Inventor · disambiguated record
Hidetoshi Satoh
Also filed as: SATOH HIDETOSHI
19 granted patents·292 citations·filing 1994–2018
95Inventor score
Top patents by PatentIndex Score
19 records- 0192US6159644AMethod of fabricating semiconductor circuit devices utilizing multiple exposuresHITACHI LTD·Filed 1996·Granted Dec 12, 2000·100 cites·7 claims
- 0286US6121625ACharged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 1998·Granted Sep 19, 2000·30 cites·11 claims
- 0380US6653052B2Electron device manufacturing method, a pattern forming method, and a photomask used for those methodsHITACHI LTD·Filed 2001·Granted Nov 25, 2003·15 cites·14 claims
- 0478US6573520B1Electron beam lithography systemHITACHI LTD·Filed 2000·Granted Jun 3, 2003·14 cites·8 claims
- 0577US6927002B2Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing methodRENESAS TECH CORP·Filed 2001·Granted Aug 9, 2005·17 cites·14 claims
- 0675US6441383B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2001·Granted Aug 27, 2002·6 cites·1 claims
- 0775US6262428B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Jul 17, 2001·6 cites·3 claims
- 0873US6703171B2Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing methodHITACHI LTD·Filed 2002·Granted Mar 9, 2004·13 cites·20 claims
- 0973US5396077AElectron beam lithography apparatus having electron optics correction systemHITACHI LTD·Filed 1994·Granted Mar 7, 1995·24 cites·5 claims
- 1072US6750000B2Electron device manufacturing method, a pattern forming method, and a photomask used for those methodsRENESAS TECH CORP·Filed 2003·Granted Jun 15, 2004·10 cites·6 claims
- 1170US6759666B2Method and apparatus for charged particle beam exposureHITACHI LTD·Filed 2001·Granted Jul 6, 2004·8 cites·7 claims
- 1270US6320198B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Nov 20, 2001·4 cites·1 claims
- 1369US10821918B2Protector and wire harnessYAZAKI CORP·Filed 2018·Granted Nov 3, 2020·3 cites·7 claims
- 1469US5650631AElectron beam writing systemHITACHI LTD·Filed 1995·Granted Jul 22, 1997·22 cites·30 claims
- 1556US6555833B2Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2002·Granted Apr 29, 2003·1 cites·2 claims
- 1654US5520297AAperture plate and a method of manufacturing the sameHITACHI LTD·Filed 1994·Granted May 28, 1996·19 cites·9 claims
- 1746US6583431B2Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2002·Granted Jun 24, 2003·0 cites·1 claims
- 1846US6509572B2Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2002·Granted Jan 21, 2003·0 cites·1 claims
- 1944US6329665B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Dec 11, 2001·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →