Inventor · disambiguated record
Hiromitsu Nakashima
Also filed as: NAKASHIMA HIROMITSU
29 granted patents·5 pending applications·53 citations·filing 2005–2021
95Inventor score
Top patents by PatentIndex Score
34 records- 0188US8076053B2Upper layer-forming composition and photoresist patterning methodNAKAMURA ATSUSHI·Filed 2006·Granted Dec 13, 2011·10 cites·4 claims
- 0287US8609319B2Radiation-sensitive resin composition and resist film formed using the sameKIMURA TORU·Filed 2011·Granted Dec 17, 2013·6 cites·17 claims
- 0387US8273521B2Radiation-sensitive resin composition and compoundSATO MITSUO·Filed 2010·Granted Sep 25, 2012·7 cites·10 claims
- 0484US8697343B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionNAKAGAWA HIROKI·Filed 2007·Granted Apr 15, 2014·7 cites·8 claims
- 0582US8728706B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundASANO YUUSUKE·Filed 2012·Granted May 20, 2014·4 cites·7 claims
- 0678US11036133B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2019·Granted Jun 15, 2021·0 cites·18 claims
- 0778US9513548B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundJSR CORP·Filed 2014·Granted Dec 6, 2016·2 cites·12 claims
- 0877US8435718B2Upper layer-forming composition and photoresist patterning methodNAKAMURA ATSUSHI·Filed 2011·Granted May 7, 2013·2 cites·12 claims
- 0976US11681222B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2021·Granted Jun 20, 2023·0 cites·20 claims
- 1075US9116427B2Composition for forming resist underlayer film and pattern-forming methodJSR CORP·Filed 2013·Granted Aug 25, 2015·2 cites·13 claims
- 1172US9268219B2Photoresist composition and resist pattern-forming methodJSR CORP·Filed 2012·Granted Feb 23, 2016·2 cites·16 claims
- 1269US9046765B2Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist filmJSR CORP·Filed 2013·Granted Jun 2, 2015·2 cites·18 claims
- 1369US8609318B2Radiation-sensitive resin composition, method for forming resist pattern and polymerNAKAHARA KAZUO·Filed 2011·Granted Dec 17, 2013·2 cites·7 claims
- 1467US10620534B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2018·Granted Apr 14, 2020·0 cites·14 claims
- 1565US8182977B2Polymer and positive-tone radiation-sensitive resin compositionIKEDA NORIHIKO·Filed 2010·Granted May 22, 2012·2 cites·10 claims
- 1664US11603459B2Resin composition and method of forming resist patternJSR CORP·Filed 2021·Granted Mar 14, 2023·0 cites·20 claims
- 1763US10564546B2Resist pattern-forming methodJSR CORP·Filed 2017·Granted Feb 18, 2020·1 cites·22 claims
- 1863US8597867B2Lactone copolymer and radiation-sensitive resin compositionNAKASHIMA HIROMITSU·Filed 2005·Granted Dec 3, 2013·2 cites·19 claims
- 1962US9158196B2Radiation-sensitive resin composition and pattern-forming methodJSR CORP·Filed 2013·Granted Oct 13, 2015·1 cites·12 claims
- 2061US10082733B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2016·Granted Sep 25, 2018·0 cites·14 claims
- 2161US9213236B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2014·Granted Dec 15, 2015·0 cites·11 claims
- 2259US9500950B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2015·Granted Nov 22, 2016·0 cites·13 claims
- 2356US10048586B2Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compoundJSR CORP·Filed 2016·Granted Aug 14, 2018·0 cites·19 claims
- 2456US8895229B2Composition for formation of upper layer film, and method for formation of photoresist patternNISHIMURA YUKIO·Filed 2007·Granted Nov 25, 2014·1 cites·5 claims
- 2556US2021364918A1Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2021·Application pending·0 cites
- 2653US11130856B2Resin composition and method of forming resist patternJSR CORP·Filed 2019·Granted Sep 28, 2021·0 cites·22 claims
- 2753US8609321B2Radiation-sensitive resin composition, polymer and compoundJSR CORP·Filed 2013·Granted Dec 17, 2013·0 cites·5 claims
- 2852US2022260908A9Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2021·Application pending·0 cites
- 2943US2007042292A1Radiation sensitive resin compositionYONEDA EIJI·Filed 2006·Application pending·0 cites
- 3041US8895223B2Radiation-sensitive resin compositionSATO MITSUO·Filed 2012·Granted Nov 25, 2014·0 cites·4 claims
- 3141US2013022912A1Radiation-sensitive resin composition, method for forming resist pattern, polymer and compoundJSR CORP·Filed 2012·Application pending·0 cites
- 3239US8507189B2Upper layer film forming composition and method of forming photoresist patternKOUNO DAITA·Filed 2007·Granted Aug 13, 2013·0 cites·3 claims
- 3334US2011223537A1Radiation-sensitive resin composition and polymerJSR CORP·Filed 2011·Application pending·0 cites
- 3431US9598520B2Radiation-sensitive resin composition, polymer and method for forming a resist patternKIRIDOSHI Yuko·Filed 2012·Granted Mar 21, 2017·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →