Inventor · disambiguated record
Hiromu Sakamoto
Also filed as: SAKAMOTO HIROMU
22 granted patents·78 citations·filing 1997–2017
92Inventor score
Top patents by PatentIndex Score
22 records- 0194US7612217B2Sulfonium compoundSUMITOMO CHEMICAL CO·Filed 2007·Granted Nov 3, 2009·27 cites·5 claims
- 0293US8367298B2Salt and photoresist composition containing the sameSUMITOMO CHEMICAL CO·Filed 2010·Granted Feb 5, 2013·11 cites·10 claims
- 0388US8906589B2Salt and photoresist composition comprising the sameICHIKAWA KOJI·Filed 2011·Granted Dec 9, 2014·5 cites·9 claims
- 0480US8663899B2Resist composition and method for producing resist patternICHIKAWA KOJI·Filed 2012·Granted Mar 4, 2014·3 cites·7 claims
- 0576US9580402B2Salt, acid generator, photoresist composition, and method for producing photoresist patternSUMITOMO CHEMICAL CO·Filed 2016·Granted Feb 28, 2017·1 cites·7 claims
- 0673US8557500B2Salt and photoresist composition comprising the sameICHIKAWA KOJI·Filed 2012·Granted Oct 15, 2013·1 cites·9 claims
- 0772US8835095B2Resist composition and method for producing resist patternICHIKAWA KOJI·Filed 2012·Granted Sep 16, 2014·2 cites·5 claims
- 0872US8753795B2Photoresist compositionICHIKAWA KOJI·Filed 2012·Granted Jun 17, 2014·1 cites·8 claims
- 0970US9405187B2Salt, acid generator and resist compositionHIRAOKA TAKASHI·Filed 2011·Granted Aug 2, 2016·2 cites·8 claims
- 1068US5935278AAbrasive composition for magnetic recording disc substrateSHOWA DENKO KK·Filed 1997·Granted Aug 10, 1999·21 cites·12 claims
- 1164US8753796B2Photoresist compositionICHIKAWA KOJI·Filed 2012·Granted Jun 17, 2014·1 cites·8 claims
- 1261US8993210B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2011·Granted Mar 31, 2015·3 cites·10 claims
- 1348US9233945B2Compound, resin and photoresist compositionSUMITOMO CHEMICAL CO·Filed 2012·Granted Jan 12, 2016·0 cites·9 claims
- 1444US8318404B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Nov 27, 2012·0 cites·8 claims
- 1542US9429841B2Resist composition and method for producing resist patternICHIKAWA KOJI·Filed 2012·Granted Aug 30, 2016·0 cites·9 claims
- 1642US7625689B2Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2005·Granted Dec 1, 2009·0 cites·7 claims
- 1741US8778594B2Resist composition and method for producing resist patternICHIKAWA KOJI·Filed 2012·Granted Jul 15, 2014·0 cites·7 claims
- 1840US11561471B2Photoresist compositionSUMITOMO CHEMICAL CO·Filed 2016·Granted Jan 24, 2023·0 cites·7 claims
- 1940US9726976B2Photoresist compositionICHIKAWA KOJI·Filed 2010·Granted Aug 8, 2017·0 cites·11 claims
- 2039US11119408B2Compound, resin and photoresist compositionSUMITOMO CHEMICAL CO·Filed 2017·Granted Sep 14, 2021·0 cites·4 claims
- 2138US10838300B2Salt and photoresist composition containing the sameSUMITOMO CHEMICAL CO·Filed 2017·Granted Nov 17, 2020·0 cites·4 claims
- 2237US9809669B2Salt, resin, resist composition and method for producing resist patternSUMITOMO CHEMICAL CO·Filed 2015·Granted Nov 7, 2017·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →