Inventor · disambiguated record
Hidenobu Ishikawa
Also filed as: ISHIKAWA HIDENOBU · TAKAHASHI AKIKAZU
10 granted patents·1 pending application·309 citations·filing 1977–2003
91Inventor score
Top patents by PatentIndex Score
11 records- 0192US5714218AIonizing radiation-curable resin composition for optical article, optical article, and surface light sourceDAINIPPON PRINTING CO LTD·Filed 1995·Granted Feb 3, 1998·108 cites·8 claims
- 0288US6410611B1Active energy ray curable composition comprised of a maleimide derivative and a method for curing the said curable compositionDAINIPPON INK & CHEMICALS·Filed 1998·Granted Jun 25, 2002·63 cites·11 claims
- 0381US4690987AActivation energy-curable resin compositionDAINIPPON INK & CHEMICALS·Filed 1985·Granted Sep 1, 1987·33 cites·13 claims
- 0474US6887967B2Thermosetting polyimide resin composition process for producing polyimide resin, and polyimide resinDAINIPPON INK & CHEMICALS·Filed 2003·Granted May 3, 2005·14 cites·20 claims
- 0570US4855334ACurable resin composition and its useDAINIPPON INK & CHEMICALS·Filed 1985·Granted Aug 8, 1989·18 cites·13 claims
- 0664US4179417AComposition for water-base paint comprising water-soluble resin and water-dispersible polymerDAINIPPON INK & CHEMICALS·Filed 1977·Granted Dec 18, 1979·20 cites·18 claims
- 0759US5155165APolyurethane polyurea particles and process for production thereofDAINIPPON INK & CHEMICALS·Filed 1990·Granted Oct 13, 1992·19 cites·35 claims
- 0857US5304628ARadiation-curing resin compositionDAINIPPON INK & CHEMICALS·Filed 1992·Granted Apr 19, 1994·15 cites·2 claims
- 0955US6784275B2Active energy ray-curable polyimide resin compositionDAINIPPON INK & CHEMICALS·Filed 2002·Granted Aug 31, 2004·7 cites·11 claims
- 1050US5847022ARadiation curable resin composition and method thereforDAINIPPON INK & CHEMICALS·Filed 1996·Granted Dec 8, 1998·12 cites·9 claims
- 1131US2004096757A1Photosensitive resin compositon, photosesitive resist for color filter, and process for producing color filterFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →