Inventor · disambiguated record
Hisataka Meguro
Also filed as: MEGURO HISATAKA
19 granted patents·8 pending applications·199 citations·filing 1997–2017
94Inventor score
Top patents by PatentIndex Score
27 records- 0193US7868376B2Semiconductor storage device and method for manufacturing the sameTOSHIBA KK·Filed 2009·Granted Jan 11, 2011·26 cites·5 claims
- 0292US6235589B1Method of making non-volatile memory with polysilicon spacersTOSHIBA KK·Filed 2000·Granted May 22, 2001·51 cites·9 claims
- 0389US6878985B2Nonvolatile semiconductor memory device having a memory cell that includes a floating gate electrode and control gate electrodeTOSHIBA KK·Filed 2003·Granted Apr 12, 2005·37 cites·7 claims
- 0487US9865616B2Semiconductor memory device and method for manufacturing sameTOSHIBA MEMORY CORP·Filed 2016·Granted Jan 9, 2018·5 cites·15 claims
- 0585US8975178B2Method of manufacturing a memory device using fine patterning techniquesKIKUTANI KEISUKE·Filed 2012·Granted Mar 10, 2015·8 cites·20 claims
- 0683US10367000B2Semiconductor device and method for manufacturing sameTOSHIBA MEMORY CORP·Filed 2017·Granted Jul 30, 2019·3 cites·16 claims
- 0777US8541830B1Nonvolatile semiconductor memory device and method for manufacturing the sameNAGASHIMA SATOSHI·Filed 2012·Granted Sep 24, 2013·5 cites·20 claims
- 0874US8624317B2Nonvolatile semiconductor memory device and method for manufacturing sameARAI FUMITAKA·Filed 2012·Granted Jan 7, 2014·4 cites·20 claims
- 0969US7718483B2Method of manufacturing non-volatile semiconductor memoryTOSHIBA KK·Filed 2006·Granted May 18, 2010·4 cites·12 claims
- 1069US6657251B1Semiconductor memory device having memory transistors with gate electrodes of a double-layer stacked structure and method of fabricating the sameTOSHIBA KK·Filed 2000·Granted Dec 2, 2003·15 cites·20 claims
- 1167US8071449B2Semiconductor storage device and method for manufacturing the sameAOYAMA KENJI·Filed 2010·Granted Dec 6, 2011·2 cites·5 claims
- 1266US7718474B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2007·Granted May 18, 2010·2 cites·15 claims
- 1366US6876565B2Semiconductor memory deviceTOSHIBA KK·Filed 2003·Granted Apr 5, 2005·14 cites·20 claims
- 1465US8592885B2Nonvolatile semiconductor memory device and method for manufacturing the sameKINOSHITA SHIGERU·Filed 2012·Granted Nov 26, 2013·2 cites·17 claims
- 1561US8198665B2Semiconductor storage device and manufacturing method thereofKAWABATA KENJI·Filed 2008·Granted Jun 12, 2012·2 cites·13 claims
- 1658US9059035B2Nonvolatile semiconductor device and its manufacturing method having memory cells with multiple layersNAGASHIMA SATOSHI·Filed 2012·Granted Jun 16, 2015·1 cites·15 claims
- 1758US5880498ASemiconductor device having a nitrogen doped polysilicon layerTOSHIBA KK·Filed 1997·Granted Mar 9, 1999·17 cites·19 claims
- 1855US8748965B2Nonvolatile semiconductor memory deviceNAGASHIMA SATOSHI·Filed 2011·Granted Jun 10, 2014·1 cites·12 claims
- 1944US9953998B2Semiconductor memory device and method for manufacturing sameTOSHIBA MEMORY CORP·Filed 2016·Granted Apr 24, 2018·0 cites·7 claims
- 2044US2010295134A1Semiconductor memory device and method of fabricating the sameNAGASHIMA SATOSHI·Filed 2009·Application pending·0 cites
- 2142US2007262371A1Semiconductor device and manufacturing method thereofMEGURO HISATAKA·Filed 2007·Application pending·0 cites
- 2242US2016322379A1Semiconductor memory device and method of manufacturing the sameTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2342US2010176433A1Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2010·Application pending·0 cites
- 2441US2014070297A1Semiconductor storage device and fabrication method thereofTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2535US2001019152A1Semiconductor device and method of fabricating the sameTOSHIBA KK·Filed 2001·Application pending·0 cites
- 2634US2015263044A1Nonvolatile semiconductor storage device and method of manufacturing the sameTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2732US2016079265A1Nonvolatile semiconductor memory device and method of manufacturing the sameTOSHIBA KK·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →