Inventor · disambiguated record
Hitoshi Sunaoshi
Also filed as: SUNAOSHI HITOSHI
14 granted patents·79 citations·filing 1996–2009
91Inventor score
Top patents by PatentIndex Score
14 records- 0184US7679068B2Method of calculating deflection aberration correcting voltage and charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Mar 16, 2010·8 cites·14 claims
- 0283US7652271B2Charged-particle beam lithography with grid matching for correction of beam shot position deviationNUFLARE TECHNOLOGY INC·Filed 2007·Granted Jan 26, 2010·9 cites·10 claims
- 0382US7485879B2Electron beam writing apparatus and writing methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Feb 3, 2009·9 cites·26 claims
- 0474US6606149B1Optical system adjusting method for energy beam apparatusTOSHIBA KK·Filed 2000·Granted Aug 12, 2003·11 cites·6 claims
- 0573US7923704B2Charged particle beam writing methodNUFLARE TECHNOLOGY INC·Filed 2008·Granted Apr 12, 2011·3 cites·9 claims
- 0671US7977654B2Writing apparatus and writing methodNUFLARE TECHNOLOGY INC·Filed 2009·Granted Jul 12, 2011·3 cites·10 claims
- 0764US8653487B2Lithography apparatus and lithography methodSUNAOSHI HITOSHI·Filed 2008·Granted Feb 18, 2014·3 cites·8 claims
- 0858US8188443B2Focusing method of charged particle beam and astigmatism adjusting method of charged particleOHTOSHI KENJI·Filed 2008·Granted May 29, 2012·2 cites·8 claims
- 0958US5843603AMethod of evaluating shaped beam of charged beam writer and method of forming patternTOSHIBA KK·Filed 1996·Granted Dec 1, 1998·14 cites·8 claims
- 1057US6028317ACharged particle beam optical element charged particle beam exposure apparatus and method of adjusting the sameTOSHIBA KK·Filed 1998·Granted Feb 22, 2000·12 cites·51 claims
- 1156US6781680B1Optical system adjusting method for energy beam apparatusTOSHIBA KK·Filed 2003·Granted Aug 24, 2004·2 cites·18 claims
- 1255US6836319B2Optical system adjusting method for energy beam apparatusTOSHIBA KK·Filed 2004·Granted Dec 28, 2004·2 cites·6 claims
- 1348US6617592B2Charged particle beam system and chamber of charged particle beam systemTOSHIBA KK·Filed 2001·Granted Sep 9, 2003·1 cites·15 claims
- 1447US8367276B2Mask blank and method of manufacturing maskHOYA CORP·Filed 2008·Granted Feb 5, 2013·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →