Inventor · disambiguated record
Hiroshi Maehara
Also filed as: MAEHARA HIROSHI
44 granted patents·3 pending applications·715 citations·filing 1984–2014
98Inventor score
Top patents by PatentIndex Score
47 records- 0192US6317479B1X-ray mask, and exposure method and apparatus using the sameCANON KK·Filed 1997·Granted Nov 13, 2001·75 cites·21 claims
- 0290US5553110AX-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure methodCANON KK·Filed 1994·Granted Sep 3, 1996·63 cites·15 claims
- 0389US6603128B2Charged-particle beam exposure apparatus and device manufacturing methodCANON KK·Filed 2001·Granted Aug 5, 2003·32 cites·22 claims
- 0486US6728332B2X-ray mask, and exposure method and apparatus using the sameCANON KK·Filed 2001·Granted Apr 27, 2004·20 cites·24 claims
- 0583US5593800AMask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatusCANON KK·Filed 1995·Granted Jan 14, 1997·52 cites·16 claims
- 0681US7019043B2Decomposable resin composition and method for producing the sameCANON KK·Filed 2003·Granted Mar 28, 2006·15 cites·5 claims
- 0781US6479212B1Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure methodCANON KK·Filed 2000·Granted Nov 12, 2002·18 cites·20 claims
- 0881US6317274B1Optical elementCANON KK·Filed 2000·Granted Nov 13, 2001·18 cites·17 claims
- 0981US6101237AX-ray mask and X-ray exposure method using the sameCANON KK·Filed 1997·Granted Aug 8, 2000·45 cites·10 claims
- 1081US5485495AX-ray mask, and exposure apparatus and device production using the maskCANON KK·Filed 1994·Granted Jan 16, 1996·34 cites·16 claims
- 1180US7291679B2Recyclable polymer and process for production thereofCANON KK·Filed 2005·Granted Nov 6, 2007·4 cites·5 claims
- 1278US6476968B1Optical elementCANON KK·Filed 2000·Granted Nov 5, 2002·18 cites·24 claims
- 1374US6421188B1Optical elementCANON KK·Filed 2000·Granted Jul 16, 2002·12 cites·21 claims
- 1473US6594012B2Exposure apparatusCANON KK·Filed 1997·Granted Jul 15, 2003·32 cites·49 claims
- 1570US6652781B2Method for manufacture of optical elementCANON KK·Filed 2001·Granted Nov 25, 2003·6 cites·24 claims
- 1670US6225019B1Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure methodCANON KK·Filed 1999·Granted May 1, 2001·27 cites·28 claims
- 1769US6653364B2Decomposable resin composition and method for producing the sameCANON KK·Filed 2001·Granted Nov 25, 2003·7 cites·1 claims
- 1869US6337161B2Mask structure exposure methodCANON KK·Filed 1998·Granted Jan 8, 2002·26 cites·11 claims
- 1968US5469489AProduction method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structureCANON KK·Filed 1995·Granted Nov 21, 1995·26 cites·17 claims
- 2066US5800949AMask, method of producing a device using the mask and aligner with the maskCANON KK·Filed 1996·Granted Sep 1, 1998·25 cites·13 claims
- 2165US6872952B2Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing methodCANON KK·Filed 2001·Granted Mar 29, 2005·8 cites·25 claims
- 2264US7072438B2Reflection type maskCANON KK·Filed 2003·Granted Jul 4, 2006·5 cites·9 claims
- 2362US7064113B2Resin composition, method of molding the same, and method of recycling resin compositionCANON KK·Filed 2002·Granted Jun 20, 2006·4 cites·8 claims
- 2461US8807761B2Lamp unit and projector employing sameMAEHARA HIROSHI·Filed 2011·Granted Aug 19, 2014·2 cites·6 claims
- 2561US6008942ADiffractive optical element and optical instrument having the sameCANON KK·Filed 1997·Granted Dec 28, 1999·23 cites·7 claims
- 2659US6866973B2Photosensitive resin composition, resist composition, fabricating method for patterned substrate, and deviceCANON KK·Filed 2001·Granted Mar 15, 2005·4 cites·4 claims
- 2758US7608593B2Resin composition with biodegradable non-liquid-crystalline and liquid-crystalline polymersCANON KK·Filed 2005·Granted Oct 27, 2009·0 cites·5 claims
- 2858US5889758AReflection type mask structure and exposure apparatus using the sameCANON KK·Filed 1997·Granted Mar 30, 1999·21 cites·15 claims
- 2958US5375157AX-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structureCANON KK·Filed 1993·Granted Dec 20, 1994·13 cites·11 claims
- 3057US9348202B2Lamp unit and projector employing sameHITACHI CONSUMER ELECTRONICS·Filed 2014·Granted May 24, 2016·0 cites·9 claims
- 3156US5952149AResist solution for photolithography including a base resin and an oxygen-free or low-oxygen solventCANON KK·Filed 1996·Granted Sep 14, 1999·13 cites·5 claims
- 3253US7295357B2Apparatus for handling minute objectCANON KK·Filed 2004·Granted Nov 13, 2007·2 cites·4 claims
- 3352US7122297B2Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and deviceCANON KK·Filed 2004·Granted Oct 17, 2006·2 cites·4 claims
- 3452US2007232742A1Layered silicate compound and resin composition containing the layered silicate compoundCANON KK·Filed 2007·Application pending·0 cites
- 3546US6829091B2Optical system and optical instrument with diffractive optical elementCANON KK·Filed 1999·Granted Dec 7, 2004·11 cites·11 claims
- 3646US5224139AX-ray mask and semiconductor device manufacturing method using the sameCANON KK·Filed 1992·Granted Jun 29, 1993·7 cites·12 claims
- 3745US7009007B2Recyclable polymer, process for production thereof, and recycling treatment thereofCANON KK·Filed 2003·Granted Mar 7, 2006·0 cites·11 claims
- 3845US5882826AMembrane and mask, and exposure apparatus using the mask, and device producing method using the maskCANON KK·Filed 1996·Granted Mar 16, 1999·8 cites·11 claims
- 3944US6795166B2Illuminator, exposure apparatus, and method for fabricating device using the sameCANON KK·Filed 1998·Granted Sep 21, 2004·8 cites·10 claims
- 4044US5870448AX-ray mask and fabrication process using itCANON KK·Filed 1997·Granted Feb 9, 1999·8 cites·6 claims
- 4144US5733688ALithographic mask structure and method of producing the same comprising W and molybdenum alloy absorberCANON KK·Filed 1995·Granted Mar 31, 1998·10 cites·10 claims
- 4237US5861603AMask structure and method of making the sameCANON KK·Filed 1997·Granted Jan 19, 1999·6 cites·7 claims
- 4336US6087076AMethod of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environmentCANON KK·Filed 1997·Granted Jul 11, 2000·3 cites·7 claims
- 4430US2002030890A1Diffractive optical element and optical system having the sameFiled 1998·Application pending·0 cites
- 4530US2002027301A1Method for manufacture of optical elementFiled 1999·Application pending·0 cites
- 4629US4585834ASilicon-containing step ladder polymer and a process for producing the sameCHISSO CORP·Filed 1985·Granted Apr 29, 1986·2 cites·32 claims
- 4725US4602065ASilicon-containing step ladder polymer and a process for producing the sameCHISSO CORP·Filed 1984·Granted Jul 22, 1986·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →