Inventor · disambiguated record
Hiromu Taguchi
Also filed as: TAGUCHI HIROMU
9 granted patents·1 pending application·103 citations·filing 1985–2012
86Inventor score
Files withDAINIPPON PRINTING CO LTD4TOAGOSEI CO LTD2IHARA TAKASHI1MORITA MASATOSHI1TOA GOSEI CHEM IND1
Top patents by PatentIndex Score
10 records- 0183US7537810B2Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panelDAINIPPON PRINTING CO LTD·Filed 2004·Granted May 26, 2009·19 cites·33 claims
- 0282US5544773AMethod for making multilayer printed circuit board having blind holes and resin-coated copper foil used for the methodFiled 1994·Granted Aug 13, 1996·63 cites·9 claims
- 0377US8029877B2Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panelDAINIPPON PRINTING CO LTD·Filed 2010·Granted Oct 4, 2011·2 cites·9 claims
- 0471US7758930B2Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panelDAINIPPON PRINTING CO LTD·Filed 2009·Granted Jul 20, 2010·2 cites·18 claims
- 0566US7399574B2Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panelDAINIPPON PRINTING CO LTD·Filed 2002·Granted Jul 15, 2008·10 cites·22 claims
- 0666US4870193AProcess for producing spiro-orthocarbonateTOA GOSEI CHEM IND·Filed 1985·Granted Sep 26, 1989·7 cites·19 claims
- 0749US2011165389A1Method for forming conductive polymer patternTOAGOSEI CO LTD·Filed 2009·Application pending·0 cites
- 0847US9085465B2Manufacturing method of high-purity chloropolysilaneTOAGOSEI CO LTD·Filed 2012·Granted Jul 21, 2015·0 cites·13 claims
- 0934US9139442B2Method for producing chloropolysilane and fluidized-bed reactorMORITA MASATOSHI·Filed 2012·Granted Sep 22, 2015·0 cites·12 claims
- 1034US8895227B2Developing solution for photoresist on substrate including conductive polymer, and method for forming patternIHARA TAKASHI·Filed 2011·Granted Nov 25, 2014·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →