Inventor · disambiguated record
Hisashi Nakane
Also filed as: NAKANE HISASHI · TAKANASHI HIROSHI · UEHARA AKIRA
36 granted patents·1,393 citations·filing 1976–1992
98Inventor score
Files withTOKYO OHKA KOGYO CO LTD28TOKYO DENSHI KAGAKU KK4TOKYO DENSHI KAGAKU KABUSHIKI3PHOTOPOLY OHKA CO LTD1
Top patents by PatentIndex Score
36 records- 0197US4245154AApparatus for treatment with gas plasmaTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Jan 13, 1981·93 cites·9 claims
- 0296US4385086AMethod for preventing leaching of contaminants from solid surfacesTOKYO OHKA KOGYO CO LTD·Filed 1979·Granted May 24, 1983·75 cites·8 claims
- 0394US4318767AApparatus for the treatment of semiconductor wafers by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1980·Granted Mar 9, 1982·112 cites·7 claims
- 0494US4045231APhotosensitive resin composition for flexographic printing platesTOKYO OHKA KOGYO CO LTD·Filed 1976·Granted Aug 30, 1977·102 cites·10 claims
- 0593US4833067ADeveloping solution for positive-working photoresist comprising tmah and non-ionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted May 23, 1989·75 cites·1 claims
- 0692US4277525ALiquid compositions for forming silica coating filmsTOKYO OHKA KOGYO CO LTD·Filed 1980·Granted Jul 7, 1981·61 cites·14 claims
- 0792US4208159AApparatus for the treatment of a wafer by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Jun 17, 1980·70 cites·3 claims
- 0890US4737438ANegative-working photosensitive composition comprising a diphenylamine-melamine condensate and an azide compoundTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Apr 12, 1988·61 cites·7 claims
- 0988US4904571ARemover solution for photoresistTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Feb 27, 1990·60 cites·10 claims
- 1088US4694040ALiquid composition for forming a coating film of organopolysiloxane and method for the preparation thereofTOKYO DENSHI KAGAKU KABUSHIKI·Filed 1986·Granted Sep 15, 1987·52 cites·8 claims
- 1187US4483651AAutomatic apparatus for continuous treatment of leaf materials with gas plasmaTOKYO OHKA KOGYO CO LTD·Filed 1981·Granted Nov 20, 1984·58 cites·6 claims
- 1285US4735890APhotomasks for photolithographic fine patterningTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Apr 5, 1988·41 cites·18 claims
- 1384US4578559APlasma etching methodTOKYO OHKA KOGYO CO LTD·Filed 1984·Granted Mar 25, 1986·23 cites·10 claims
- 1483US4784937ADeveloping solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Nov 15, 1988·35 cites·2 claims
- 1583US4550239AAutomatic plasma processing device and heat treatment deviceTOKYO DENSHI KAGAKU KABUSHIKI·Filed 1982·Granted Oct 29, 1985·57 cites·17 claims
- 1681US4590149AMethod for fine pattern formation on a photoresistTOKYO OHKA KOGYO CO LTD·Filed 1984·Granted May 20, 1986·35 cites·1 claims
- 1780US4844832AContaining an arylsulfonic acid, a phenol and a naphalenic solventTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jul 4, 1989·31 cites·7 claims
- 1880US4738915APositive-working O-quinone diazide photoresist composition with 2,3,4-trihydroxybenzophenoneTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Apr 19, 1988·31 cites·6 claims
- 1978US4336438AApparatus for automatic semi-batch sheet treatment of semiconductor wafers by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1980·Granted Jun 22, 1982·46 cites·7 claims
- 2077US4268539ALiquid coating composition for forming transparent conductive films and a coating process for using said compositionTOKYO DENSHI KAGAKU KK·Filed 1978·Granted May 19, 1981·27 cites·32 claims
- 2173US4149923AApparatus for the treatment of wafer materials by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Apr 17, 1979·28 cites·6 claims
- 2272US4610953AAqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxideTOKYO OHKA KOGYO CO LTD·Filed 1984·Granted Sep 9, 1986·21 cites·4 claims
- 2372US4550242AAutomatic plasma processing device and heat treatment device for batch treatment of workpiecesTOKYO DENSHI KAGAKU KABUSHIKI·Filed 1982·Granted Oct 29, 1985·36 cites·22 claims
- 2471US4474642AMethod for pattern-wise etching of a metallic coating filmTOKYO DENSHI KAGAKU KK·Filed 1983·Granted Oct 2, 1984·33 cites·12 claims
- 2569US4557996AMethod for providing a pattern-wise photoresist layer on a substrate plate and a surface-protected substrate plate thereforPHOTOPOLY OHKA CO LTD·Filed 1984·Granted Dec 10, 1985·25 cites·10 claims
- 2668USD291413SWafer holding frameTOKYO DENSHI KAGAKU KK·Filed 1985·Granted Aug 18, 1987·11 cites·1 claims
- 2765US4174222APositive-type O-quinone diazide containing photoresist compositionsTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Nov 13, 1979·16 cites·8 claims
- 2862US4702992AMethod of preparing photoresist material with undercoating of photoextinction agent and condensation productTOKYO OHKA KOGYO CO LTD·Filed 1985·Granted Oct 27, 1987·16 cites·7 claims
- 2961US4209581ASoluble photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Jun 24, 1980·13 cites·6 claims
- 3054US4401745AComposition and process for ultra-fine pattern formationTOKYO OHKA KOGYO CO LTD·Filed 1981·Granted Aug 30, 1983·16 cites·21 claims
- 3150US4243740ALight sensitive compositions of polymethyl isopropenyl ketoneTOKYO OHKA KOGYO CO LTD·Filed 1979·Granted Jan 6, 1981·9 cites·22 claims
- 3243US4797348AMethod of forming a positive resist pattern in photoresist of o-naphthoquinone diazide and bisazide with UV imaging exposure and far UV overall exposureTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jan 10, 1989·7 cites·4 claims
- 3342US4902770AUndercoating material for photosensitive resinsTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Feb 20, 1990·6 cites·7 claims
- 3438US5281508APositive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresolTOKYO OHKA KOGYO CO LTD·Filed 1992·Granted Jan 25, 1994·4 cites·3 claims
- 3532US4588675AMethod for fine pattern formation on a photoresistTOKYO OHKA KOGYO CO LTD·Filed 1984·Granted May 13, 1986·4 cites·2 claims
- 3632US4465553AMethod for dry etching of a substrate surfaceTOKYO DENSHI KAGAKU KK·Filed 1983·Granted Aug 14, 1984·3 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →