Inventor · disambiguated record
Hiroshi Moriuma
Also filed as: MORIUMA HIROSHI
17 granted patents·3 pending applications·210 citations·filing 1991–2003
94Inventor score
Files withSUMITOMO CHEMICAL CO19
Top patents by PatentIndex Score
20 records- 0182US6835527B2Chemical amplifying type positive resist compositionSUMITOMO CHEMICAL CO·Filed 2002·Granted Dec 28, 2004·48 cites·8 claims
- 0278US5468590APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Nov 21, 1995·24 cites·16 claims
- 0373US6274287B1Positive resist compositions comprising a hydroxyphenyl ketoneSUMITOMO CHEMICAL CO·Filed 2000·Granted Aug 14, 2001·12 cites·7 claims
- 0472US5424167APositive type quinonediazide resist composition containing alkali-soluble novolac resin and aromatic hydroxy compound additiveSUMITOMO CHEMICAL CO·Filed 1993·Granted Jun 13, 1995·25 cites·10 claims
- 0569US6743885B2Resin composition for intermediate layer of three-layer resistSUMITOMO CHEMICAL CO·Filed 2002·Granted Jun 1, 2004·7 cites·12 claims
- 0667US5429904APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Jul 4, 1995·21 cites·17 claims
- 0751US5188920APositive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compoundSUMITOMO CHEMICAL CO·Filed 1991·Granted Feb 23, 1993·10 cites·10 claims
- 0849US6068962APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1997·Granted May 30, 2000·14 cites·8 claims
- 0948US5326665APositive type resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Jul 5, 1994·6 cites·20 claims
- 1047US5451484APositive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Sep 19, 1995·9 cites·16 claims
- 1146US5849457APositive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and γ-SUMITOMO CHEMICAL CO·Filed 1997·Granted Dec 15, 1998·12 cites·4 claims
- 1245US5407780ARadiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehydeSUMITOMO CHEMICAL CO·Filed 1994·Granted Apr 18, 1995·8 cites·21 claims
- 1343US6951706B2Sulfonate and resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Granted Oct 4, 2005·0 cites·15 claims
- 1443US6767686B2Chemically amplifying type positive resist compositionSUMITOMO CHEMICAL CO·Filed 2001·Granted Jul 27, 2004·5 cites·10 claims
- 1543US5275910APositive radiation-sensitive resist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Jan 4, 1994·8 cites·8 claims
- 1639US2001026905A1Positive resist compositionSUMITOMO CHEMICAL CO·Filed 2001·Application pending·0 cites
- 1736US2004191670A1Chemical amplification type positive resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Application pending·0 cites
- 1835US2003180659A1Resist compositionFiled 2003·Application pending·0 cites
- 1932US6815140B2Positive resist compositionSUMITOMO CHEMICAL CO·Filed 1999·Granted Nov 9, 2004·1 cites·5 claims
- 2030US7135268B2Amplification type positive resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Granted Nov 14, 2006·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →