Inventor · disambiguated record
Hiroki Ootera
Also filed as: OOTERA HIROKI
13 granted patents·2 pending applications·644 citations·filing 1987–2002
94Inventor score
Files withMITSUBISHI ELECTRIC CORP14
Top patents by PatentIndex Score
15 records- 0197US6244211B1Plasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Jun 12, 2001·193 cites·11 claims
- 0292US6076483APlasma processing apparatus using a partition panelMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jun 20, 2000·82 cites·4 claims
- 0391US5115167APlasma processorMITSUBISHI ELECTRIC CORP·Filed 1989·Granted May 19, 1992·55 cites·5 claims
- 0491US4894510AApparatus for uniformly distributing plasma over a substrateMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Jan 16, 1990·58 cites·22 claims
- 0590US4947085APlasma processorMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Aug 7, 1990·48 cites·10 claims
- 0687US6417111B2Plasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Jul 9, 2002·30 cites·9 claims
- 0786US5733405APlasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Mar 31, 1998·86 cites·21 claims
- 0884US6167835B1Two chamber plasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jan 2, 2001·43 cites·2 claims
- 0959US6020570APlasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Feb 1, 2000·23 cites·7 claims
- 1058US6787874B2Semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Sep 7, 2004·8 cites·8 claims
- 1154US6335595B1Plasma generating apparatusMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Jan 1, 2002·10 cites·10 claims
- 1246US6756312B2Method of fabricating a semiconductor device including time-selective etching processMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Jun 29, 2004·1 cites·18 claims
- 1343US5146138APlasma processorMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Sep 8, 1992·7 cites·1 claims
- 1435US2002047544A1Plasma generating apparatusMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
- 1535US2002088542A1Plasma processing apparatusFiled 2000·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →