Inventor · disambiguated record
Hiroyuki Shinada
Also filed as: SHINADA HIROYUKI
79 granted patents·6 pending applications·2,283 citations·filing 1988–2018
99Inventor score
Top patents by PatentIndex Score
85 records- 0199US7692144B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2007·Granted Apr 6, 2010·42 cites·15 claims
- 0299US6172363B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 1997·Granted Jan 9, 2001·185 cites·20 claims
- 0399US6107637AElectron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 1998·Granted Aug 22, 2000·147 cites·34 claims
- 0499US5986263AElectron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 1997·Granted Nov 16, 1999·164 cites·21 claims
- 0598US6583413B1Method of inspecting a circuit pattern and inspecting instrumentHITACHI LTD·Filed 2000·Granted Jun 24, 2003·123 cites·14 claims
- 0697US6329826B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2000·Granted Dec 11, 2001·95 cites·4 claims
- 0796US7417444B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2005·Granted Aug 26, 2008·25 cites·7 claims
- 0896US6333510B1Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2000·Granted Dec 25, 2001·44 cites·12 claims
- 0995US7329889B2Electron beam apparatus and method with surface height calculator and a dual projection optical unitHITACHI LTD·Filed 2005·Granted Feb 12, 2008·17 cites·6 claims
- 1095US6797954B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2003·Granted Sep 28, 2004·42 cites·7 claims
- 1195US6310341B1Projecting type charged particle microscope and projecting type substrate inspection systemHITACHI LTD·Filed 1999·Granted Oct 30, 2001·108 cites·27 claims
- 1294US8212227B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusWATANABE MASAHIRO·Filed 2010·Granted Jul 3, 2012·12 cites·10 claims
- 1394US6753518B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2001·Granted Jun 22, 2004·35 cites·17 claims
- 1494US5402295AMagnetic recording head capable of defining narrow track width and magnetic recording apparatus using the sameHITACHI LTD·Filed 1992·Granted Mar 28, 1995·72 cites·15 claims
- 1593US6583634B1Method of inspecting circuit pattern and inspecting instrumentHITACHI LTD·Filed 2000·Granted Jun 24, 2003·68 cites·5 claims
- 1693US6348690B1Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 1998·Granted Feb 19, 2002·51 cites·30 claims
- 1792US6919577B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2004·Granted Jul 19, 2005·25 cites·17 claims
- 1892US6172365B1Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 1999·Granted Jan 9, 2001·48 cites·10 claims
- 1991US6825480B1Charged particle beam apparatus and automatic astigmatism adjustment methodHITACHI LTD·Filed 2000·Granted Nov 30, 2004·38 cites·10 claims
- 2091US6373054B2Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 2001·Granted Apr 16, 2002·23 cites·22 claims
- 2190US7952074B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2008·Granted May 31, 2011·8 cites·18 claims
- 2290US7397031B2Method of inspecting a circuit pattern and inspecting instrumentHITACHI LTD·Filed 2006·Granted Jul 8, 2008·10 cites·7 claims
- 2390US7022986B2Apparatus and method for wafer pattern inspectionHITACHI HIGH TECH CORP·Filed 2002·Granted Apr 4, 2006·30 cites·14 claims
- 2490US6979823B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2004·Granted Dec 27, 2005·21 cites·9 claims
- 2588US6703850B2Method of inspecting circuit pattern and inspecting instrumentHITACHI LTD·Filed 2003·Granted Mar 9, 2004·37 cites·6 claims
- 2687US7982188B2Apparatus and method for wafer pattern inspectionHITACHI HIGH TECH CORP·Filed 2006·Granted Jul 19, 2011·9 cites·18 claims
- 2787US7242015B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2005·Granted Jul 10, 2007·6 cites·21 claims
- 2887US7098455B2Method of inspecting a circuit pattern and inspecting instrumentHITACHI LTD·Filed 2003·Granted Aug 29, 2006·26 cites·5 claims
- 2987US7012252B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2005·Granted Mar 14, 2006·5 cites·12 claims
- 3087US6717142B2Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 2002·Granted Apr 6, 2004·16 cites·15 claims
- 3187US6335532B1Convergent charged particle beam apparatus and inspection method using sameHITACHI LTD·Filed 1999·Granted Jan 1, 2002·38 cites·3 claims
- 3286US7526747B2Inspection method and inspection system using charged particle beamHITACHI LTD·Filed 2005·Granted Apr 28, 2009·7 cites·9 claims
- 3386US7075076B2Inspection system, inspection method, and process management methodHITACHI HIGH TECH CORP·Filed 2004·Granted Jul 11, 2006·20 cites·33 claims
- 3486US6509564B1Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 1999·Granted Jan 21, 2003·39 cites·6 claims
- 3585US6559663B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2001·Granted May 6, 2003·20 cites·10 claims
- 3685US6452178B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2001·Granted Sep 17, 2002·23 cites·16 claims
- 3784US7439504B2Pattern inspection method and apparatus using electron beamHITACHI LTD·Filed 2005·Granted Oct 21, 2008·6 cites·4 claims
- 3884US7026830B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2003·Granted Apr 11, 2006·19 cites·6 claims
- 3984US6559459B2Convergent charged particle beam apparatus and inspection method using sameHITACHI LTD·Filed 2001·Granted May 6, 2003·14 cites·11 claims
- 4084US6476390B1Method and apparatus for inspecting integrated circuit pattern using a plurality of charged particle beamsHITACHI LTD·Filed 1998·Granted Nov 5, 2002·68 cites·16 claims
- 4184US5616926ASchottky emission cathode and a method of stabilizing the sameHITACHI LTD·Filed 1995·Granted Apr 1, 1997·43 cites·50 claims
- 4283US6828554B2Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 2004·Granted Dec 7, 2004·11 cites·8 claims
- 4383US5838096ACathode having a reservoir and method of manufacturing the sameHITACHI LTD·Filed 1996·Granted Nov 17, 1998·40 cites·8 claims
- 4480US7439506B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2007·Granted Oct 21, 2008·3 cites·30 claims
- 4580US6618850B2Inspection method and inspection system using charged particle beamHITACHI LTD·Filed 2001·Granted Sep 9, 2003·12 cites·6 claims
- 4680US6614022B2Pattern inspection method and apparatus using electron beamHITACHI LTD·Filed 2001·Granted Sep 2, 2003·11 cites·28 claims
- 4779US6744057B2Convergent charged particle beam apparatus and inspection method using sameHITACHI LTD·Filed 2003·Granted Jun 1, 2004·11 cites·8 claims
- 4879US5283440AElectron beam writing system used in a cell projection methodHITACHI LTD·Filed 1991·Granted Feb 1, 1994·34 cites·10 claims
- 4976US6885012B2Convergent charged particle beam apparatus and inspection method using sameHITACHI LTD·Filed 2004·Granted Apr 26, 2005·9 cites·5 claims
- 5075US10840060B2Scanning electron microscope and sample observation methodHITACHI HIGH TECH CORP·Filed 2018·Granted Nov 17, 2020·1 cites·16 claims
Showing the top 50 of 85 patent records by PatentIndex Score.
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