Inventor · disambiguated record
Hidenori Kawata
Also filed as: KAWATA HIDENORI
14 granted patents·71 citations·filing 1999–2022
89Inventor score
Top patents by PatentIndex Score
14 records- 0174US7242440B2Electro-optical device and electronic apparatus having coating member coating an inner side wall of a contact holeSEIKO EPSON CORP·Filed 2003·Granted Jul 10, 2007·16 cites·14 claims
- 0274US7161193B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2005·Granted Jan 9, 2007·4 cites·15 claims
- 0374US7053410B2Electro-optical device providing enhanced TFT lifeSEIKO EPSON CORP·Filed 2003·Granted May 30, 2006·16 cites·15 claims
- 0467US6912020B2Electro-optical apparatus, electronic device, substrate for use in an electro-optical apparatus, method of producing a substrate for use in an electro-optical apparatus, and light shielding filmSEIKO EPSON CORP·Filed 2001·Granted Jun 28, 2005·11 cites·10 claims
- 0565US6952243B2Electro-optical apparatus and electronic equipmentSEIKO EPSON CORP·Filed 2003·Granted Oct 4, 2005·10 cites·15 claims
- 0663US7268843B2Liquid crystal display with capacitive light shield between data line and pixel electrodeSEIKO EPSON CORP·Filed 2003·Granted Sep 11, 2007·8 cites·21 claims
- 0758US11762271B2ProjectorSEIKO EPSON CORP·Filed 2022·Granted Sep 19, 2023·0 cites·9 claims
- 0857US10564497B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2018·Granted Feb 18, 2020·0 cites·7 claims
- 0954US11808645B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2021·Granted Nov 7, 2023·0 cites·9 claims
- 1051US11119376B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2019·Granted Sep 14, 2021·0 cites·15 claims
- 1147US10914996B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2019·Granted Feb 9, 2021·0 cites·10 claims
- 1246US6806500B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2003·Granted Oct 19, 2004·3 cites·13 claims
- 1338US8263982B2Thin film transistor with a high impurity region overlapping the gate electrodeKAWATA HIDENORI·Filed 2009·Granted Sep 11, 2012·0 cites·8 claims
- 1438US6467490B1Process for using a high nitrogen concentration plasma for fluorine removal from a reactorTEXAS INSTRUMENTS INC·Filed 1999·Granted Oct 22, 2002·3 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →