Inventor · disambiguated record
Hideo Nakagawa
Also filed as: NAKAGAWA HIDEO
77 granted patents·38 pending applications·1,390 citations·filing 1990–2025
99Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD48SHINETSU CHEMICAL CO24PANASONIC CORP12TEIJIN LTD7KAKINO YOSHIAKI5
Top patents by PatentIndex Score
115 records- 0198US6381435B2Color image forming apparatusRICOH KK·Filed 2000·Granted Apr 30, 2002·163 cites·15 claims
- 0298US6030667AApparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasmaMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Feb 29, 2000·194 cites·6 claims
- 0395US5215795AShock-absorbing air bagTEIJIN LTD·Filed 1991·Granted Jun 1, 1993·68 cites·20 claims
- 0494US7754330B2Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor deviceSHINETSU CHEMICAL CO·Filed 2009·Granted Jul 13, 2010·24 cites·4 claims
- 0593US5296278AGastight woven fabric sheet for air bags and a process for producing sameTEIJIN LTD·Filed 1992·Granted Mar 22, 1994·66 cites·17 claims
- 0692US6632746B2Etching method, semiconductor and fabricating method for the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Oct 14, 2003·51 cites·23 claims
- 0791US7923522B2Process for preparing a dispersion liquid of zeolite fine particlesSHINETSU CHEMICAL CO·Filed 2008·Granted Apr 12, 2011·17 cites·11 claims
- 0890US7405459B2Semiconductor device comprising porous filmSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 29, 2008·13 cites·4 claims
- 0988US5057689AScanning electron microscope and a method of displaying cross sectional profiles using the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1990·Granted Oct 15, 1991·63 cites·10 claims
- 1087US7233052B2Semiconductor device including fine dummy patternsMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Jun 19, 2007·10 cites·5 claims
- 1187US6524948B2Semiconductor device and method for fabricating the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Feb 25, 2003·45 cites·8 claims
- 1287US5838111APlasma generator with antennas attached to top electrodesMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Nov 17, 1998·53 cites·22 claims
- 1386US9048687B2Power supply device and control method for power supplyNAKAJIMA MIKIO·Filed 2012·Granted Jun 2, 2015·15 cites·7 claims
- 1486US7663239B2Semiconductor device and method for fabricating the samePANASONIC CORP·Filed 2005·Granted Feb 16, 2010·12 cites·20 claims
- 1586US5474836APolyester filament woven fabric for air bagsTEIJIN LTD·Filed 1994·Granted Dec 12, 1995·39 cites·8 claims
- 1684US9158192B2Half-tone phase shift mask blank and method for manufacturing half-tone phase shift maskSHINETSU CHEMICAL CO·Filed 2013·Granted Oct 13, 2015·4 cites·9 claims
- 1784US5895181ADynamic error correcting system in a numerically controlled machine toolOKK CORP·Filed 1996·Granted Apr 20, 1999·58 cites·11 claims
- 1883US6384560B1Abnormality detection apparatus for tool and numerical control apparatus provided with sameKAKINO YOSHIAKI·Filed 2000·Granted May 7, 2002·39 cites·3 claims
- 1981US9268212B2Photomask blank and method for manufacturing photomaskSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 23, 2016·3 cites·16 claims
- 2081US9188852B2Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift maskSHINETSU CHEMICAL CO·Filed 2013·Granted Nov 17, 2015·3 cites·9 claims
- 2181US6518191B2Method for etching organic film, method for fabricating semiconductor device and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Feb 11, 2003·23 cites·8 claims
- 2280US7731862B2Dry etching method, fine structure formation method, mold and mold fabrication methodPANASONIC CORP·Filed 2006·Granted Jun 8, 2010·9 cites·27 claims
- 2380US5607183AAir bag provided with reinforcing beltsTEIJIN LTD·Filed 1995·Granted Mar 4, 1997·53 cites·31 claims
- 2479US9488907B2Photomask blank, process for production of photomask, and chromium-containing material filmSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 8, 2016·1 cites·19 claims
- 2578US7402621B2Porous-film-forming composition, preparation method of the composition, porous film and semiconductor deviceSHINETSU CHEMICAL CO·Filed 2005·Granted Jul 22, 2008·7 cites·6 claims
- 2677US7919005B2Dry etching method, fine structure formation method, mold and mold fabrication methodPANASONIC CORP·Filed 2006·Granted Apr 5, 2011·4 cites·18 claims
- 2777US5540965AWoven fabric for high performance air bags and process for producing sameTEIJIN LTD·Filed 1994·Granted Jul 30, 1996·43 cites·18 claims
- 2876US7906030B2Dry etching method, fine structure formation method, mold and mold fabrication methodPANASONIC CORP·Filed 2006·Granted Mar 15, 2011·4 cites·18 claims
- 2975US9440375B2Blank for mold production and method for manufacturing moldSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 13, 2016·2 cites·14 claims
- 3075US7084505B2Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Aug 1, 2006·14 cites·8 claims
- 3175US6762120B2Semiconductor device and method for fabricating the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Jul 13, 2004·18 cites·10 claims
- 3274US8017518B2Method for manufacturing a semiconductor devicePANASONIC CORP·Filed 2008·Granted Sep 13, 2011·4 cites·13 claims
- 3374US7758761B2Dry etching method, fine structure formation method, mold and mold fabrication methodPANASONIC CORP·Filed 2006·Granted Jul 20, 2010·4 cites·33 claims
- 3474US7119354B2Composition for forming porous film, porous film and method for forming the same, interlevel insulator filmMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Oct 10, 2006·13 cites·8 claims
- 3572US12342467B2Microstructure-transfer apparatus, stamp head unit, stamp component for transferring microstructure, and method for transferring microstructure-integrated componentSHINETSU CHEMICAL CO·Filed 2019·Granted Jun 24, 2025·1 cites·42 claims
- 3672US5441798AFilter cloth for air bagsTEIJIN LTD·Filed 1994·Granted Aug 15, 1995·33 cites·24 claims
- 3772US2025287559A1Microstructure-transfer apparatus, stamp head unit, stamp component for transferring microstructure, and method for transferring microstructure-integrated componentSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3871US7132473B2Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Nov 7, 2006·11 cites·3 claims
- 3971US2025215211A1Epoxy resin composition, epoxy resin cured material, and epoxy adhesiveSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 4070US7282452B2Etching method, semiconductor and fabricating method for the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Oct 16, 2007·9 cites·12 claims
- 4170US6551033B2Tapping apparatus and methodKAKINO YOSHIAKI·Filed 2001·Granted Apr 22, 2003·15 cites·22 claims
- 4270US6344724B1Numerical control apparatus for NC machine toolKAKINO YOSHIAKI·Filed 2000·Granted Feb 5, 2002·17 cites·8 claims
- 4370US2025243318A1Polyorganosiloxane and method for producing the sameSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 4469US8968972B2Photomask blank, process for production of photomask, and chromium-containing material filmYOSHIKAWA HIROKI·Filed 2011·Granted Mar 3, 2015·1 cites·20 claims
- 4568US7985691B2Etching method, semiconductor and fabricating method for the samePANASONIC CORP·Filed 2010·Granted Jul 26, 2011·1 cites·15 claims
- 4668US7294571B2Concave pattern formation method and method for forming semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Nov 13, 2007·3 cites·10 claims
- 4768US6930393B2Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Aug 16, 2005·12 cites·12 claims
- 4868US6650960B2Machining control systemKAKINO YOSHIAKI·Filed 2001·Granted Nov 18, 2003·13 cites·12 claims
- 4968US6514647B1Photomask, resist pattern formation method, method of determining alignment accuracy and method of fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Feb 4, 2003·10 cites·6 claims
- 5067US6531402B2Method for etching organic film, method for fabricating semiconductor device and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Mar 11, 2003·10 cites·17 claims
Showing the top 50 of 115 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Hideo Nakagawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →