Inventor · disambiguated record
Hitoshi Morinaga
Also filed as: MORINAGA HITOSHI
32 granted patents·37 pending applications·525 citations·filing 1988–2025
97Inventor score
Top patents by PatentIndex Score
69 records- 0193US5366542APolishing compositionFUJIMI INC·Filed 1992·Granted Nov 22, 1994·109 cites·14 claims
- 0292US7541322B2Cleaning solution for substrate for semiconductor device and cleaning methodMITSUBISHI CHEM CORP·Filed 2006·Granted Jun 2, 2009·22 cites·13 claims
- 0391US8124240B2Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structureOHMI TADAHIRO·Filed 2006·Granted Feb 28, 2012·10 cites·10 claims
- 0489US5885362AMethod for treating surface of substrateMITSUBISHI CHEM CORP·Filed 1996·Granted Mar 23, 1999·89 cites·8 claims
- 0587US8702472B2Polishing composition and polishing method using the sameMORINAGA HITOSHI·Filed 2011·Granted Apr 22, 2014·6 cites·10 claims
- 0685US9476137B2Metal oxide film, laminate, metal member and process for producing the sameOHMI TADAHIRO·Filed 2012·Granted Oct 25, 2016·6 cites·11 claims
- 0784US8206833B2Metal oxide film, laminate, metal member and process for producing the sameOHMI TADAHIRO·Filed 2006·Granted Jun 26, 2012·8 cites·13 claims
- 0884US6896744B2Method for cleaning a surface of a substrateMITSUBISHI CHEM CORP·Filed 2003·Granted May 24, 2005·30 cites·19 claims
- 0983US6228823B1Method for treating surface of substrate and surface treatment composition used for the sameMITSUBISHI CHEM CORP·Filed 1998·Granted May 8, 2001·60 cites·1 claims
- 1082US7621281B2Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the sameMITSUBISHI CHEM CORP·Filed 2007·Granted Nov 24, 2009·7 cites·19 claims
- 1182US4872737AMulti-port fiberoptic rotary jointHITACHI CABLE·Filed 1988·Granted Oct 10, 1989·53 cites·50 claims
- 1282US4848867ARotary joint for polarization plane maintaining optical fibersHITACHI CABLE·Filed 1988·Granted Jul 18, 1989·50 cites·8 claims
- 1380US6498132B2Method for treating surface of substrate and surface treatment composition used for the sameMITSUBISHI CHEM CORP·Filed 2000·Granted Dec 24, 2002·20 cites·10 claims
- 1476US10450651B2Article comprising metal oxide-containing coatingFUJIMI INC·Filed 2013·Granted Oct 22, 2019·1 cites·19 claims
- 1575US7235516B2Semiconductor cleaning composition comprising an ethoxylated surfactantMITSUBISHI CHEM CORP·Filed 2002·Granted Jun 26, 2007·15 cites·23 claims
- 1669US11446784B2Chemical mechanical polishing apparatus for polishing workpieceEBARA CORP·Filed 2019·Granted Sep 20, 2022·0 cites·8 claims
- 1769US8226924B2Method for producing boehmite particles and method for producing alumina particlesMORINAGA HITOSHI·Filed 2009·Granted Jul 24, 2012·2 cites·13 claims
- 1869US6228179B1Surface treatment composition and method for treating surface of substrate by using the sameMITSUBISHI CHEM CORP·Filed 2000·Granted May 8, 2001·11 cites·8 claims
- 1967US2025304828A1Polishing composition, polishing method, and polishing systemFUJIMI INC·Filed 2025·Application pending·0 cites
- 2064US8268735B2Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surfaceOHMI TADAHIRO·Filed 2007·Granted Sep 18, 2012·1 cites·3 claims
- 2164US2024254364A1Polishing composition, polishing method using the polishing composition, and method for producing metallic mold using the polishing compositionFUJIMI INC·Filed 2024·Application pending·0 cites
- 2263US9157011B2Polishing compositionASHITAKA KEIJI·Filed 2011·Granted Oct 13, 2015·2 cites·4 claims
- 2363US9149744B2Filtration method, method for purifying polishing composition using it, method for regenerating filter to be used for filtration, and filter regenerating apparatusMORINAGA HITOSHI·Filed 2009·Granted Oct 6, 2015·1 cites·13 claims
- 2463US9028574B2Polishing compositionASHITAKA KEIJI·Filed 2011·Granted May 12, 2015·2 cites·5 claims
- 2561US2024084170A1Polishing composition and polishing methodFUJIMI INC·Filed 2022·Application pending·0 cites
- 2659US2024350893A1Sliding apparatus and method for manufacturing sameFUJIMI INC·Filed 2022·Application pending·0 cites
- 2758US8632693B2Wetting agent for semiconductors, and polishing composition and polishing method employing itMORINAGA HITOSHI·Filed 2009·Granted Jan 21, 2014·1 cites·10 claims
- 2857US2016355930A1Article having metal oxide coatingFUJIMI INC·Filed 2014·Application pending·0 cites
- 2956US10882157B2Polishing pad and polishing methodFUJIMI INC·Filed 2016·Granted Jan 5, 2021·0 cites·16 claims
- 3056US6143706ASurface treatment composition and method for treating surface of substrate by using the sameMITSUBISHI CHEM CORP·Filed 1998·Granted Nov 7, 2000·18 cites·5 claims
- 3156US2017312880A1Chemical mechanical polishing apparatus for polishing workpieceEBARA CORP·Filed 2015·Application pending·0 cites
- 3256US2024182750A1Polishing composition, method for producing polishing composition, and polishing methodFUJIMI INC·Filed 2022·Application pending·0 cites
- 3355US9028709B2Surface treatment composition and surface treatment method using sameTSUCHIYA KOHSUKE·Filed 2011·Granted May 12, 2015·1 cites·12 claims
- 3454US2024246195A1Method for producing resin member used in production process of electronic devicesFUJIMI INC·Filed 2022·Application pending·0 cites
- 3552US9994748B2Polishing compositionFUJIMI INC·Filed 2014·Granted Jun 12, 2018·0 cites·7 claims
- 3651US11498182B2Polishing method and polishing padFUJIMI INC·Filed 2017·Granted Nov 15, 2022·0 cites·12 claims
- 3751US2007135322A1Substrate surface cleaning liquid medium and cleaning methodMITSUBISHI CHEM CORP·Filed 2007·Application pending·0 cites
- 3850US10434622B2Polishing tool and polishing method for member having curved surface shapeFUJIMI INC·Filed 2015·Granted Oct 8, 2019·0 cites·5 claims
- 3950US2012329284A1Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surfaceOHMI TADAHIRO·Filed 2012·Application pending·0 cites
- 4049US10835805B2Sliding instrument and method for manufacturing sameFUJIMI INC·Filed 2017·Granted Nov 17, 2020·0 cites·13 claims
- 4147US2009133713A1Multilayer structural body and method for cleaning the sameNIHON CERATEC CO LTD·Filed 2006·Application pending·0 cites
- 4246US9879156B2Polishing compositionFUJIMI INC·Filed 2014·Granted Jan 30, 2018·0 cites·8 claims
- 4346US2016236322A1Polishing device, processing method of polishing member, modification method of polishing member, shape processing cutting tool, and surface modification toolFUJIMI INC·Filed 2014·Application pending·0 cites
- 4446US2016236314A1Polishing device and polishing methodFUJIMI INC·Filed 2014·Application pending·0 cites
- 4546US2015360340A1Method for polishing alloy material and method for manufacturing alloy materialFUJIMI INC·Filed 2013·Application pending·0 cites
- 4645US2016167192A1Polishing tool and processing method for memberFUJIMI INC·Filed 2014·Application pending·0 cites
- 4745US2015140906A1Cleaning agent for alloy material, and method for producing alloy materialFUJIMI INC·Filed 2013·Application pending·0 cites
- 4844US2015166862A1Composition for polishing alloy material and method for producing alloy material using sameFUJIMI INC·Filed 2013·Application pending·0 cites
- 4944US2011258938A1Aluminum oxide particle and polishing composition containing the sameFUJIMI INC·Filed 2009·Application pending·0 cites
- 5044US2015291850A1Polishing compositionFUJIMI INC·Filed 2013·Application pending·0 cites
Showing the top 50 of 69 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →