Inventor · disambiguated record
Hidetoshi Ohnuma
Also filed as: OHNUMA HIDETOSHI
13 granted patents·3 pending applications·233 citations·filing 1996–2010
91Inventor score
Top patents by PatentIndex Score
16 records- 0194US6391501B1Pattern generating method and apparatusSONY CORP·Filed 1999·Granted May 21, 2002·32 cites·10 claims
- 0285US6370441B1Method and apparatus of correcting design-patterned data, method of electron beam and optical exposure, method of fabricating semiconductor and photomask devicesSONY CORP·Filed 1998·Granted Apr 9, 2002·50 cites·16 claims
- 0385US5885748AMethod of exposing, with correction of pattern data used to draw photomask to overcome proximity effectsSONY CORP·Filed 1998·Granted Mar 23, 1999·54 cites·4 claims
- 0483US5792581AMethod of correcting pattern data for drawing photomask to overcome proximity effectsSONY CORP·Filed 1996·Granted Aug 11, 1998·49 cites·4 claims
- 0581US6928636B2Rule based OPC evaluating method and simulation-based OPC model evaluating methodSONY CORP·Filed 2002·Granted Aug 9, 2005·27 cites·6 claims
- 0658US7139996B2Mask pattern correction apparatus and mask pattern correction method and mask preparation method and method of production of a semiconductor deviceSONY CORP·Filed 2002·Granted Nov 21, 2006·7 cites·20 claims
- 0758US6492078B1Correcting method of exposure pattern, exposure method, exposure system, photomask and semiconductor deviceSONY CORP·Filed 2000·Granted Dec 10, 2002·5 cites·10 claims
- 0852US2006008712A1Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatusSONY CORP·Filed 2005·Application pending·0 cites
- 0951US6924068B2Photomask fabrication method, photomask, and exposure method thereofSONY CORP·Filed 2001·Granted Aug 2, 2005·3 cites·13 claims
- 1050US7200834B2Exposure pattern forming method and exposure patternSONY CORP·Filed 2005·Granted Apr 3, 2007·0 cites·3 claims
- 1150US7165235B2Exposure pattern forming method and exposure patternSONY CORP·Filed 2005·Granted Jan 16, 2007·0 cites·2 claims
- 1243US6144760AExposure data correction method, exposing method, photomask, semiconductor device, exposure data correction apparatus, exposure apparatus, and manufacturing apparatus of semiconductor deviceSONY CORP·Filed 1997·Granted Nov 7, 2000·6 cites·8 claims
- 1341US7000216B2Exposure pattern forming method and exposure patternSONY CORP·Filed 2002·Granted Feb 14, 2006·0 cites·2 claims
- 1440US2004029024A1Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatusFiled 2003·Application pending·0 cites
- 1535US2003177467A1Opc mask manufacturing method, opc mask, and chipFiled 2002·Application pending·0 cites
- 1634US8221942B2Pattern correction method, exposure mask, manufacturing method of exposure mask, and manufacturing method of semiconductor deviceOKA MIKIO·Filed 2010·Granted Jul 17, 2012·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →