dimensions in mask fabricationINTEL CORP·Filed 2004·Granted May 16, 2006·2 cites·21 claims
- 1248US7727407B2Amorphous material processing methodNIPPON SHEET GLASS CO LTD·Filed 2005·Granted Jun 1, 2010·2 cites·9 claims
- 1347US2008018997A1Polarizing elementKAWAZU MITSUHIRO·Filed 2007·Application pending·0 cites
- 1438US7045259B2Post exposure modification of critical dimensions in mask fabricationINTEL CORP·Filed 2001·Granted May 16, 2006·0 cites·17 claims
- 1535US7289657B2Method of inspecting photo-maskDAINIPPON PRINTING CO LTD·Filed 2003·Granted Oct 30, 2007·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →