Inventor · disambiguated record
Hideaki Suda
Also filed as: SUDA HIDEAKI
10 granted patents·1 pending application·62 citations·filing 1973–2013
87Inventor score
Files withSUMITOMO CHEMICAL CO7KOBAYASHI TAKAYUKI1NIPPON STEEL & SUMIKIN CHEM CO1NITTO BOSEKI CO LTD1TERASHIMA SHINICHI1
Top patents by PatentIndex Score
11 records- 0182US3933921AProcess for the production of hydroperoxidesSUMITOMO CHEMICAL CO·Filed 1973·Granted Jan 20, 1976·14 cites·6 claims
- 0277US3953521AProcess for the continuous production of dihydroperoxidesSUMITOMO CHEMICAL CO·Filed 1975·Granted Apr 27, 1976·12 cites·4 claims
- 0372US9296180B2Metal foil for base materialTERASHIMA SHINICHI·Filed 2011·Granted Mar 29, 2016·1 cites·8 claims
- 0466US4542067AFlameproofed water-repellent woven or knitted sheet coated with silicone containing fibrous potassium titanateNITTO BOSEKI CO LTD·Filed 1984·Granted Sep 17, 1985·15 cites·3 claims
- 0558US3932528AProcess for the separation of dihydroperoxidesSUMITOMO CHEMICAL CO·Filed 1973·Granted Jan 13, 1976·5 cites·1 claims
- 0656US2015136209A1Polyimide layer-containing flexible substrate, polyimide layer-containing substrate for flexible solar cell, flexible solar cell, and method for producing sameNIPPON STEEL & SUMIKIN CHEM CO·Filed 2013·Application pending·0 cites
- 0753US3969420AProcess for recovering resorcinol and hydroquinone in mixtureSUMITOMO CHEMICAL CO·Filed 1973·Granted Jul 13, 1976·4 cites·9 claims
- 0847US3956385AProcess for producing sulfonylamidesSUMITOMO CHEMICAL CO·Filed 1974·Granted May 11, 1976·4 cites·10 claims
- 0940US3950431AProcess for removing impurities in an oxidation mixtureSUMITOMO CHEMICAL CO·Filed 1973·Granted Apr 13, 1976·7 cites·12 claims
- 1039US9902134B2Metal foil for base material and producing method thereofKOBAYASHI TAKAYUKI·Filed 2011·Granted Feb 27, 2018·0 cites·20 claims
- 1130US4044052AProcess for recovery of urea from its phenolic solutionSUMITOMO CHEMICAL CO·Filed 1975·Granted Aug 23, 1977·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →